Patents by Inventor Kevin E. Sullivan

Kevin E. Sullivan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7469831
    Abstract: A laser-based method and system for processing targeted surface material and article produced thereby are provided. The system processes the targeted surface material within a region of a workpiece while avoiding undesirable changes to adjacent non-targeted material. The system includes a primary laser subsystem including a primary laser source for generating a pulsed laser output including at least one pulse having a wavelength and a pulse width less than 1 ns. A delivery subsystem irradiates the targeted surface material of the workpiece with the pulsed laser output including the at least one pulse to texture the targeted surface material. The pulsed laser output has sufficient total fluence to initiate ablation within at least a portion of the targeted surface material and the pulse width is short enough such that the region and the non-targeted material surrounding the material are substantially free of slag.
    Type: Grant
    Filed: October 27, 2006
    Date of Patent: December 30, 2008
    Assignee: GSI Group Corporation
    Inventors: Bo Gu, Jonathan S. Ehrmann, Donald J. Svetkoff, Steven P. Cahill, Kevin E. Sullivan
  • Publication number: 20040144760
    Abstract: A system for semiconductor wafer marking is provided. The system includes: (a) a first positioning subsystem for positioning a laser marking field relative to a wafer, the positioning along a first direction; (b) an alignment vision subsystem; (c) a laser marker including a laser for marking a location within the marking field with a laser marking beam; (d) a calibration program for calibrating at least one subsystem of the system; and (e) a controller. The marking field is substantially smaller than the wafer, and the laser marker includes a scan lens for optically maintaining a spot formed by the beam on the wafer within an acceptable range about the location within the marking field so as to avoid undesirable mark variations associated with wafer sag or other variations in depth within the field.
    Type: Application
    Filed: May 15, 2003
    Publication date: July 29, 2004
    Inventors: Steven P. Cahill, Jonathan S. Ehrmann, John R. Gillespie, You C. Li, Chris Nemets, Rainer Schramm, Kevin E. Sullivan, Walter J. Leslie, Michael Woelki, Kurt Pelsue
  • Patent number: 5997813
    Abstract: A steam condensate tempering system for a steam sterilizer uses a fast temperature sensor to measure the temperature of combined water and steam condensate from a sterilizer, and a controller for controlling the flow of cool water to mix with the steam condensate in response to the temperature sensed by the temperature sensor.
    Type: Grant
    Filed: February 2, 1998
    Date of Patent: December 7, 1999
    Assignee: Commonwealth H2O Matrix
    Inventors: Francis X. Yaskoff, Kevin E. Sullivan, Alfred B. Scaramelli