Patents by Inventor Kevin Winstel
Kevin Winstel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20220362774Abstract: Microfluidic chips that can comprise thin substrates and/or a high density of vias are described herein. An apparatus comprises: a silicon device layer comprising a plurality of vias, the plurality of vias comprising greater than or equal to about 100 vias per square centimeter of a surface of the silicon device layer and less than or equal to about 100,000 vias per square centimeter of the surface of the silicon device layer, and the plurality of vias extending through the silicon device layer; and a sealing layer bonded to the silicon device layer, wherein the sealing layer has greater rigidity than the silicon device layer. In some embodiments, the silicon device layer has a thickness between about 7 micrometers and about 500 micrometers while a via of the plurality of vias has a diameter between about 5 micrometers and about 5 millimeters.Type: ApplicationFiled: July 21, 2022Publication date: November 17, 2022Inventors: Joshua T. Smith, William Francis Landers, Kevin Winstel, Teresa Jacqueline Wu
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Patent number: 11458474Abstract: Microfluidic chips that can comprise thin substrates and/or a high density of vias are described herein. An apparatus comprises: a silicon device layer comprising a plurality of vias, the plurality of vias comprising greater than or equal to about 100 vias per square centimeter of a surface of the silicon device layer and less than or equal to about 100,000 vias per square centimeter of the surface of the silicon device layer, and the plurality of vias extending through the silicon device layer; and a sealing layer bonded to the silicon device layer, wherein the sealing layer has greater rigidity than the silicon device layer. In some embodiments, the silicon device layer has a thickness between about 7 micrometers and about 500 micrometers while a via of the plurality of vias has a diameter between about 5 micrometers and about 5 millimeters.Type: GrantFiled: January 19, 2018Date of Patent: October 4, 2022Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Joshua T. Smith, William Francis Landers, Kevin Winstel, Teresa Jacqueline Wu
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Patent number: 11462512Abstract: The subject disclosure relates to 3D microelectronic chip packages with embedded coolant channels. The disclosed 3D microelectronic chip packages provide a complete and practical mechanism for introducing cooling channels within the 3D chip stack while maintaining the electrical connection through the chip stack. According to an embodiment, a microelectronic package is provided that comprises a first silicon chip comprising first coolant channels interspersed between first thru-silicon-vias (TSVs). The microelectronic chip package further comprises a silicon cap attached to a first surface of the first silicon chip, the silicon cap comprising second TSVs that connect to the first TSVs. A second silicon chip comprising second coolant channels can further be attached to the silicon cap via interconnects formed between a first surface of the second silicon chip and the silicon cap, wherein the interconnects connect to the second TSVs.Type: GrantFiled: December 28, 2020Date of Patent: October 4, 2022Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Kamal K. Sikka, Fee Li Lie, Kevin Winstel, Ravi K. Bonam, Iqbal Rashid Saraf, Dario Goldfarb, Daniel Corliss, Dinesh Gupta
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Patent number: 11322361Abstract: An apparatus that includes a solution bath of a seasoned solution, the seasoned solution containing a mixture of hydrofluoric acid, nitric acid, and acetic acid; and one or more silicon wafers being suspended in a position above the solution bath, wherein at least a portion of the mixture having been used in thinning the one or more silicon wafers.Type: GrantFiled: August 13, 2019Date of Patent: May 3, 2022Assignee: International Business Machines CorporationInventors: Da Song, Allan Ward Upham, Cornelius Brown Peethala, Kevin Winstel, Spyridon Skordas
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Publication number: 20210118854Abstract: The subject disclosure relates to 3D microelectronic chip packages with embedded coolant channels. The disclosed 3D microelectronic chip packages provide a complete and practical mechanism for introducing cooling channels within the 3D chip stack while maintaining the electrical connection through the chip stack. According to an embodiment, a microelectronic package is provided that comprises a first silicon chip comprising first coolant channels interspersed between first thru-silicon-vias (TSVs). The microelectronic chip package further comprises a silicon cap attached to a first surface of the first silicon chip, the silicon cap comprising second TSVs that connect to the first TSVs. A second silicon chip comprising second coolant channels can further be attached to the silicon cap via interconnects formed between a first surface of the second silicon chip and the silicon cap, wherein the interconnects connect to the second TSVs.Type: ApplicationFiled: December 28, 2020Publication date: April 22, 2021Inventors: Kamal K. Sikka, Fee Li Lie, Kevin Winstel, Ravi K. Bonam, Iqbal Rashid Saraf, Dario Goldfarb, Daniel Corliss, Dinesh Gupta
