Patents by Inventor Kevin Vandersmissen

Kevin Vandersmissen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230139947
    Abstract: The present invention relates to a polishing method and a polishing apparatus for polishing a substrate, such as a wafer. The present invention further relates to a computer-readable storage medium storing a program for causing the polishing apparatus to perform the polishing method. The polishing method includes: rotating a polishing table (3); and polishing a substrate (W) by pressing the substrate (W) against a polishing surface (2a). Polishing the substrate (W) includes a film-thickness profile adjustment process and a polishing-end-point detection process. The film-thickness profile adjustment process includes adjusting pressing forces on the substrate (W) against the polishing surface (2a) based on a plurality of film thicknesses, and determining a point in time at which a film-thickness index value has reached a film-thickness threshold value. The film-thickness index value is determined from at least one of the plurality of film thicknesses.
    Type: Application
    Filed: February 2, 2021
    Publication date: May 4, 2023
    Inventors: Ban ITO, Takeshi IIZUMI, Gael ROYERE, Patrick ONG, Kevin VANDERSMISSEN, Katia DEVRIENDT
  • Patent number: 10782607
    Abstract: An example method for making a reticle includes providing an assembly. The assembly includes an extreme ultraviolet mirror and a cavity overlaying at least a bottom part of the extreme ultraviolet mirror. The method also includes at least partially filling the cavity with an extreme ultraviolet absorbing structure that includes a metallic material that includes an element selected from Ni, Co, Sb, Ag, In, and Sn, by forming the extreme ultraviolet absorbing structure selectively in the cavity.
    Type: Grant
    Filed: September 6, 2018
    Date of Patent: September 22, 2020
    Assignees: IMEC VZW, KATHOLIEKE UNIVERSITEIT LEUVEN, KU LEUVEN R&D
    Inventors: Boon Teik Chan, Kim Vu Luong, Vicky Philipsen, Efrain Altamirano Sanchez, Kevin Vandersmissen
  • Publication number: 20190079384
    Abstract: An example method for making a reticle includes providing an assembly. The assembly includes an extreme ultraviolet mirror and a cavity overlaying at least a bottom part of the extreme ultraviolet mirror. The method also includes at least partially filling the cavity with an extreme ultraviolet absorbing structure that includes a metallic material that includes an element selected from Ni, Co, Sb, Ag, In, and Sn, by forming the extreme ultraviolet absorbing structure selectively in the cavity.
    Type: Application
    Filed: September 6, 2018
    Publication date: March 14, 2019
    Applicants: IMEC VZW, Katholieke Universiteit Leuven, KU LEUVEN R&D
    Inventors: Boon Teik Chan, Kim Vu Luong, Vicky Philipsen, Efrain Altamirano Sanchez, Kevin Vandersmissen