Patents by Inventor Kevin Füchsel

Kevin Füchsel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Reflection-Reducing Layer System and Method for Producing A Reflection-Reducing Layer System
    Publication number: 20220018993
    Abstract: In an embodiment a layer system includes an effective refractive index profile extending between a substrate-side surface and an interface with an ambient medium, wherein an effective refractive index of the layer system decreases on average from the substrate-side surface in a direction of the interface with the ambient medium, wherein the effective refractive index profile has at least two local minima, and wherein a local minimum closest to the interface with the ambient medium is spaced from the interface.
    Type: Application
    Filed: July 8, 2021
    Publication date: January 20, 2022
    Inventors: Ulrike Schulz, Friedrich Rickelt, Peter Munzert, Anne Gärtner, Nancy Gratzke, Kevin Füchsel
  • Method for producing a reflection-reducing layer system and reflection-reducing layer system
    Patent number: 10539716
    Abstract: A reflection-reducing layer system is disclosed. In an embodiment, the system includes a refractive index gradient layer including an inorganic material and an organic material in a spatially varying composition, wherein the refractive index gradient layer has a refractive index which decreases in a growth direction and an organic layer arranged above the refractive index gradient layer, the organic layer having a surface including a nanostructure.
    Type: Grant
    Filed: March 14, 2018
    Date of Patent: January 21, 2020
    Assignee: FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V.
    Inventors: Ulrike Schulz, Friedrich Rickelt, Peter Munzert, Hanno Heiße, Heiko Knopf, Kevin Füchsel, Norbert Kaiser
  • Method for producing a reflection-reducing layer system and reflection-reducing layer system
    Publication number: 20180203162
    Abstract: A reflection-reducing layer system is disclosed. In an embodiment, the system includes a refractive index gradient layer including an inorganic material and an organic material in a spatially varying composition, wherein the refractive index gradient layer has a refractive index which decreases in a growth direction and an organic layer arranged above the refractive index gradient layer, the organic layer having a surface including a nanostructure.
    Type: Application
    Filed: March 14, 2018
    Publication date: July 19, 2018
    Inventors: Ulrike Schulz, Friedrich Rickelt, Peter Munzert, Hanno Heiße, Heiko Knopf, Kevin Füchsel, Norbert Kaiser
  • Method for producing a reflection-reducing layer system and reflection-reducing layer system
    Patent number: 9939556
    Abstract: A method for producing a reflection-reducing layer system on a substrate and a reflection-reducing layer system are disclosed. According to an embodiment the method includes depositing a refractive index gradient layer on the substrate by co-evaporation of an inorganic material and an organic material, wherein the refractive index gradient layer has a refractive index which decreases in a growth direction, depositing an organic layer above the refractive index gradient layer, and producing a nanostructure in the organic layer by a plasma etching process.
    Type: Grant
    Filed: January 27, 2016
    Date of Patent: April 10, 2018
    Assignee: Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.
    Inventors: Ulrike Schulz, Friedrich Rickelt, Peter Munzert, Hanno Heiβe, Heiko Knopf, Kevin Füchsel, Norbert Kaiser
  • Method for Producing a Reflection-Reducing Layer System and Reflection-Reducing Layer System
    Publication number: 20160216409
    Abstract: A method for producing a reflection-reducing layer system on a substrate and a reflection-reducing layer system are disclosed. According to an embodiment the method includes depositing a refractive index gradient layer on the substrate by co-evaporation of an inorganic material and an organic material, wherein the refractive index gradient layer has a refractive index which decreases in a growth direction, depositing an organic layer above the refractive index gradient layer, and producing a nanostructure in the organic layer by a plasma etching process.
    Type: Application
    Filed: January 27, 2016
    Publication date: July 28, 2016
    Inventors: Ulrike Schulz, Friedrich Rickelt, Peter Munzert, Hanno Heiße, Heiko Knopf, Kevin Füchsel, Norbert Kaiser