Patents by Inventor Kevin Michael O'Brien
Kevin Michael O'Brien has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11768438Abstract: A method includes driving, while producing a burst of pulses at a pulse repetition rate, a spectral feature adjuster among a set of discrete states at a frequency correlated with the pulse repetition rate; and in between the production of the bursts of pulses (while no pulses are being produced), driving the spectral feature adjuster according to a driving signal defined by a set of parameters. Each discrete state corresponds to a discrete value of a spectral feature. The method includes ensuring that the spectral feature adjuster is in one of the discrete states that corresponds to a discrete value of the spectral feature of the amplified light beam when a pulse in the next burst is produced by adjusting one or more of: an instruction to the lithography exposure apparatus, the driving signal to the spectral feature adjuster, and/or the instruction to the optical source.Type: GrantFiled: October 21, 2022Date of Patent: September 26, 2023Assignee: Cymer, LLCInventors: Kevin Michael O'Brien, Thomas Patrick Duffey, Joshua Jon Thornes
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Publication number: 20230040812Abstract: A method includes driving, while producing a burst of pulses at a pulse repetition rate, a spectral feature adjuster among a set of discrete states at a frequency correlated with the pulse repetition rate; and in between the production of the bursts of pulses (while no pulses are being produced), driving the spectral feature adjuster according to a driving signal defined by a set of parameters. Each discrete state corresponds to a discrete value of a spectral feature. The method includes ensuring that the spectral feature adjuster is in one of the discrete states that corresponds to a discrete value of the spectral feature of the amplified light beam when a pulse in the next burst is produced by adjusting one or more of: an instruction to the lithography exposure apparatus, the driving signal to the spectral feature adjuster, and/or the instruction to the optical source.Type: ApplicationFiled: October 21, 2022Publication date: February 9, 2023Inventors: Kevin Michael O'Brien, Thomas Patrick Duffey, Joshua Jon Thornes
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Patent number: 11526083Abstract: A method includes driving, while producing a burst of pulses at a pulse repetition rate, a spectral feature adjuster among a set of discrete states at a frequency correlated with the pulse repetition rate; and in between the production of the bursts of pulses (while no pulses are being produced), driving the spectral feature adjuster according to a driving signal defined by a set of parameters. Each discrete state corresponds to a discrete value of a spectral feature. The method includes ensuring that the spectral feature adjuster is in one of the discrete states that corresponds to a discrete value of the spectral feature of the amplified light beam when a pulse in the next burst is produced by adjusting one or more of: an instruction to the lithography exposure apparatus, the driving signal to the spectral feature adjuster, and/or the instruction to the optical source.Type: GrantFiled: March 1, 2019Date of Patent: December 13, 2022Assignee: Cymer, LLCInventors: Kevin Michael O'Brien, Thomas Patrick Duffey, Joshua Jon Thornes
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Patent number: 11050213Abstract: Online calibration of laser performance as a function of the repetition rate at which the laser is operated is disclosed. The calibration can be periodic and carried out during a scheduled during a non-exposure period. Various criteria can be used to automatically select the repetition rates that result in reliable in-spec performance. The reliable values of repetition rates are then made available to the scanner as allowed values and the laser/scanner system is then permitted to use those allowed repetition rates.Type: GrantFiled: June 24, 2020Date of Patent: June 29, 2021Assignees: Cymer, LLC, ASML Netherlands B.V.Inventors: Joshua Jon Thornes, Tanuj Aggarwal, Kevin Michael O'Brien, Frank Everts, Herman Philip Godfried, Russell Allen Burdt
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Publication number: 20210018846Abstract: A method includes driving, while producing a burst of pulses at a pulse repetition rate, a spectral feature adjuster among a set of discrete states at a frequency correlated with the pulse repetition rate; and in between the production of the bursts of pulses (while no pulses are being produced), driving the spectral feature adjuster according to a driving signal defined by a set of parameters. Each discrete state corresponds to a discrete value of a spectral feature. The method includes ensuring that the spectral feature adjuster is in one of the discrete states that corresponds to a discrete value of the spectral feature of the amplified light beam when a pulse in the next burst is produced by adjusting one or more of: an instruction to the lithography exposure apparatus, the driving signal to the spectral feature adjuster, and/or the instruction to the optical source.Type: ApplicationFiled: March 1, 2019Publication date: January 21, 2021Inventors: Kevin Michael O'Brien, Thomas Patrick Duffey, Joshua Jon Thornes
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Publication number: 20200321746Abstract: Online calibration of laser performance as a function of the repetition rate at which the laser is operated is disclosed. The calibration can be periodic and carried out during a scheduled during a non-exposure period. Various criteria can be used to automatically select the repetition rates that result in reliable in-spec performance. The reliable values of repetition rates are then made available to the scanner as allowed values and the laser/scanner system is then permitted to use those allowed repetition rates.Type: ApplicationFiled: June 24, 2020Publication date: October 8, 2020Inventors: Joshua Jon Thornes, Tanuj Aggarwal, Kevin Michael O'Brien, Frank Everts, Herman Philip Godfried, Russell Allen Burdt
