Abstract: A method comprises obtaining a virgin asphalt and obtaining an asphalt shingle waste. The asphalt shingle waste comprises 5 wt. % to 40 wt. % of asphalt based on the total weight of the asphalt shingle waste. The asphalt shingle waste comprises 60 wt. % to 95 wt. % of limestone, granules, and/or impurities based on the total weight of the asphalt shingle waste. The method comprises obtaining a phase modifier. The method comprises mixing the virgin asphalt, the asphalt shingle waste, and the phase modifier to form an asphalt mixture. The phase modifier is present in an amount of 0.25 wt. % to 25 wt. % based on the total weight of the asphalt mixture. The asphalt mixture is configured to be applied to a roof substrate to obtain a roofing shingle.

Abstract: Methods of forming multilayer reflective polarizers are described. One method includes providing a multilayer polymer film having a plurality of alternating polymeric optical layer pairs, heating the multilayer polymer film to a temperature of about or greater than both polymers layer glass transition temperatures to from a heated multilayer film, and stretching the heated multilayer polymer film in an in-plane direction to form a multilayer reflective polarizer. Each first polymer layer includes a first polyester material and each second polymer layer includes a second polyester material that has a different polymer composition than the first polymer layer composition. The stretching includes a uniaxial stretch.

Abstract: An optical film includes a layer of simultaneous biaxially stretched polyolefin film that is substantially non-absorbing and non-scattering for at least one polarization state of visible light. The layer has x, y, and z orthogonal indices of refraction where at least two of the orthogonal indices of refraction are not equal. The layer has an in-plane retardance of 100 nm or less and an absolute value of an out-of-plane retardance being 55 nm or greater.

Abstract: A process for making an optical film includes stretching a polyolefin film in a first direction and stretching the polyolefin film in a second direction different than the first direction forming a biaxially stretched polyolefin film. At least a portion of the stretching of the polyolefin film in the second direction occurs simultaneous with the stretching of the polyolefin film in the first direction. The biaxially stretched polyolefin film has a length and a width and substantially non-absorbing and non-scattering for at least one polarization state of visible light. The biaxially stretched polyolefin film has x, y, and z orthogonal indices of refraction where at least two of the orthogonal indices of refraction are not equal, an in-plane retardance being 100 nm or less and an out-of-plane retardance being 50 nm or greater.

Abstract: A multilayer optical body is disclosed. The optical body includes an optical film including polyester, a first skin layer is disposed on at least one side of the polyester optical film, and a strippable skin layer is disposed on the first skin layer. In some embodiments, the first skin layer includes a mixture of a polyacrylate and a second polymer. Methods of making such optical bodies are also disclosed.

Abstract: A process for making an optical film includes stretching a polyolefin film in a first direction and stretching the polyolefin film in a second direction different than the first direction forming a biaxially stretched polyolefin film. At least a portion of the stretching of the polyolefin film in the second direction occurs simultaneous with the stretching of the polyolefin film in the first direction. The biaxially stretched polyolefin film has a length and a width and substantially non-absorbing and non-scattering for at least one polarization state of visible light. The biaxially stretched polyolefin film has x, y, and z orthogonal indices of refraction where at least two of the orthogonal indices of refraction are not equal, an in-plane retardance being 100 nm or less and an out-of-plane retardance being 50 nm or greater.

Abstract: The invention includes atomic layer deposition methods and apparatus.

Abstract: This invention includes chemical vapor deposition apparatus, methods of chemical vapor depositing an amorphous carbon comprising layer on a substrate, and methods of chemical vapor depositing at least one of Si3N4 and SixOyNz on a substrate. In certain implementations, a gas output manifold having at least one gas output to a deposition chamber and at least three gas inputs is utilized. In certain implementations, a remote plasma generator is utilized. In certain implementations, at least one cleaning gas input line feeds the remote plasma generator. In certain implementations, the at least one cleaning gas input line includes an amorphous carbon cleaning gas input and an Si3N4 or SixOyNz cleaning gas input.

Abstract: An optical stack includes a first liquid crystal layer and a j-retarder disposed on the liquid crystal layer. The j-retarder includes a simultaneous biaxially stretched polymeric film being substantially non-absorbing and non-scattering for at least one polarization state of visible light. The j-retarder has x, y, and z orthogonal indices of refraction where at least two of the orthogonal indices of refraction are not equal, an in-plane retardance being 100 nm or less and an absolute value for an out-of-plane retardance being 55 nm or greater.

Abstract: Optical bodies are disclosed that include a first optical film, a second optical film and at least one rough strippable boundary layer disposed between the first and second optical films. Also disclosed are optical bodies including a strippable boundary layer disposed between the first and second optical films and including a first polymer and a second polymer that is substantially immiscible in the first polymer. The present disclosure also provides methods of processing optical bodies that include stretching the optical bodies.

