Patents by Inventor Kevin M. CHO

Kevin M. CHO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240148332
    Abstract: Devices, systems, and techniques are disclosed for verifying the occurrence of an acute health event. An example device includes communication circuitry configured to receive a communication indicative of an acute health event of a patient and memory communicatively coupled to the communication circuitry and being configured to store the indication of the acute health event. The device includes processing circuitry communicatively coupled to the communication circuitry and the memory. The processing circuitry is configured to, in response to the communication, verify the acute health event and based on the verification of the acute health event, send an alert regarding the acute health event.
    Type: Application
    Filed: February 10, 2022
    Publication date: May 9, 2024
    Inventors: Paul G. Krause, Robert W. Stadler, Paul J. DeGroot, Ryan D. Wyszynski, Megan Connolly, Grant A. Neitzell, Shantanu Sarkar, Christopher D. Koch, Yong K. Cho, Ana C. Natera, Kevin T. Ousdigian, Wade M. Demmer, Abhijit P. Jejurkar
  • Publication number: 20240077309
    Abstract: The present disclosure generally relates to displaying information related to a physical activity. In some embodiments, methods and user interfaces for managing the display of information related to a physical activity are described.
    Type: Application
    Filed: January 12, 2023
    Publication date: March 7, 2024
    Inventors: Nicholas D. FELTON, James B. CARY, Edward CHAO, Kevin W. CHEN, Christopher P. FOSS, Eamon F. GILRAVI, Austen J. GREEN, Bradley W. GRIFFIN, Anders K. HAGLUNDS, Lori HYLAN-CHO, Stephen P. JACKSON, Matthew S. KOONCE, Paul T. NIXON, Robert M. PEARSON
  • Publication number: 20170125241
    Abstract: Methods of single precursor deposition of hardmask and ARC layers, are described. The resultant film is a SiOC layer with higher carbon content terminated with high density silicon oxide SiO2 layer with low carbon content. The method can include delivering a first deposition precursor to a substrate, the first deposition precursor comprising an SiOC precursor and a first flow rate of an oxygen containing gas; activating the deposition species using a plasma, whereby a SiOC containing layer over an exposed surface of the substrate is deposited. Then delivering a second precursor gas to the SiOC containing layer, the second deposition gas comprising different or same SiOC precursor with a second flow rate and a second flow rate of the oxygen containing gas and activating the deposition gas using a plasma, the second deposition gas forming a SiO2 containing layer over the hardmask, the SiO2 containing layer having very low carbon.
    Type: Application
    Filed: March 18, 2016
    Publication date: May 4, 2017
    Inventors: Shaunak MUKHERJEE, Kang Sub YIM, Deenesh PADHI, Kevin M. CHO, Khoi Anh PHAN, Chien-An CHEN, Priyanka DASH