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Patent number: 10727642Abstract: Online calibration of laser performance as a function of the repetition rate at which the laser is operated is disclosed. The calibration can be periodic and carried out during a scheduled during a non-exposure period. Various criteria can be used to automatically select the repetition rates that result in reliable in-spec performance. The reliable values of repetition rates are then made available to the scanner as allowed values and the laser/scanner system is then permitted to use those allowed repetition rates.Type: GrantFiled: September 11, 2017Date of Patent: July 28, 2020Assignees: Cymer, LLC, ASML Netherlands B.V.Inventors: Joshua Jon Thornes, Tanuj Aggarwal, Kevin Michael O'Brien, Frank Everts, Herman Philip Godfried, Russell Allen Burdt
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Patent number: 10627724Abstract: A method of controlling output of a radiation source, the method including: periodically monitoring an output energy of the radiation source; determining a difference between a reference energy signal and the monitored output energy; determining a feedback value; determining a desired output energy of the radiation source for a subsequent time period; and controlling an input parameter of the radiation source in dependence on the determined desired output energy during the subsequent time period. If the magnitude of the determined difference between the monitored output energy of the radiation source and the reference energy signal exceeds a threshold value: the determined difference does not contribute to the feedback value; and the determined difference is spread over the subsequent time period according to a reference energy signal adjustment profile and the reference energy signal adjustment profile is added to the reference energy signal for the subsequent time period.Type: GrantFiled: August 23, 2016Date of Patent: April 21, 2020Assignees: ASML Netherlands B.V., CYMER, LLCInventors: Frank Everts, Wilhelmus Patrick Elisabeth Maria Op 't Root, Herman Philip Godfried, Joshua Jon Thornes, Kevin Michael O'Brien, Leon Pieter Paul Saanen, Tanuj Aggarwal
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Patent number: 10407204Abstract: A garnish tray for whole garnish includes a plurality of wells having an opening at one end defined by sidewalls extending from a top surface to a bottom surface to define a well depth; and a plurality of channels extending between adjacent wells, wherein the plurality of channels extend from the top surface to a channel depth equal to or less than the well depth. Also disclosed are processes for serving the whole garnish.Type: GrantFiled: May 26, 2015Date of Patent: September 10, 2019Inventor: Kevin Michael O Brien
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Publication number: 20180253014Abstract: A method of controlling output of a radiation source, the method including: periodically monitoring an output energy of the radiation source; determining a difference between a reference energy signal and the monitored output energy; determining a feedback value; determining a desired output energy of the radiation source for a subsequent time period; and controlling an input parameter of the radiation source in dependence on the determined desired output energy during the subsequent time period. If the magnitude of the determined difference between the monitored output energy of the radiation source and the reference energy signal exceeds a threshold value: the determined difference does not contribute to the feedback value; and the determined difference is spread over the subsequent time period according to a reference energy signal adjustment profile and the reference energy signal adjustment profile is added to the reference energy signal for the subsequent time period.Type: ApplicationFiled: August 23, 2016Publication date: September 6, 2018Applicants: ASML Netherlands B.V., Cymer, LLCInventors: Frank EVERTS, Wilhelmus Patrick Elisabeth Maria OP 'T ROOT, Herman Philip GODFRIED, Joshua Jon THORNES, Kevin Michael O"BRIEN, Leon Pieter Paul SAANEN, Tanuj AGGARWAL
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Publication number: 20180006425Abstract: Online calibration of laser performance as a function of the repetition rate at which the laser is operated is disclosed. The calibration can be periodic and carried out during a scheduled during a non-exposure period. Various criteria can be used to automatically select the repetition rates that result in reliable in-spec performance. The reliable values of repetition rates are then made available to the scanner as allowed values and the laser/scanner system is then permitted to use those allowed repetition rates.Type: ApplicationFiled: September 11, 2017Publication date: January 4, 2018Inventors: Joshua Jon Thornes, Tanuj Aggarwal, Kevin Michael O'Brien, Frank Everts, Herman Philip Godfried, Russell Allen Burdt
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Patent number: 9762023Abstract: Online calibration of laser performance as a function of the repetition rate at which the laser is operated is disclosed. The calibration can be periodic and carried out during a scheduled during a non-exposure period. Various criteria can be used to automatically select the repetition rates that result in reliable in-spec performance. The reliable values of repetition rates are then made available to the scanner as allowed values and the laser/scanner system is then permitted to use those allowed repetition rates.Type: GrantFiled: December 21, 2015Date of Patent: September 12, 2017Assignees: CYMER, LLC, ASML NETHERLANDS B.V.Inventors: Joshua Jon Thornes, Tanuj Aggarwal, Kevin Michael O'Brien, Frank Everts, Herman Philip Godfried, Russell Allen Burdt
