Patents by Inventor Kevin McMullen

Kevin McMullen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10458472
    Abstract: In one aspect, the present disclosure provides a sliding bearing system, comprising (a) a base plate, (b) one or more force measuring sensors, wherein each of the one or more force measuring sensors includes a top surface and a bottom surface, and wherein the bottom surface of each of the one or more force measuring sensors is coupled to the base plate, and (c) a first sliding surface coupled to the top surface of each of the one or more force measuring sensors.
    Type: Grant
    Filed: May 9, 2017
    Date of Patent: October 29, 2019
    Assignee: University of Connecticut
    Inventors: Arash Esmaili Zaghi, Kevin McMullen, Michael V. Hoagland
  • Publication number: 20170328407
    Abstract: In one aspect, the present disclosure provides a sliding bearing system, comprising (a) a base plate, (b) one or more force measuring sensors, wherein each of the one or more force measuring sensors includes a top surface and a bottom surface, and wherein the bottom surface of each of the one or more force measuring sensors is coupled to the base plate, and (c) a first sliding surface coupled to the top surface of each of the one or more force measuring sensors.
    Type: Application
    Filed: May 9, 2017
    Publication date: November 16, 2017
    Inventors: Arash Esmaili Zaghi, Kevin McMullen, Michael V. Hoagland
  • Patent number: 9745119
    Abstract: A dual containment pod having an outer pod and an inner pod that provides support structure and environmental control means. The inner pod includes a base having a flat, polished surface with protrusions upon which the reticle seats and providing a gap between the reticle and the polished surface. The gap separates the reticle from the flat, polished surface of the base and is dimensioned to inhibit migration of particles into the gap, thereby preventing contamination of sensitive surfaces of the wafer or reticle. The top cover of the inner pod seats on the polished surface proximate a periphery of the base. Moveable reticle engaging pins on the top cover of the inner pod are engaged by the top cover of the outer container when the inner pod is assembled inside the outer pod providing reticle restraint.
    Type: Grant
    Filed: December 23, 2013
    Date of Patent: August 29, 2017
    Assignee: Entegris, Inc.
    Inventors: Steven P. Kolbow, Kevin McMullen, Anthony M. Tieben, Matthew Kusz, David L. Halbmaier, John Lystad
  • Publication number: 20140183076
    Abstract: A dual containment pod having an outer pod and an inner pod that provides support structure and environmental control means. The inner pod includes a base having a flat, polished surface with protrusions upon which the reticle seats and providing a gap between the reticle and the polished surface. The gap separates the reticle from the flat, polished surface of the base and is dimensioned to inhibit migration of particles into the gap, thereby preventing contamination of sensitive surfaces of the wafer or reticle. The top cover of the inner pod seats on the polished surface proximate a periphery of the base. Moveable reticle engaging pins on the top cover of the inner pod are engaged by the top cover of the outer container when the inner pod is assembled inside the outer pod providing reticle restraint.
    Type: Application
    Filed: December 23, 2013
    Publication date: July 3, 2014
    Applicant: Entegris, Inc.
    Inventors: Steven P. Kolbow, Kevin McMullen, Anthony M. Tieben, Matthew Kusz, David L. Halbmaier, John Lystad
  • Patent number: 8613359
    Abstract: A dual containment pod having an outer pod and an inner pod that provides support structure and environmental control means. The inner pod includes a base having a flat, polished surface with protrusions upon which the reticle seats and providing a gap between the reticle and the polished surface. The gap separates the reticle from the flat, polished surface of the base and is dimensioned to inhibit migration of particles into the gap, thereby preventing contamination of sensitive surfaces of the wafer or reticle. The top cover of the inner pod seats on the polished surface proximate a periphery of the base. Moveable reticle engaging pins on the top cover of the inner pod are engaged by the top cover of the outer container when the inner pod is assembled inside the outer pod providing reticle restraint.
    Type: Grant
    Filed: July 30, 2012
    Date of Patent: December 24, 2013
    Assignee: Entegris, Inc.
    Inventors: Steven Kolbow, Kevin McMullen, Anthony M. Tieben, Matthew Kusz, Christian Andersen, Huaping Wang, Michael Cisewski, Michael L. Johnson, David L. Halbmaier, John Lystad
  • Publication number: 20130020220
    Abstract: A dual containment pod having an outer pod and an inner pod that provides support structure and environmental control means. The inner pod includes a base having a flat, polished surface with protrusions upon which the reticle seats and providing a gap between the reticle and the polished surface. The gap separates the reticle from the flat, polished surface of the base and is dimensioned to inhibit migration of particles into the gap, thereby preventing contamination of sensitive surfaces of the wafer or reticle. The top cover of the inner pod seats on the polished surface proximate a periphery of the base. Moveable reticle engaging pins on the top cover of the inner pod are engaged by the top cover of the outer container when the inner pod is assembled inside the outer pod providing reticle restraint.
    Type: Application
    Filed: July 30, 2012
    Publication date: January 24, 2013
    Applicant: ENTEGRIS, INC.
    Inventors: Steven P. Kolbow, Kevin McMullen, Anthony Mathius Tieben, Matthew Kusz, Christian Andersen, Huaping Wang, Michael Cisewski, Michael L. Johnson, David L. Halbmaier, John Lystad
  • Patent number: 8231005
    Abstract: A container that provides support structure and environmental control means including, for example, minimal contact with a wafer or reticle contained therein that cooperates with wafer or reticle to provide a diffusion barrier mitigates against particles settling on a face of the wafer or reticle. The container includes a base having a flat, polished surface with protrusions upon which the wafer or reticle rests. The protrusions are of a geometry, such as a sphere, that imparts minimum contact with the wafer or reticle and suspends the wafer or reticle over the base, providing a gap therebetween. The gap isolates the wafer or reticle from the flat, polished surface of the base, but is dimensioned to inhibit migration of particles into the gap, thereby preventing contamination of sensitive surfaces of the wafer or reticle. Diffusion filters provide pressure equalization without filter media. Moveable reticle pins on the top cover provide reticle restraint.
    Type: Grant
    Filed: September 27, 2006
    Date of Patent: July 31, 2012
    Assignee: Entegris, Inc.
    Inventors: Steven P. Kolbow, Kevin McMullen, Anthony Mathius Tieben, Matthew Kusz, Christian Andersen, Huaping Wang, Michael Cisewski, Michael L. Johnson, David L. Halbmaier, John Lystad
  • Publication number: 20090301917
    Abstract: A container that provides support structure and environmental control means including, for example, minimal contact with a wafer or reticle contained therein that cooperates with wafer or reticle to provide a diffusion barrier mitigates against particles settling on a face of the wafer or reticle. The container includes a base having a flat, polished surface with protrusions upon which the wafer or reticle rests. The protrusions are of a geometry, such as a sphere, that imparts minimum contact with the wafer or reticle and suspends the wafer or reticle over the base, providing a gap therebetween. The gap isolates the wafer or reticle from the flat, polished surface of the base, but is dimensioned to inhibit migration of particles into the gap, thereby preventing contamination of sensitive surfaces of the wafer or reticle. Diffusion filters provide pressure equalization without filter media. Moveable reticle pins on the top cover provide reticle restraint.
    Type: Application
    Filed: September 27, 2006
    Publication date: December 10, 2009
    Applicant: ENTEGRIS, INC.
    Inventors: Steven Kolbow, Kevin McMullen, Anthony M. Tieben, Matthew Kusz, Christian Andersen, Huaping Wang, Michael Cisewski, Michael L. Johnson, David L. Halbmaier, John Lystad