Patents by Inventor Kevin Dockery

Kevin Dockery has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9771496
    Abstract: Described are chemical-mechanical polishing compositions (e.g., slurries) and methods of using the slurries for chemical-mechanical polishing (or planarizing) a surface of a substrate that contains tungsten, the compositions containing cationic surfactant and cyclodextrin.
    Type: Grant
    Filed: October 28, 2015
    Date of Patent: September 26, 2017
    Assignee: Cabot Microelectronics Corporation
    Inventors: Kevin Dockery, Helin Huang, Lin Fu, Tina Li
  • Publication number: 20170121560
    Abstract: Described are chemical-mechanical polishing compositions (e.g., slurries) and methods of using the slurries for chemical-mechanical polishing (or planarizing) a surface of a substrate that contains tungsten, the compositions containing cationic surfactant and cyclodextrin.
    Type: Application
    Filed: October 28, 2015
    Publication date: May 4, 2017
    Inventors: Kevin DOCKERY, Helin HUANG, Lin FU, Tina LI
  • Publication number: 20170121561
    Abstract: Described are chemical mechanical polishing compositions and methods of using the compositions for planarizing a surface of a substrate that contains tungsten, the compositions containing silica abrasive particles and cationic surfactant.
    Type: Application
    Filed: October 28, 2015
    Publication date: May 4, 2017
    Inventors: Kevin DOCKERY, Helin HUANG, Lin FU
  • Patent number: 9631122
    Abstract: Described are chemical mechanical polishing compositions and methods of using the compositions for planarizing a surface of a substrate that contains tungsten, the compositions containing silica abrasive particles and cationic surfactant.
    Type: Grant
    Filed: October 28, 2015
    Date of Patent: April 25, 2017
    Assignee: Cabot Microelectronics Corporation
    Inventors: Kevin Dockery, Helin Huang, Lin Fu
  • Patent number: 9422455
    Abstract: The invention provides a chemical-mechanical polishing composition containing a ceria abrasive, an ionic polymer of formula I: wherein X1 and X2, Z1 and Z2, R1, R2, R3, and R4, and n are as defined herein, a polyhydroxy aromatic compound, a polyvinyl alcohol, and water, wherein the polishing composition has a pH of about 1 to about 4.5. The invention further provides a method of chemically-mechanically polishing a substrate with the inventive chemical-mechanical polishing composition. Typically, the substrate contains silicon oxide, silicon nitride, and/or polysilicon.
    Type: Grant
    Filed: December 12, 2014
    Date of Patent: August 23, 2016
    Assignee: Cabot Microelectronics Corporation
    Inventors: Sudeep Pallikkara Kuttiatoor, Kevin Dockery, Prativa Pandey, Renhe Jia
  • Publication number: 20160168421
    Abstract: The invention provides a chemical-mechanical polishing composition containing a ceria abrasive, an ionic polymer of formula I: wherein X1 and X2, Z1 and Z2, R1, R2, R3, and R4, and n are as defined herein, a polyhydroxy aromatic compound, a polyvinyl alcohol, and water, wherein the polishing composition has a pH of about 1 to about 4.5. The invention further provides a method of chemically-mechanically polishing a substrate with the inventive chemical-mechanical polishing composition. Typically, the substrate contains silicon oxide, silicon nitride, and/or polysilicon.
    Type: Application
    Filed: December 12, 2014
    Publication date: June 16, 2016
    Inventors: Sudeep PALLIKKARA KUTTIATOOR, Kevin DOCKERY, Prativa PANDEY, Renhe JIA
  • Patent number: 9165489
    Abstract: The invention provides a chemical-mechanical polishing composition containing a ceria abrasive and a polymer of formula I: wherein X1 and X2, Y1 and Y2, Z1 and Z2, R1, R2, R3, and R4, and m are as defined herein, and water, wherein the polishing composition has a pH of about 1 to about 4.5. The invention further provides a method of chemically-mechanically polishing a substrate with the inventive chemical-mechanical polishing composition. Typically, the substrate contains silicon oxide, silicon nitride, and/or polysilicon.
    Type: Grant
    Filed: May 29, 2014
    Date of Patent: October 20, 2015
    Assignee: Cabot Microelectronics Corporation
    Inventors: Tina Li, Kevin Dockery, Renhe Jia, Jeffrey Dysard
  • Publication number: 20140349483
    Abstract: The invention provides a chemical-mechanical polishing composition containing a ceria abrasive and a polymer of formula I: wherein X1 and X2, Y1 and Y2, Z1 and Z2, R1, R2, R3, and R4, and m are as defined herein, and water, wherein the polishing composition has a pH of about 1 to about 4.5. The invention further provides a method of chemically-mechanically polishing a substrate with the inventive chemical-mechanical polishing composition. Typically, the substrate contains silicon oxide, silicon nitride, and/or polysilicon.
