Abstract: A dielectric structure including solid dielectric regions incorporating a plurality of regions of vacuum or gas is provided. The dielectric constant of the regions of solid dielectrics can have a dielectric constant greater than 4. Each of the plurality of regions of vacuum or gas or the regions of solid dielectrics may be anisotropic with an aspect ratio of at least four. The smallest average dimension of a plurality of regions of vacuum or gas and/or solid dielectrics can have a length of less than 1 micron. The dielectric structure may have a higher electrical energy density in the regions of vacuum or gas than in the solid matrix. One or more electrodes of the capacitive structure can be coated with a solid insulating layer without an interface between a region of vacuum or gas and electrode.

Abstract: In an embodiment, a dielectric structure comprising solid dielectric regions incorporating a plurality of regions of vacuum or gas. In certain embodiments, the dielectric constant of the regions of solid dielectrics have a dielectric constant greater than 4. In certain embodiments, each of the plurality of regions of vacuum or gas or the regions of solid dielectrics is anisotropic with an aspect ratio of at least four. In certain embodiments, the smallest average dimension of a plurality of regions of vacuum or gas and/or solid dielectrics have a length of less than 1 micron. In certain embodiments, the dielectric structure has a higher electrical energy density in the regions of vacuum or gas than in the solid matrix. In certain embodiments, one or more electrodes of the capacitive structure are coated with a solid insulating layer without an interface between a region of vacuum or gas and electrode.