Abstract: Optical bodies are disclosed that include an optical film and at least one rough strippable skin layer. The at least one rough strippable skin layer can include a continuous phase and a disperse phase. In some embodiments, the at least one rough strippable skin layer can include a first polymer, a second polymer different from the first polymer and an additional material that is substantially immiscible in at least one of the first and second polymers. In some exemplary embodiments, a surface of the at least one rough strippable skin layer adjacent to the optical film comprises a plurality of protrusions and the adjacent surface of the optical film comprises a plurality of asymmetric depressions substantially corresponding to said plurality of protrusions. Methods of making such exemplary optical bodies are also disclosed.

Abstract: The present disclosure relates to optical bodies including one or more norbornene-based cyclic olefin film layers and one or more rough strippable skin layers operatively connected to a surface of the norbornene-based cyclic olefin film layer. The rough strippable skin layer comprises a continuous phase and a disperse phase. Methods of producing such optical bodies are also disclosed.

Abstract: Optical bodies are disclosed that include an optical film and at least one rough strippable skin layer operatively connected to a surface of the optical film. The at least one rough strippable skin layer can include a continuous phase and a disperse phase. Alternatively, the at least one rough strippable skin layer can include a first polymer, a second polymer different from the first polymer and an additional material that is substantially immiscible in at least one of the first and second polymers. In some exemplary embodiments, a surface of the at least one rough strippable skin layer adjacent to the optical film comprises a plurality of protrusions and the adjacent surface of the optical film comprises a plurality of asymmetric depressions substantially corresponding to said plurality of protrusions.

Abstract: A semiconductor substrate processor includes a substrate transfer chamber and a plurality of substrate processing chambers connected therewith. An interfacial structure is received between at least one of the processing chambers and the transfer chamber. The interfacial structure includes a substantially non-metallic, thermally insulative mass of material interposed between the one processing chamber and the transfer chamber. The mass is of sufficient volume to effectively reduce heat transfer from the processing chamber to the transfer chamber than would otherwise occur in the absence of said mass of material. An interfacial structure includes a body having a substrate passageway extending therethrough. The passageway includes walls at least a portion of which are substantially metallic. The body includes material peripheral of the walls which is substantially non-metallic and thermally insulative. The substantially non-metallic material has mounting openings extending at least partially therein.

Abstract: The invention includes atomic layer deposition methods and apparatus.

Abstract: An optical film includes a layer of simultaneously biaxially stretched polyolefin film that is substantially non-absorbing and non-scattering for at least one polarization state of visible light. The layer has x, y, and z orthogonal indices of refraction where at least two of the orthogonal indices of refraction are not equal. The layer has an in-plane retardance of 100 nm or less and an out-of-plane retardance of 50 nm or greater.

Abstract: A method and system are presented for monitoring the optical emissions associated a plasma used in integrated circuit fabrication. The optical emissions may be processed by an optical spectrometer to obtain a spectrum. The spectrum may be analyzed to determine the presence of particular disassociated species which are indicative of the presence of a suitable plasma and which may be desired for a deposition, etching, or cleaning process.

Abstract: A simultaneously biaxially oriented polypropylene film is formed from a propylene containing polymer resin. The film has a machine direction and a transverse direction. The oriented film has a tensile strength in the machine direction of at least 190 N/mm2, and a normalized haze value of less than or equal to 8%/mm.

Abstract: The invention includes a method of forming a layer on a semiconductor substrate that is provided within a reaction chamber. The chamber has at least two inlet ports that terminate in openings. A first material is flowed into the reaction chamber through the opening of a first of the inlet ports. At least a portion of the first material is deposited onto the substrate. The reaction chamber is purged by flowing an inert material into the reaction chamber through the opening of a second of the inlet ports. The inert material passes from the opening and through a distribution head that is positioned within the reaction chamber between the first and second openings. A second material can then be flowed into the chamber through an opening in a third inlet port and deposited onto the substrate. The invention also includes a chemical vapor deposition apparatus.

Abstract: This invention includes chemical vapor deposition apparatus, methods of chemical vapor depositing an amorphous carbon comprising layer on a substrate, and methods of chemical vapor depositing at least one of Si3N4 and SixOyNz on a substrate. In certain implementations, a gas output manifold having at least one gas output to a deposition chamber and at least three gas inputs is utilized. In certain implementations, a remote plasma generator is utilized. In certain implementations, at least one cleaning gas input line feeds the remote plasma generator. In certain implementations, the at least one cleaning gas input line includes an amorphous carbon cleaning gas input and an Si3N4 or SixOyNz cleaning gas input.