Patents by Inventor Kevin H. Yu
Kevin H. Yu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11760888Abstract: Materials are disclosed for the safe sequestration and removal of hazardous contaminants from a surface. The materials can be sprayed, rolled, painted, brushed or dip coated onto any surface and allowed to dry and/or cure at room temperature or drying/curing can be accelerated by the application of heat to form a coating that entraps the contaminant therein. The coating and the entrapped contaminant can then peeled from the surface and safely disposed of to minimize hazardous waste. The coating includes a colorimetric additive that is specific to the contaminant, the coating and the contaminant producing a visual indication of contamination.Type: GrantFiled: May 28, 2021Date of Patent: September 19, 2023Assignee: INNOSENSE LLCInventors: Uma Sampathkumaran, Kevin H. Yu, Raymond Winter
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Patent number: 11021615Abstract: Materials are disclosed for the safe sequestration and removal of hazardous contaminants from a surface. The materials can be sprayed, rolled, painted, brushed or dip coated onto any surface and allowed to dry and/or cure at room temperature or drying/curing can be accelerated by the application of heat to form a coating that entraps the contaminant therein. The coating and the entrapped contaminant can then peeled from the surface and safely disposed of to minimize hazardous waste. The coating includes a colorimetric additive that is specific to the contaminant, the coating and the contaminant producing a visual indication of contamination.Type: GrantFiled: May 31, 2017Date of Patent: June 1, 2021Assignee: INNOSENSE LLCInventors: Uma Sampathkumaran, Kevin H. Yu, Raymond Winter
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Patent number: 10435584Abstract: The present invention relates to hydrophilic anti-fog coatings. In particular, the coatings use two types of nanoscale particles, colloidal silica and porous organosilicate micelles, in a polyurethane matrix. The invention is an anti-fog coating for optically clear substrates (polycarbonate, polyurethane, nylon, polyester and other clear plastics) without the need for a primer and glass substrates with an additional primer layer, comprising monosized colloidal silica nanoparticles and porous organosilicate micelles in a polyurethane matrix. The silica is preferably 1-5% by weight and the micelles are loaded at 0.1 to 10% volume percentage by volume. The polyurethane prepolymer is dissolved at 10-40% by weight in a mixture of tertiary amyl alcohol and diacetone alcohol to customize for dip, flow or spray coating processes.Type: GrantFiled: December 11, 2017Date of Patent: October 8, 2019Assignee: INNOSENSE LLCInventors: Uma Sampathkumaran, Kevin H. Yu, Corey M. Selman
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Publication number: 20180100085Abstract: The present invention relates to hydrophilic anti-fog coatings. In particular, the coatings use two types of nanoscale particles, colloidal silica and porous organosilicate micelles, in a polyurethane matrix. The invention is an anti-fog coating for optically clear substrates (polycarbonate, polyurethane, nylon, polyester and other clear plastics) without the need for a primer and glass substrates with an additional primer layer, comprising monosized colloidal silica nanoparticles and porous organosilicate micelles in a polyurethane matrix. The silica is preferably 1-5% by weight and the micelles are loaded at 0.1 to 10% volume percentage by volume. The polyurethane prepolymer is dissolved at 10-40% by weight in a mixture of tertiary amyl alcohol and diacetone alcohol to customize for dip, flow or spray coating processes.Type: ApplicationFiled: December 11, 2017Publication date: April 12, 2018Inventors: Uma Sampathkumaran, Kevin H. Yu, Corey M. Selman
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Patent number: 9840639Abstract: The present invention relates to hydrophilic anti-fog coatings. In particular, the coatings use two types of nanoscale particles, colloidal silica and porous organosilicate micelles, in a polyurethane matrix. The invention is an anti-fog coating for optically clear substrates (polycarbonate, polyurethane, nylon, polyester and other clear plastics) without the need for a primer and glass or oxide substrates with an additional primer layer, comprising monosized colloidal silica nanoparticles and porous organosilicate micelles in a polyurethane matrix. The silica is preferably 1-5% by weight and the micelles are loaded at 0.1 to 10% volume percentage by volume.Type: GrantFiled: March 20, 2015Date of Patent: December 12, 2017Assignee: INNOSENSE LLCInventors: Uma Sampathkumaran, Kevin H. Yu, Corey M. Selman
