Patents by Inventor Kevin Y. WANG
Kevin Y. WANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11913874Abstract: The system includes a modulatable illumination source configured to illuminate a surface of a sample disposed on a sample stage, a detector configured to detect illumination emanating from a surface of the sample, illumination optics configured to direct illumination from the modulatable illumination source to the surface of the sample, collection optics configured to direct illumination from the surface of the sample to the detector, and a modulation control system communicatively coupled to the modulatable illumination source, wherein the modulation control system is configured to modulate a drive current of the modulatable illumination source at a selected modulation frequency suitable for generating illumination having a selected coherence feature length. In addition, the present invention includes the time-sequential interleaving of outputs of multiple light sources to generate periodic pulse trains for use in multi-wavelength time-sequential optical metrology.Type: GrantFiled: April 5, 2021Date of Patent: February 27, 2024Assignee: KLA CorporationInventors: Andrei V. Shchegrov, Lawrence D. Rotter, David Y. Wang, Andrei Veldman, Kevin Peterlinz, Gregory Brady, Derrick A. Shaughnessy
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Patent number: 11639398Abstract: The present disclosure relates to a photosensitive composition comprising a photoinitiator and a bismaleimide component, photopolymers comprising the photosensitive composition and their use, especially in electronic devices. The bismaleimide component includes a bismaleimide compound or a bismaleimide oligomer.Type: GrantFiled: November 30, 2020Date of Patent: May 2, 2023Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLCInventors: Colin Hayes, Colin Calabrese, Michael K. Gallagher, Kevin Y. Wang, Robert K. Barr
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Publication number: 20210198389Abstract: The present disclosure relates to a photosensitive composition comprising a photoinitiator and a bismaleimide component, photopolymers comprising the photosensitive composition and their use, especially in electronic devices. The bismaleimide component includes a bismaleimide compound or a bismaleimide oligomer.Type: ApplicationFiled: November 30, 2020Publication date: July 1, 2021Inventors: Colin Hayes, Colin Calabrese, Michael K. Gallagher, Kevin Y. Wang, Robert K. Barr
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Publication number: 20190112400Abstract: The present invention provides organic solvent soluble or aqueous alkali soluble polymer composition comprising, in copolymerized form, one or more bis-arylcyclobutene monomers and one or more olefin or dienophile group containing second monomers, wherein the polymer is substantially free of (unreacted) arylcyclobutene groups. The compositions cure by a separate from the B-staging reaction which consumes substantially all of the arylcyclobutene groups in the composition; and they cure at temperatures below the cure temperature of less than 210° C., preferably, less than 180° C. The polymer compositions find use in making films or coatings and are aqueous or organic solvent developable when used in photolithography. Methods for making the polymer compositions are also provided.Type: ApplicationFiled: October 12, 2017Publication date: April 18, 2019Inventors: Wesley Sattler, Michael K. Gallagher, Kevin Y. Wang, Peter Trefonas, III, Michael Mulzer, Christopher Gilmore, Gregory D. Prokopowicz
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Patent number: 10030165Abstract: Arylclobutene-containing multi-functional monomers are useful in the preparation of arylcyclobutene-based polymer coatings. Compositions comprising one or more arylclobutene-containing multi-functional monomers and one or more oligomers comprising as polymerized units one or more arylcyclobutene monomer provide arylcyclobutene-based polymer coatings having reduced stress. Such compositions are useful in the manufacture of electronic devices.Type: GrantFiled: August 8, 2016Date of Patent: July 24, 2018Assignees: Dow Global Technologies LLC, Rohm and Haas Electronic Materials LLC, Rohm and Haas CompanyInventors: Duane R. Romer, Matthew M. Yonkey, Michael K. Gallagher, Kevin Y. Wang, Xiang Qian Liu, Raymond J. Thibault, Kim S. Ho, Gregory D. Prokopowicz, Corey O'Connor, Elissei Iagodkine, Robert K. Barr