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Publication number: 20170179677Abstract: Online calibration of laser performance as a function of the repetition rate at which the laser is operated is disclosed. The calibration can be periodic and carried out during a scheduled during a non-exposure period. Various criteria can be used to automatically select the repetition rates that result in reliable in-spec performance. The reliable values of repetition rates are then made available to the scanner as allowed values and the laser/scanner system is then permitted to use those allowed repetition rates.Type: ApplicationFiled: December 21, 2015Publication date: June 22, 2017Inventors: Joshua Jon THORNES, Tanuj AGGARWAL, Kevin Michael O'BRIEN, Frank EVERTS, Herman Philip GODFRIED, Russell Allen BURDT
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Publication number: 20160345764Abstract: A garnish tray for whole garnish includes a plurality of wells having an opening at one end defined by sidewalls extending from a top surface to a bottom surface to define a well depth; and a plurality of channels extending between adjacent wells, wherein the plurality of channels extend from the top surface to a channel depth equal to or less than the well depth. Also disclosed are processes for serving the whole garnish.Type: ApplicationFiled: May 26, 2015Publication date: December 1, 2016Inventor: Kevin Michael O'Brien
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Patent number: 8873600Abstract: Systems and methods for automatically performing a high accuracy gas refill in a laser chamber of a two chamber gas discharge laser such as an excimer laser are disclosed. Based upon a target pressure and halogen concentration that is either predetermined or entered by a user, and with no further user action, a non-halogen containing gas is added to the chamber to a first pressure, followed by the addition of halogen containing gas to a second pressure which is greater than a target pressure for the chamber, such that the halogen content in the gas at the second pressure is at a desired concentration. The gas in the chamber is bled until the pressure drops to the target pressure. The amount of non-halogen containing gas added is estimated automatically, and the amount of halogen containing gas is measured so that the desired concentration is obtained, taking into account both temperature and any gas remaining in the fill pipes from prior laser operation.Type: GrantFiled: June 30, 2011Date of Patent: October 28, 2014Assignee: Cymer, LLCInventors: Rui Jiang, Joshua Jon Thornes, Daniel Jason Riggs, Kevin Michael O'Brien
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Patent number: 8411720Abstract: A system and method for automatically performing gas optimization after a refill in the chambers of a two chamber gas discharge laser such as an excimer laser is disclosed. The laser is continuously fired at a low power output, and the gas in the amplifier laser chamber bled if necessary until the discharge voltage meets or exceeds a minimum value without dropping the pressure below a minimum value. The power output is increased, and the gas bled again if necessary until the voltage and pressure meet or exceed the minimum values. The laser is then fired in a burst pattern that approximates the expected firing of the laser in operation, and the gas bled if necessary until the discharge voltage meets or exceeds the minimum value and the output energy meets or exceeds a minimum value, again without dropping the pressure in the chamber below the minimum value. Once the minimum values are provided, the process runs quickly without manual interaction.Type: GrantFiled: June 30, 2011Date of Patent: April 2, 2013Assignee: Cymer, Inc.Inventors: Kevin Michael O'Brien, Joshua Jon Thornes, Daniel Jason Riggs, Rui Jiang
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Publication number: 20130003773Abstract: A system and method for automatically performing gas optimization after a refill in the chambers of a two chamber gas discharge laser such as an excimer laser is disclosed. The laser is continuously fired at a low power output, and the gas in the amplifier laser chamber bled if necessary until the discharge voltage meets or exceeds a minimum value without dropping the pressure below a minimum value. The power output is increased, and the gas bled again if necessary until the voltage and pressure meet or exceed the minimum values. The laser is then fired in a burst pattern that approximates the expected firing of the laser in operation, and the gas bled if necessary until the discharge voltage meets or exceeds the minimum value and the output energy meets or exceeds a minimum value, again without dropping the pressure in the chamber below the minimum value. Once the minimum values are provided, the process runs quickly without manual interaction.Type: ApplicationFiled: June 30, 2011Publication date: January 3, 2013Applicant: CYMER, INC.Inventors: Kevin Michael O'Brien, Joshua Jon Thornes, Daniel Jason Riggs, Rui Jiang
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Publication number: 20130000773Abstract: Systems and methods for automatically performing a high accuracy gas refill in a laser chamber of a two chamber gas discharge laser such as an excimer laser are disclosed. Based upon a target pressure and halogen concentration that is either predetermined or entered by a user, and with no further user action, a non-halogen containing gas is added to the chamber to a first pressure, followed by the addition of halogen containing gas to a second pressure which is greater than a target pressure for the chamber, such that the halogen content in the gas at the second pressure is at a desired concentration. The gas in the chamber is bled until the pressure drops to the target pressure. The amount of non-halogen containing gas added is estimated automatically, and the amount of halogen containing gas is measured so that the desired concentration is obtained, taking into account both temperature and any gas remaining in the fill pipes from prior laser operation.Type: ApplicationFiled: June 30, 2011Publication date: January 3, 2013Applicant: CYMER, INC.Inventors: Rui Jiang, Joshua Jon Thornes, Daniel Jason Riggs, Kevin Michael O'Brien