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Publication number: 20170342277Abstract: Materials are disclosed for the safe sequestration and removal of hazardous contaminants from a surface. The materials can be sprayed, rolled, painted, brushed or dip coated onto any surface and allowed to dry and/or cure at room temperature or drying/curing can be accelerated by the application of heat to form a coating that entraps the contaminant therein. The coating and the entrapped contaminant can then peeled from the surface and safely disposed of to minimize hazardous waste. The coating includes a colorimetric additive that is specific to the contaminant, the coating and the contaminant producing a visual indication of contamination.Type: ApplicationFiled: May 31, 2017Publication date: November 30, 2017Inventors: Uma Sampathkumaran, Kevin H. Yu, Raymond Winter
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Publication number: 20150344725Abstract: The present invention relates to hydrophilic anti-fog coatings. In particular, the coatings use two types of nanoscale particles, colloidal silica and porous organosilicate micelles, in a polyurethane matrix. The invention is an anti-fog coating for optically clear substrates (polycarbonate, polyurethane, nylon, polyester and other clear plastics) without the need for a primer and glass or oxide substrates with an additional primer layer, comprising monosized colloidal silica nanoparticles and porous organosilicate micelles in a polyurethane matrix. The silica is preferably 1-5% by weight and the micelles are loaded at 0.1 to 10% volume percentage by volume.Type: ApplicationFiled: March 20, 2015Publication date: December 3, 2015Inventors: Corey M. Selman, Kevin H. Yu, Uma Sampathkumaran
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Patent number: 8114248Abstract: A method and system referred to as PALM (Patterning by Adhesive of Large Relief Three-Dimensional Microstructures) with large reliefs exceeding 1 ?m and being as large as 100 ?m. The microstructures can be either deterministic (such as microprisms), or random (such as diffusers), the first obtained by copying an original supermaster, and latter obtained by copying a laser speckle pattern. The master process entails copying a supermaster into the form of the microstructure constituting a pattern on the patterning cylinder (called a drum), to be then continuously multiplied in the PALM system, in a continuous roll-to-roll web process. The latter method, together with the related system, is the subject of this invention. The rolls continuously repeat the master pattern, copying by adhesive with large viscosity on acrylic (hybrid) as well as by a monolithic process. The monolithic process can be accomplished using temperature and pressure, or by UV-cured polymerization.Type: GrantFiled: January 3, 2007Date of Patent: February 14, 2012Assignee: Asahi Kasei Kabushiki KaishaInventors: Kang Lee, Nanda Nathan, Engin Arik, Thomas Forrester, Tomasz Jannson, Edward M. Kaiser, Kevin H. Yu
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Patent number: 7660024Abstract: An autostereoscopic three-dimensional liquid crystal display system and a method of making the system. The system includes a collimated backlight, a first light diffracting hologram, a second right-left interlacing hologram and a liquid crystal display. If the backlight is not collimated, a micro-collimator array is used to collimate the backlight prior to passing into the first hologram. The second right-left interlacing hologram is formed through a two step process. The process comprises positioning a photolithographic mask and a view region mask in a first position, recording the first holographic recording in the first position, shifting the photolithographic mask and the view region mask to a second position and recording the second holographic recording in the second position.Type: GrantFiled: August 1, 2001Date of Patent: February 9, 2010Assignee: Physical Optics CorporationInventors: Tin Maung Aye, Kevin H. Yu, Gajendra . Savant
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Publication number: 20080156421Abstract: A method and system referred to as PALM (Patterning by Adhesive of Large Relief Three-Dimensional Microstructures) with large reliefs exceeding 1 ?m and being as large as 100 ?m. The microstructures can be either deterministic (such as microprisms), or random (such as diffusers), the first obtained by copying an original supermaster, and latter obtained by copying a laser speckle pattern. The master process entails copying a supermaster into the form of the microstructure constituting a pattern on the patterning cylinder (called a drum), to be then continuously multiplied in the PALM system, in a continuous roll-to-roll web process. The latter method, together with the related system, is the subject of this invention. The rolls continuously repeat the master pattern, copying by adhesive with large viscosity on acrylic (hybrid) as well as by a monolithic process. The monolithic process can be accomplished using temperature and pressure, or by UV-cured polymerization.Type: ApplicationFiled: January 3, 2007Publication date: July 3, 2008Inventors: Kang Lee, Nanda Nathan, Engin Arik, Thomas Forrester, Tomasz Jannson, Edward M. Kaiser, Kevin H. Yu
