Patents by Inventor Kevin Bautista
Kevin Bautista has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20220126194Abstract: Apparatus and methods for a board game using the concept of an expandable game board are offered. In a preferred embodiment, the game board represents an overview of a historical Japanese castle and there are four separate areas of the castle that are represented by four board quadrants or sections. The board game is playable with a single board section, with two board sections, with three board sections, or with all four board sections. When two or more board sections are utilized, the board sections operate in coordination to provide an expanded playing board wherein a player may control game pieces on a plurality of board sections and/or may move game pieces between board sections. Thus, movement of game characters and/or objects through the various buildings, structures, and grounds of a historical castle may be represented in a table-top board game, and the buildings, structures, and grounds may be expanded through the addition of one or more additional board sections.Type: ApplicationFiled: October 26, 2020Publication date: April 28, 2022Applicant: Battle Board Games LLCInventors: Derek Kevin Bautista, Emerson Giovanini
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Patent number: 10731272Abstract: Methods and apparatus for deposition processes are provided herein. In some embodiments, an apparatus may include a substrate support including a susceptor plate having a pocket disposed in an upper surface of the susceptor plate and having a lip formed in the upper surface and circumscribing the pocket, the lip configured to support a substrate on the lip; and a plurality of vents extending from the pocket to the upper surface of the susceptor plate to exhaust gases trapped between the backside of the substrate and the pocket when a substrate is disposed on the lip. Methods of utilizing the inventive apparatus for depositing a layer on a substrate are also disclosed.Type: GrantFiled: February 22, 2019Date of Patent: August 4, 2020Assignee: APPLIED MATERIALS, INC.Inventors: Nyi O. Myo, Kevin Bautista, Zhiyuan Ye, Schubert S. Chu, Yihwan Kim
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Publication number: 20190257000Abstract: Methods and apparatus for deposition processes are provided herein. In some embodiments, an apparatus may include a substrate support including a susceptor plate having a pocket disposed in an upper surface of the susceptor plate and having a lip formed in the upper surface and circumscribing the pocket, the lip configured to support a substrate on the lip; and a plurality of vents extending from the pocket to the upper surface of the susceptor plate to exhaust gases trapped between the backside of the substrate and the pocket when a substrate is disposed on the lip. Methods of utilizing the inventive apparatus for depositing a layer on a substrate are also disclosed.Type: ApplicationFiled: February 22, 2019Publication date: August 22, 2019Inventors: NYI O. MYO, KEVIN BAUTISTA, ZHIYUAN YE, SCHUBERT S. CHU, YIHWAN KIM
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Patent number: 10260164Abstract: Methods and apparatus for deposition processes are provided herein. In some embodiments, an apparatus may include a substrate support comprising a susceptor plate having a pocket disposed in an upper surface of the susceptor plate and having a lip formed in the upper surface and circumscribing the pocket, the lip configured to support a substrate on the lip; and a plurality of vents extending from the pocket to the upper surface of the susceptor plate to exhaust gases trapped between the backside of the substrate and the pocket when a substrate is disposed on the lip. Methods of utilizing the inventive apparatus for depositing a layer on a substrate are also disclosed.Type: GrantFiled: May 15, 2017Date of Patent: April 16, 2019Assignee: APPLIED MATERIALS, INC.Inventors: Nyi O. Myo, Kevin Bautista, Zhiyuan Ye, Schubert S. Chu, Yihwan Kim
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Publication number: 20170314158Abstract: Methods and apparatus for deposition processes are provided herein. In some embodiments, an apparatus may include a substrate support comprising a susceptor plate having a pocket disposed in an upper surface of the susceptor plate and having a lip formed in the upper surface and circumscribing the pocket, the lip configured to support a substrate on the lip; and a plurality of vents extending from the pocket to the upper surface of the susceptor plate to exhaust gases trapped between the backside of the substrate and the pocket when a substrate is disposed on the lip. Methods of utilizing the inventive apparatus for depositing a layer on a substrate are also disclosed.Type: ApplicationFiled: May 15, 2017Publication date: November 2, 2017Inventors: NYI O. MYO, KEVIN BAUTISTA, ZHIYUAN YE, SCHUBERT S. CHU, YIHWAN KIM
