Abstract: An apparatus includes semiconductor processing equipment. A particle detecting integrated circuit is positioned in a vacuum environment, the particle detecting integrated circuit containing a device having a pair of conductive lines exposed to the vacuum environment. The pair of conductive lines is spaced at a critical pitch corresponding to diameters of particles of interest. A computer system is linked to the particle detecting integrated circuit to detect a change in an electrical property of the conductive lines when a particle becomes lodged between or on the lines.

Abstract: A method including placing a wafer active side down in a chamber and reducing the pressure in the chamber. An apparatus or system including a chamber having an interior volume suitable to accommodate a semiconductor wafer and capable of maintaining a vacuum; and a support to maintain a wafer in the volume of the chamber with minimum or no contact with an active side of the wafer, wherein an amount of particles that an active side of a wafer is exposed to during a pressure change in the chamber is minimized when the wafer is loaded in the chamber in an active side down configuration.

Abstract: An apparatus includes semiconductor processing equipment. A particle detecting integrated circuit is positioned in a vacuum environment, the particle detecting integrated circuit containing a device having a pair of conductive lines exposed to the vacuum environment. The pair of conductive lines is spaced at a critical pitch corresponding to diameters of particles of interest. A computer system is linked to the particle detecting integrated circuit to detect a change in an electrical property of the conductive lines when a particle becomes lodged between or on the lines.