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Patent number: 6563612Abstract: A collimating screen simulator comprising a projector and a holographic diffuser screen. The projector is adapted to project a viewable image onto a focal plane that is spaced from the projector. The focal plane has a backside and a viewing side opposite the focal plane backside. In operation, the projector is able to project the image onto the focal plane backside. The holographic diffuser screen is adapted to permit light from a source and incident upon a surface of the diffuser screen to pass through the screen. The holographic diffuser screen has a first surface facing the focal plane viewing side for receiving the incident light. The holographic diffuser screen also has a second surface opposite the first surface. The holographic diffuser screen is spaced from the focal plane viewing side by a distance effective for enabling a viewer facing the second surface of the holographic diffuser screen to see collimated light exiting the holographic screen.Type: GrantFiled: September 18, 2000Date of Patent: May 13, 2003Assignee: Physical Optics CorporationInventors: Tin M. Aye, Kevin H. Yu, Gajendra D. Savant
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Patent number: 6462888Abstract: A diffuser master is provided which is manufactured mechanically instead of holographically. The master can be made from a suitable substrate including relatively hard materials such as plastic, glass or metal. A substrate having a first side is worked to form a diffuser surface relief structure thereon. The substrate can be buffed using a buffing agent of a selected grit in order to form surface scratches in the first side of the substrate. The substrate can also be blasted with shot particles in order to form indentations and depressions in the first side. The substrate can alternatively be acid or alkali etched in order to form surface irregularities in the first side. The scratches, depressions or irregularities can be formed in order to create a desired surface relief and hence desired diffuser output characteristics.Type: GrantFiled: January 12, 2001Date of Patent: October 8, 2002Assignee: Physical Optics CorporationInventors: Gajendra D. Savant, Kevin H. Yu, Andrew A. Kostrzewski
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Publication number: 20020018040Abstract: The invention is directed to an autostereoscopic three-dimensional liquid crystal display system and a method of making the system. The system comprises a collimated backlight, a first light diffracting hologram, a second right-left interlacing hologram and a liquid crystal display. If the backlight is not collimated, a micro-collimator array is used to collimate the backlight prior to passing into the first hologram. The second right-left interlacing hologram is formed through a two step process. The process comprises positioning a photolithographic mask and a view region mask in a first position, recording the first holographic recording in the first position, shifting the photolithographic mask and the view region mask to a second position and recording the second holographic recording in the second position.Type: ApplicationFiled: August 1, 2001Publication date: February 14, 2002Inventors: Tin M. Aye, Kevin H. Yu, Gajendra D. Savant
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Publication number: 20010038492Abstract: A diffuser master is provided which is manufactured mechanically instead of holographically. The master can be made from a suitable substrate including relatively hard materials such as plastic, glass or metal. A substrate having a first side is worked to form a diffuser surface relief structure thereon. The substrate can be buffed using a buffing agent of a selected grit in order to form surface scratches in the first side of the substrate. The substrate can also be blasted with shot particles in order to form indentations and depressions in the first side. The substrate can alternatively be acid or alkali etched in order to form surface irregularities in the first side. The scratches, depressions or irregularities can be formed in order to create a desired surface relief and hence desired diffuser output characteristics.Type: ApplicationFiled: January 12, 2001Publication date: November 8, 2001Applicant: Physical Optics CorporationInventors: Gajendra D. Savant, Kevin H. Yu, Andrew A. Kostrzewski