    Type: Application
    Filed: May 29, 2014
    Publication date: November 27, 2014
    Inventors: Tina LI, Kevin Dockery, Renhe Jia, Jeffrey Dysard
  • Publication number: 20060260500
    Abstract: A high-pressure fixed munition for a low-pressure launching system having a cylindrical body with a centrally located bore is provided. The bore of the munition has a reduced diameter on the charge end in which a primer charge is positioned. The bore is filled above the primer charge with a propellant and above the propellant with a payload. The payload may include multiple buckshot pellets, frangible buckshot pellets, tear gas, multiple slugs, frangible slugs, paint balls, rubber pellets, bean bags, or the like. The munition may also include a pressure disk between the propellant and the payload, and tactile ridges or on the outside surface of the munition body or be of a specific color for purposes of identification of the payload.
    Type: Application
    Filed: December 20, 2004
    Publication date: November 23, 2006
    Inventors: John Engel, Kevin Dockery, Christopher Luchini
  • Publication number: 20060052421
    Abstract: Conjugation agents of the formula: are described, wherein Sx is —S—, —SO— or —SO2—; Rs is a carbon-containing substituent that does not include a cyano group; each R is a substituent, with at least one R having a reaction site that is not a carboxylic acid; n is 0-5; each A is carbon or nitrogen, with the proviso that no more than three A can be nitrogen; and Sx—Rs is a leaving group. The conjugation agents have good thiol reactivity and selectivity, and good stability with regard to hydrolysis.
    Type: Application
    Filed: September 9, 2004
    Publication date: March 9, 2006
    Inventors: Thomas Welter, Kevin Dockery
  • Publication number: 20050222417
    Abstract: A process for forming an aryl-aryl bond comprises the step of reacting an arene hydrocarbon compound with either (1) an organic oxidant selected from the group consisting of a quinone, a quinone imine, a quinone diimine, and a nitroarene, or (2) an oxidizing salt selected from the group consisting of a triarylaminium salt, an oxonium salt, and a nitrosium salt, or (3) a hypervalent iodine compound, each in the presence of a Brönsted or Lewis acid.
    Type: Application
    Filed: March 30, 2004
    Publication date: October 6, 2005
    Inventors: Christopher Brown, Deepak Shukla, Kevin Dockery, Jerome Lenhard
  • Publication number: 20050107528
    Abstract: An element for the attachment of protein arrays, the element comprising a surface to which are attached a plurality of piperazine functional groups wherein the piperazine functional groups are represented by Formula I: where R1, R2, R3, R4, R5, R6, R7, R8, R9, R10, are hydrogen, alkyl, alkenyl, alkynyl, alkylhalo, cycloalkyl, cycloalkenyl, alkylthio, alkoxy, with the proviso that at least one of R1 to R10 be a non-labile chemical unit that attaches the piperazine functional group to the surface of the element.
    Type: Application
    Filed: November 14, 2003
    Publication date: May 19, 2005
    Inventors: Kevin Dockery, David Teegarden, Tiecheng Qiao, Brian Antalek, Susan Power
  • Patent number: 6843560
    Abstract: An ink jet printing method having the steps of: A) providing an ink jet printer that is responsive to digital data signals; B) loading the printer with an ink jet recording element having a support having thereon, in order, a hydrophilic absorbing layer and a polymeric overcoat layer of a derivitized poly(vinyl alcohol) having at least one hydroxyl group replaced by ether or ester groups, the polymeric overcoat layer also containing a sulfurous acid salt and an ammonium salt; C) loading the printer with an ink jet ink; and D) printing on the image-receiving layer using the ink jet ink in response to the digital data signals.
    Type: Grant
    Filed: August 7, 2002
    Date of Patent: January 18, 2005
    Assignee: Eastman Kodak Company
    Inventors: Charles E. Romano, Jr., Amanda R. Broska, Eric L. Boyle, Kevin Dockery
  • Publication number: 20040027438
    Abstract: An ink jet printing method having the steps of: A) providing an ink jet printer that is responsive to digital data signals; B) loading the printer with an ink jet recording element having a support having thereon, in order, a hydrophilic absorbing layer and a polymeric overcoat layer of a derivitized poly(vinyl alcohol) having at least one hydroxyl group replaced by ether or ester groups, the polymeric overcoat layer also containing a sulfurous acid salt and an ammonium salt; C) loading the printer with an ink jet ink; and D) printing on the image-receiving layer using the ink jet ink in response to the digital data signals.
    Type: Application
    Filed: August 7, 2002
    Publication date: February 12, 2004
    Applicant: Eastman Kodak Company
    Inventors: Charles E. Romano, Amanda R. Broska, Eric L. Boyle, Kevin Dockery
  • Publication number: 20040028844
    Abstract: An ink jet recording element comprising a support having thereon, in order, a hydrophilic absorbing layer and a polymeric overcoat layer having a derivitized poly(vinyl alcohol) having at least one hydroxyl group replaced by ether or ester groups, the polymeric overcoat layer also containing a sulfurous acid salt and an ammonium salt.
    Type: Application
    Filed: August 7, 2002
    Publication date: February 12, 2004
    Applicant: Eastman Kodak Company
    Inventors: Charles E. Romano, Amanda R. Broska, Eric L. Boyle, Kevin Dockery