Abstract: A crack stop structure for an integrated circuit (IC) structure is disclosed. The structure can include: a first crack stop pillar laterally separated from a second crack stop pillar within an insulator region of the IC structure. The first crack stop pillar can include an overlapping via in contact with a top surface and at least one side surface of a first conductive element therebelow. The overlapping via of the first crack stop pillar may be in a given layer of the IC structure, and the second crack stop pillar may include a via in the given layer, the via extending to a different depth than the overlapping via. The via of the second crack stop pillar may be an overlapping via in contact with a top surface and at least one side surface of a second conductive element therebelow.

Abstract: A crack stop structure for an integrated circuit (IC) structure is disclosed. The structure can include: a first crack stop pillar laterally separated from a second crack stop pillar within an insulator region of the IC structure. The first crack stop pillar can include an overlapping via in contact with a top surface and at least one side surface of a first conductive element therebelow. The overlapping via of the first crack stop pillar may be in a given layer of the IC structure, and the second crack stop pillar may include a via in the given layer, the via extending to a different depth than the overlapping via. The via of the second crack stop pillar may be an overlapping via in contact with a top surface and at least one side surface of a second conductive element therebelow.

Abstract: A method for accessing a reverse channel for communication from a remote unit to a base station is disclosed. The method includes waiting a random period of time in response to determining that the reverse channel is available at a first time. The method also includes monitoring a forward channel after expiration of the random period of time to determine whether the reverse channel is available at a second time. The method further includes transmitting a first portion of data on the reverse channel in response to determining that the reverse channel is available at the second time.

Abstract: A processing system and method. The processing system includes a processing tool, an electrostatic chuck (ESC) arranged within the processing tool, and a system that at least one of detects at least one of an ESC bias spike and an ESC current spike of the ESC and determines when an ESC bias voltage is zero or exceeds a threshold value. The method includes at least one of detecting at least one of an ESC bias spike and an ESC current spike of the ESC, and determining when an ESC bias voltage is zero or exceeds a threshold value. The system and method can be used in real time ESC and plasma processing diagnostics to minimize yield loss and wafer scrap.

Abstract: A method for accessing a reverse channel for communication from a remote unit to a base station is disclosed. The method includes waiting a random period of time in response to determining that the reverse channel is available at a first time. The method also includes monitoring a forward channel after expiration of the random period of time to determine whether the reverse channel is available at a second time. The method further includes transmitting a first portion of data on the reverse channel in response to determining that the reverse channel is available at the second time.

Abstract: A method for accessing a reverse channel for communication from a remote unit to a base station is disclosed. The method includes waiting a random period of time in response to determining that the reverse channel is available at a first time. The method also includes monitoring a forward channel after expiration of the random period of time to determine whether the reverse channel is available at a second time. The method further includes transmitting a first portion of data on the reverse channel in response to determining that the reverse channel is available at the second time.

Abstract: A processing system and method. The processing system includes a processing tool, an electrostatic chuck (ESC) arranged within the processing tool, and a system that at least one of detects at least one of an ESC bias spike and an ESC current spike of the ESC and determines when an ESC bias voltage is zero or exceeds a threshold value. The method includes at least one of detecting at least one of an ESC bias spike and an ESC current spike of the ESC, and determining when an ESC bias voltage is zero or exceeds a threshold value. The system and method can be used in real time ESC and plasma processing diagnostics to minimize yield loss and wafer scrap.

Abstract: A method for accessing a reverse channel for communication from a remote unit to a base station is disclosed. The method includes waiting a random period of time in response to determining that the reverse channel is available at a first time. The method also includes monitoring a forward channel after expiration of the random period of time to determine whether the reverse channel is available at a second time. The method further includes transmitting a first portion of data on the reverse channel in response to determining that the reverse channel is available at the second time.