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Patent number: 6241903Abstract: A diffuser master is provided which is manufactured mechanically instead of holographically. The master can be made from a suitable substrate including relatively hard materials such as plastic, glass or metal. A substrate having a first side is worked to form a diffuser surface relief structure thereon. The substrate can be buffed using a buffing agent of a selected grit in order to form surface scratches in the first side of the substrate. The substrate can also be blasted with shot particles in order to form indentations and depressions in the first side. The substrate can alternatively be acid or alkali etched in order to form surface irregularities in the first side. The scratches, depressions or irregularities can be formed in order to create a desired surface relief and hence desired diffuser output characteristics.Type: GrantFiled: August 20, 1998Date of Patent: June 5, 2001Assignee: Physical Optics CorporationInventors: Gajendra D. Savant, Kevin H. Yu, Andrew A. Kostrzewski
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Publication number: 20010002355Abstract: A diffuser master is provided which is manufactured mechanically instead of holographically. The master can be made from a suitable substrate including relatively hard materials such as plastic, glass or metal. A substrate having a first side is worked to form a diffuser surface relief structure thereon. The substrate can be buffed using a buffing agent of a selected grit in order to form surface scratches in the first side of the substrate. The substrate can also be blasted with shot particles in order to form indentations and depressions in the first side. The substrate can alternatively be acid or alkali etched in order to form surface irregularities in the first side. The scratches, depressions or irregularities can be formed in order to create a desired surface relief and hence desired diffuser output characteristics.Type: ApplicationFiled: January 12, 2001Publication date: May 31, 2001Applicant: Physical Optics CoporationInventors: Gajendra D. Savant, Kevin H. Yu, Andrew A. Kostrzewski
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Publication number: 20010001459Abstract: A diffuser master is provided which is manufactured mechanically instead of holographically. The master can be made from a suitable substrate including relatively hard materials such as plastic, glass or metal. A substrate having a first side is worked to form a diffuser surface relief structure thereon. The substrate can be buffed using a buffing agent of a selected grit in order to form surface scratches in the first side of the substrate. The substrate can also be blasted with shot particles in order to form indentations and depressions in the first side. The substrate can alternatively be acid or alkali etched in order to form surface irregularities in the first side. The scratches, depressions or irregularities can be formed in order to create a desired surface relief and hence desired diffuser output characteristics.Type: ApplicationFiled: January 12, 2001Publication date: May 24, 2001Applicant: Physical Optics CorporationInventors: Gajendra D. Savant, Kevin H. Yu, Andrew A. Kostrzewski
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Patent number: 5606433Abstract: A process for making a multilayer photopolymer hologram structure without intervening adhesive layers between component photopolymer layers.Type: GrantFiled: August 31, 1994Date of Patent: February 25, 1997Assignee: Hughes ElectronicsInventors: Khin S. Yin, Kevin H. Yu, John E. Wreede
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Patent number: 5499117Abstract: A method for transferring a photopolymer hologram from a curved exposure surface to a curved application surface including the steps of forming a release layer on the exposure surface, forming a photopolymer layer on the release layer, forming a protective layer on the photopolymer layer, recording a hologram in the photopolymer layer, removing the protective layer, attaching the laminar assembly comprised of the exposure substrate, the release layer and the photopolymer layer to the curved application surface of the final substrate with an optical adhesive layer located between the photopolymer layer and the curved application surface, and removing the exposure substrate from the release layer.Type: GrantFiled: August 31, 1994Date of Patent: March 12, 1996Assignee: Hughes Aircraft CompanyInventors: Khin S. Yin, Kevin H. Yu
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Patent number: 5401346Abstract: A hologram decal including a hologram layer having first and second surfaces, a first polymer layer secured to the first hologram surface, a second polymer layer secured to the second hologram surface, a pressure sensitive adhesive layer disposed on the non-hologram side of one of the first and second polymer layers, and a release liner covering said pressure sensitive adhesive layer, and techniques for making the hologram decal.Type: GrantFiled: March 3, 1994Date of Patent: March 28, 1995Assignee: Hughes Aircraft CompanyInventors: Khin S. Yin, John E. Wreede, Kevin H. Yu