Patents by Inventor Kevin Pinto

Kevin Pinto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11970485
    Abstract: Disclosed herein are compounds of formula I: or a pharmaceutically acceptable salt thereof, where the variables are as defined herein. These compounds are useful in treating RET associated cancers. Formulations containing the compounds of formula I and methods of making the compounds of formula I are also disclosed.
    Type: Grant
    Filed: October 19, 2022
    Date of Patent: April 30, 2024
    Assignee: ELI LILLY AND COMPANY
    Inventors: Gabrielle R. Kolakowski, Erin D. Anderson, Steven W. Andrews, Christopher Pierre Albert Jean Boldron, Kevin R. Condroski, Thomas C. Irvin, Manoj Kumar, Elizabeth A. McFaddin, Megan L. McKenney, Johnathan Alexander McLean, Tiphaine Mouret, Michael J. Munchhof, Thomas Pierre Dino Pancaldi, Michael Alexander Pilkington-Miksa, Marta Pinto
  • Patent number: 8175736
    Abstract: A processing system and method for chemical oxide removal (COR) is presented, wherein the processing system comprises a first treatment chamber and a second treatment chamber, wherein the first and second treatment chambers are coupled to one another. The first treatment chamber comprises a chemical treatment chamber that provides a temperature controlled chamber, and an independently temperature controlled substrate holder for supporting a substrate for chemical treatment. The substrate is exposed to a gaseous chemistry, such as HF/NH3, under controlled conditions including surface temperature and gas pressure. The second treatment chamber comprises a heat treatment chamber that provides a temperature controlled chamber, thermally insulated from the chemical treatment chamber. The heat treatment chamber provides a substrate holder for controlling the temperature of the substrate to thermally process the chemically treated surfaces on the substrate.
    Type: Grant
    Filed: December 9, 2010
    Date of Patent: May 8, 2012
    Assignee: Tokyo Electron Limited
    Inventors: Masayuki Tomoyasu, Merritt Funk, Kevin A. Pinto, Masaya Odagiri, Lemuel Chen, Asao Yamashita, Akira Iwami, Hiroyuki Takahashi
  • Patent number: 7477960
    Abstract: A method for implementing FDC in an APC system including receiving an FDC model from memory; providing the FDC model to a process model calculation engine; computing a vector of predicted dependent process parameters using the process model calculation engine; receiving a process recipe comprising a set of recipe parameters, providing the process recipe to a process module; executing the process recipe to produce a vector of measured dependent process parameters; calculating a difference between the vector of predicted dependent process parameters and the vector of measured dependent process parameters; comparing the difference to a threshold value; and declaring a fault condition when the difference is greater than the threshold value.
    Type: Grant
    Filed: February 16, 2005
    Date of Patent: January 13, 2009
    Assignee: Tokyo Electron Limited
    Inventors: James E. Willis, Merritt Funk, Kevin Lally, Kevin Pinto, Masayuki Tomoyasu, Raymond Peterson, Radha Sundararajan
  • Publication number: 20060184264
    Abstract: A method for implementing FDC in an APC system including receiving an FDC model from memory; providing the FDC model to a process model calculation engine; computing a vector of predicted dependent process parameters using the process model calculation engine; receiving a process recipe comprising a set of recipe parameters, providing the process recipe to a process module; executing the process recipe to produce a vector of measured dependent process parameters; calculating a difference between the vector of predicted dependent process parameters and the vector of measured dependent process parameters; comparing the difference to a threshold value; and declaring a fault condition when the difference is greater than the threshold value.
    Type: Application
    Filed: February 16, 2005
    Publication date: August 17, 2006
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: James Willis, Merritt Funk, Kevin Lally, Kevin Pinto, Masayuki Tomoyasu, Raymond Peterson, Radha Sundararajan
  • Publication number: 20060015206
    Abstract: A dual chamber apparatus including a first chamber and a second chamber which is configured to be coupled to the first chamber at an interface. Each of the first chamber and the second chamber has a transfer opening located at the interface. An insulating plate is located on one of the first chamber and the second chamber at the interface and is configured to have a low thermal conductivity such that the first chamber and the second chamber can be independently controlled at different temperatures when the first chamber and the second chamber are coupled together. Additionally, the apparatus may include an alignment device and/or a fastening device for fastening the first chamber to the second chamber. In embodiments, the insulating plate may be constructed of Teflon. Further, the first chamber may be a chemical oxide removal treatment chamber and the second chamber may be a heat treatment chamber.
    Type: Application
    Filed: July 14, 2004
    Publication date: January 19, 2006
    Applicants: Tokyo Electron Limited, International Business Machines Corporation
    Inventors: Merritt Funk, Kevin Pinto, Asao Yamashita, Wesley Natzle