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Patent number: 9745479Abstract: Compositions useful for improving the adhesion of coating compositions, such as dielectric film-forming compositions, include a hydrolyzed poly(alkoxysilane). These compositions are useful in methods of improving the adhesion of coating compositions to a substrate.Type: GrantFiled: October 26, 2015Date of Patent: August 29, 2017Assignee: Rohm and Haas Electronic Materials LLCInventors: Zidong Wang, Michael K. Gallagher, Kevin Y. Wang, Gregory P. Prokopowicz
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Publication number: 20170081550Abstract: Arylclobutene-containing multi-functional monomers are useful in the preparation of arylcyclobutene-based polymer coatings. Compositions comprising one or more arylclobutene-containing multi-functional monomers and one or more oligomers comprising as polymerized units one or more arylcyclobutene monomer provide arylcyclobutene-based polymer coatings having reduced stress. Such compositions are useful in the manufacture of electronic devices.Type: ApplicationFiled: August 8, 2016Publication date: March 23, 2017Inventors: Duane R. Romer, Matthew M. Yonkey, Michael K. Gallagher, Kevin Y. Wang, Xiang Qian Liu, Raymond J. Thibault, Kim S. Ho, Gregory D. Prokopowicz, Corey O'Connor, Elissei Iagodkine, Robert K. Barr
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Patent number: 9441055Abstract: Arylclobutene-containing multi-functional monomers are useful in the preparation of arylcyclobutene-based polymer coatings. Compositions comprising one or more arylclobutene-containing multi-functional monomers and one or more oligomers comprising as polymerized units one or more arylcyclobutene monomer provide arylcyclobutene-based polymer coatings having reduced stress. Such compositions are useful in the manufacture of electronic devices.Type: GrantFiled: September 18, 2015Date of Patent: September 13, 2016Assignees: Dow Global Technologies LLC, Rohm and Haas Electronic Materials LLC, Rohm and Haas CompanyInventors: Duane R. Romer, Matthew M. Yonkey, Michael K. Gallagher, Kevin Y. Wang, Xiang Qian Liu, Raymond J. Thibault, Kim S. Ho, Gregory D. Prokopowicz, Corey O'Connor, Elissei Iagodkine, Robert K. Barr
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Patent number: 9273215Abstract: Compositions useful for improving the adhesion of coating compositions, such as dielectric film-forming compositions, include a hydrolyzed poly(alkoxysilane). These compositions are useful in methods of improving the adhesion of coating compositions to a substrate.Type: GrantFiled: October 24, 2013Date of Patent: March 1, 2016Assignee: Rohm and Haas Electronic Materials LLCInventors: Zidong Wang, Michael K. Gallagher, Kevin Y. Wang, Gregory P. Prokopowicz
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Publication number: 20160040021Abstract: Compositions useful for improving the adhesion of coating compositions, such as dielectric film-forming compositions, include a hydrolyzed poly(alkoxysilane). These compositions are useful in methods of improving the adhesion of coating compositions to a substrate.Type: ApplicationFiled: October 26, 2015Publication date: February 11, 2016Inventors: Zidong WANG, Michael K. GALLAGHER, Kevin Y. WANG, Gregory P. PROKOPOWICZ
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Publication number: 20140120244Abstract: Compositions useful for improving the adhesion of coating compositions, such as dielectric film-forming compositions, include a hydrolyzed poly(alkoxysilane). These compositions are useful in methods of improving the adhesion of coating compositions to a substrate.Type: ApplicationFiled: October 24, 2013Publication date: May 1, 2014Applicant: Rohm and Haas Electronic Materials LLCInventors: Zidong WANG, Michael K. GALLAGHER, Kevin Y. WANG, Gregory P. PROKOPOWICZ
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Publication number: 20140120242Abstract: Compositions useful for improving the adhesion of coating compositions, such as dielectric film-forming compositions, to a substrate are provided. Also provided are methods of improving the adhesion of coating compositions to a substrate.Type: ApplicationFiled: October 30, 2012Publication date: May 1, 2014Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLCInventors: Zidong WANG, Michael K. GALLAGHER, Kevin Y. WANG, Gregory P. PROKOPOWICZ