Patents by Inventor Kevin M. Welsh

Kevin M. Welsh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Antireflective coating for microlithography
    Patent number: 5607824
    Abstract: A co-polymer of benzophenone and bisphenol A has been shown to have DUV absorption properties. Therefore, the co-polymer has particular utility as an antireflective coating in microlithography applications. Incorporating anthracene into the co-polymer backbone enhances absorption at 248 nm. The endcapper used for the co-polymer can vary widely depending on the needs of the user and can be selected to promote adhesion, stability, and absorption of different wavelengths.
    Type: Grant
    Filed: July 27, 1994
    Date of Patent: March 4, 1997
    Assignee: International Business Machines Corporation
    Inventors: James T. Fahey, Brian W. Herbst, Leo L. Linehan, Wayne M. Moreau, Gary T. Spinillo, Kevin M. Welsh, Robert L. Wood
  • Mid and deep-UV antireflection coatings and methods for use thereof
    Patent number: 5554485
    Abstract: An antireflective coating composition for use with chemically amplified photoresist compositions comprising a polymer composition which is highly absorbent to mid and deep UV radiation, which is substantially inert to contact reactions with a chemically amplified photoresist composition, and which is insoluble in the developer for the chemically amplified photoresist composition.
    Type: Grant
    Filed: September 29, 1994
    Date of Patent: September 10, 1996
    Assignee: International Business Machines Corporation
    Inventors: Robert R. Dichiara, James T. Fahey, Pamela E. Jones, Christopher F. Lyons, Wayne M. Moreau, Ratnam Sooriyakumaran, Gary T. Spinillo, Kevin M. Welsh, Robert L. Wood
  • Mid and deep-uv antireflection coatings and methods for use thereof
    Patent number: 5482817
    Abstract: An antireflective coating composition (ARC) for use with chemically amplified photoresist compositions comprising a polymer composition which is highly absorbent to mid and deep UV radiation, which is substantially inert to contact reactions with a chemically amplified photoresist composition, and which is insoluble in the developer for the chemically amplified photoresist composition.
    Type: Grant
    Filed: September 29, 1994
    Date of Patent: January 9, 1996
    Assignee: International Business Machines Corporation
    Inventors: Robert R. Dichiara, Christopher F. Lyons, Ratnasabapathy Sooriyakumaran, Gary T. Spinillo, Kevin M. Welsh, Robert L. Wood
  • Mid and deep-UV antireflection coatings and methods for use thereof
    Patent number: 5401614
    Abstract: An antireflective coating composition for use with chemically amplified photoresist compositions comprising a polymer composition which is highly absorbent to mid and deep UV radiation, which is substantially inert to contact reactions with a chemically amplified photoresist composition, and which is insoluble in the developer for the chemically amplified photoresist composition.
    Type: Grant
    Filed: February 16, 1993
    Date of Patent: March 28, 1995
    Assignee: International Business Machines Corporation
    Inventors: Robert R. Dichiara, James T. Fahey, Pamela E. Jones, Christopher F. Lyons, Wayne M. Moreau, Ratnam Sooriyakumaran, Gary T. Spinillo, Kevin M. Welsh, Robert L. Wood
  • Mid and deep-UV antireflection coatings and methods for use thereof
    Patent number: 5380621
    Abstract: An antireflective coating composition (ARC) for use with chemically amplified photoresist compositions comprising a polymer composition which is highly absorbent to mid and deep UV radiation, which is substantially inert to contact reactions with a chemically amplified photoresist composition, and which is insoluble in the developer for the chemically amplified photoresist composition.
    Type: Grant
    Filed: May 3, 1993
    Date of Patent: January 10, 1995
    Assignee: International Business Machines Corporation
    Inventors: Robert R. Dichiara, Christopher F. Lyons, Ratnasabapathy Sooriyakumaran, Gary T. Spinillo, Kevin M. Welsh, Robert L. Wood
  • Radiation-sensitive resist composition and process for its use
    Patent number: 5372912
    Abstract: The present invention relates to a radiation-sensitive resist composition and the process for its use in the manufacture of integrated circuits. The composition comprises a radiation-sensitive acid generator, a binder soluble in aqueous base and an acrylate copolymer having acid labile pendant groups.
    Type: Grant
    Filed: December 31, 1992
    Date of Patent: December 13, 1994
    Assignee: International Business Machines Corporation
    Inventors: Robert D. Allen, Jr. Conley, William D. Hinsberg, III, Pamela E. Jones, Kevin M. Welsh
  • Speed enhancers for acid sensitized resists
    Patent number: 5164278
    Abstract: Acid sensitized photoresists with enhanced photospeed are provided. The photoresist compositions include a polymer binder and/or a polymerizable compound and an acid sensitive group which enables patterning of the resist composition, and acid generating photoinitiator, and an hydroxy aromatic compound which enhances the speed of the resist composition under imaging radiation.
    Type: Grant
    Filed: March 1, 1990
    Date of Patent: November 17, 1992
    Assignee: International Business Machines Corporation
    Inventors: William R. Brunsvold, Christopher J. Knors, Melvin W. Montgomery, Wayne M. Moreau, Kevin M. Welsh