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Patent number: 9650726Abstract: Methods and apparatus for deposition processes are provided herein. In some embodiments, an apparatus may include a substrate support comprising a susceptor plate having a pocket disposed in an upper surface of the susceptor plate and having a lip formed in the upper surface and circumscribing the pocket, the lip configured to support a substrate on the lip; and a plurality of vents extending from the pocket to the upper surface of the susceptor plate to exhaust gases trapped between the backside of the substrate and the pocket when a substrate is disposed on the lip. Methods of utilizing the inventive apparatus for depositing a layer on a substrate are also disclosed.Type: GrantFiled: February 16, 2011Date of Patent: May 16, 2017Assignee: APPLIED MATERIALS, INC.Inventors: Nyi O. Myo, Kevin Bautista, Zhiyuan Ye, Schubert S. Chu, Yihwan Kim
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Patent number: 9217201Abstract: Methods of forming a layer on a substrate may include providing a substrate to a process chamber, the process chamber having a gas port, an exhaust, and a plasma port disposed between the gas port and the exhaust; providing a process gas from the gas port in a first direction such that the process gas flows across the substrate; providing a plasma such that a flow of the plasma interacts with a flow of the process gas at an angle that is non-perpendicular; and rotating the substrate while providing the process gas and the plasma, wherein a thickness profile of the layer is controlled by adjusting at least one of a flow velocity of the process gas, a flow velocity of the plasma, the angle the flow of the plasma interacts with the flow of the process gas, or a direction of rotation of the substrate.Type: GrantFiled: March 11, 2014Date of Patent: December 22, 2015Assignee: APPLIED MATERIALS, INC.Inventors: Matthew S. Rogers, Kevin Bautista
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Publication number: 20140273518Abstract: Methods of forming a layer on a substrate may include providing a substrate to a process chamber, the process chamber having a gas port, an exhaust, and a plasma port disposed between the gas port and the exhaust; providing a process gas from the gas port in a first direction such that the process gas flows across the substrate; providing a plasma such that a flow of the plasma interacts with a flow of the process gas at an angle that is non-perpendicular; and rotating the substrate while providing the process gas and the plasma, wherein a thickness profile of the layer is controlled by adjusting at least one of a flow velocity of the process gas, a flow velocity of the plasma, the angle the flow of the plasma interacts with the flow of the process gas, or a direction of rotation of the substrate.Type: ApplicationFiled: March 11, 2014Publication date: September 18, 2014Applicant: APPLIED MATERIALS, INC.Inventors: MATTHEW S. ROGERS, KEVIN BAUTISTA
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Publication number: 20120270384Abstract: Methods and apparatus for deposition of materials on a substrate are provided herein. In some embodiments, an apparatus for processing a substrate may include a process chamber having a substrate support disposed therein to support a processing surface of a substrate, an injector disposed to a first side of the substrate support and having a first flow path to provide a first process gas and a second flow path to provide a second process gas independent of the first process gas, wherein the injector is positioned to provide the first and second process gases across the processing surface of the substrate, a showerhead disposed above the substrate support to provide the first process gas to the processing surface of the substrate, and an exhaust port disposed to a second side of the substrate support, opposite the injector, to exhaust the first and second process gases from the process chamber.Type: ApplicationFiled: July 27, 2011Publication date: October 25, 2012Applicant: APPLIED MATERIALS, INC.Inventors: ERROL ANTONIO C. SANCHEZ, RICHARD O. COLLINS, DAVID K. CARLSON, KEVIN BAUTISTA, HERMAN P. DINIZ, KAILASH PATALAY, NYI O. MYO, DENNIS L. DEMARS, CHRISTOPHE MARCADAL, STEVE JUMPER, SATHEESH KUPPURAO
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Publication number: 20110209660Abstract: Methods and apparatus for deposition processes are provided herein. In some embodiments, an apparatus may include a substrate support comprising a susceptor plate having a pocket disposed in an upper surface of the susceptor plate and having a lip formed in the upper surface and circumscribing the pocket, the lip configured to support a substrate on the lip; and a plurality of vents extending from the pocket to the upper surface of the susceptor plate to exhaust gases trapped between the backside of the substrate and the pocket when a substrate is disposed on the lip. Methods of utilizing the inventive apparatus for depositing a layer on a substrate are also disclosed.Type: ApplicationFiled: February 16, 2011Publication date: September 1, 2011Applicant: APPLIED MATERIALS, INC.Inventors: NYI O. MYO, KEVIN BAUTISTA, ZHIYUAN YE, SCHUBERT S. CHU, YIHWAN KIM
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Patent number: D613321Type: GrantFiled: April 22, 2009Date of Patent: April 6, 2010Assignee: Applied Materials, Inc.Inventors: Kevin Bautista, Nyi Oo Myo