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Patent number: 10937764Abstract: The subject disclosure relates to 3D microelectronic chip packages with embedded coolant channels. The disclosed 3D microelectronic chip packages provide a complete and practical mechanism for introducing cooling channels within the 3D chip stack while maintaining the electrical connection through the chip stack. According to an embodiment, a microelectronic package is provided that comprises a first silicon chip comprising first coolant channels interspersed between first thru-silicon-vias (TSVs). The microelectronic chip package further comprises a silicon cap attached to a first surface of the first silicon chip, the silicon cap comprising second TSVs that connect to the first TSVs. A second silicon chip comprising second coolant channels can further be attached to the silicon cap via interconnects formed between a first surface of the second silicon chip and the silicon cap, wherein the interconnects connect to the second TSVs.Type: GrantFiled: March 13, 2019Date of Patent: March 2, 2021Assignee: International Business Machines CorporationInventors: Kamal K. Sikka, Fee Li Lie, Kevin Winstel, Ravi K. Bonam, Iqbal Rashid Saraf, Dario Goldfarb, Daniel Corliss, Dinesh Gupta
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Publication number: 20200294968Abstract: The subject disclosure relates to 3D microelectronic chip packages with embedded coolant channels. The disclosed 3D microelectronic chip packages provide a complete and practical mechanism for introducing cooling channels within the 3D chip stack while maintaining the electrical connection through the chip stack. According to an embodiment, a microelectronic package is provided that comprises a first silicon chip comprising first coolant channels interspersed between first thru-silicon-vias (TSVs). The microelectronic chip package further comprises a silicon cap attached to a first surface of the first silicon chip, the silicon cap comprising second TSVs that connect to the first TSVs. A second silicon chip comprising second coolant channels can further be attached to the silicon cap via interconnects formed between a first surface of the second silicon chip and the silicon cap, wherein the interconnects connect to the second TSVs.Type: ApplicationFiled: March 13, 2019Publication date: September 17, 2020Inventors: Kamal K. Sikka, Fee Li Lie, Kevin Winstel, Ravi K. Bonam, Iqbal Rashid Saraf, Dario Goldfarb, Daniel Corliss, Dinesh Gupta
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Publication number: 20190371615Abstract: An apparatus that includes a solution bath of a seasoned solution, the seasoned solution containing a mixture of hydrofluoric acid, nitric acid, and acetic acid; and one or more silicon wafers being suspended in a position above the solution bath, wherein at least a portion of the mixture having been used in thinning the one or more silicon wafers.Type: ApplicationFiled: August 13, 2019Publication date: December 5, 2019Inventors: Da Song, Allan Ward Upham, Cornelius Brown Peethala, Kevin Winstel, SPYRIDON SKORDAS
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Publication number: 20190224679Abstract: Microfluidic chips that can comprise thin substrates and/or a high density of vias are described herein. An apparatus comprises: a silicon device layer comprising a plurality of vias, the plurality of vias comprising greater than or equal to about 100 vias per square centimeter of a surface of the silicon device layer and less than or equal to about 100,000 vias per square centimeter of the surface of the silicon device layer, and the plurality of vias extending through the silicon device layer; and a sealing layer bonded to the silicon device layer, wherein the sealing layer has greater rigidity than the silicon device layer. In some embodiments, the silicon device layer has a thickness between about 7 micrometers and about 500 micrometers while a via of the plurality of vias has a diameter between about 5 micrometers and about 5 millimeters.Type: ApplicationFiled: January 19, 2018Publication date: July 25, 2019Inventors: Joshua T. Smith, William Francis Landers, Kevin Winstel, Teresa Jacqueline Wu
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Publication number: 20070173067Abstract: Methods for opening a hard mask and a silicon-on-insulator substrate in a single process chamber are disclosed. In one embodiment, the method includes patterning a photoresist over a stack including an anti-reflective coating (ARC) layer, a silicon dioxide (SiO2) based hard mask layer, a silicon nitride pad layer, a silicon dioxide (SiO2) pad layer and the SOI substrate, wherein the SOI substrate includes a silicon-on-insulator layer and a buried silicon dioxide (SiO2) layer; and in a single process chamber: opening the ARC layer; etching the silicon dioxide (SiO2) based hard mask layer; etching the silicon nitride pad layer; etching the silicon dioxide (SiO2) pad layer; and etching the SOI substrate. Etching all layers in a single chamber reduces the turn-around-time, lowers the process cost, facilitates process control and/or improve a trench profile.Type: ApplicationFiled: January 25, 2006Publication date: July 26, 2007Inventors: Scott Allen, Kangguo Cheng, Xi Li, Kevin Winstel