Patents by Inventor Kevin Y. WANG

Kevin Y. WANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11913874
    Abstract: The system includes a modulatable illumination source configured to illuminate a surface of a sample disposed on a sample stage, a detector configured to detect illumination emanating from a surface of the sample, illumination optics configured to direct illumination from the modulatable illumination source to the surface of the sample, collection optics configured to direct illumination from the surface of the sample to the detector, and a modulation control system communicatively coupled to the modulatable illumination source, wherein the modulation control system is configured to modulate a drive current of the modulatable illumination source at a selected modulation frequency suitable for generating illumination having a selected coherence feature length. In addition, the present invention includes the time-sequential interleaving of outputs of multiple light sources to generate periodic pulse trains for use in multi-wavelength time-sequential optical metrology.
    Type: Grant
    Filed: April 5, 2021
    Date of Patent: February 27, 2024
    Assignee: KLA Corporation
    Inventors: Andrei V. Shchegrov, Lawrence D. Rotter, David Y. Wang, Andrei Veldman, Kevin Peterlinz, Gregory Brady, Derrick A. Shaughnessy
  • Patent number: 11639398
    Abstract: The present disclosure relates to a photosensitive composition comprising a photoinitiator and a bismaleimide component, photopolymers comprising the photosensitive composition and their use, especially in electronic devices. The bismaleimide component includes a bismaleimide compound or a bismaleimide oligomer.
    Type: Grant
    Filed: November 30, 2020
    Date of Patent: May 2, 2023
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Colin Hayes, Colin Calabrese, Michael K. Gallagher, Kevin Y. Wang, Robert K. Barr
  • Publication number: 20210198389
    Abstract: The present disclosure relates to a photosensitive composition comprising a photoinitiator and a bismaleimide component, photopolymers comprising the photosensitive composition and their use, especially in electronic devices. The bismaleimide component includes a bismaleimide compound or a bismaleimide oligomer.
    Type: Application
    Filed: November 30, 2020
    Publication date: July 1, 2021
    Inventors: Colin Hayes, Colin Calabrese, Michael K. Gallagher, Kevin Y. Wang, Robert K. Barr
  • Publication number: 20190112400
    Abstract: The present invention provides organic solvent soluble or aqueous alkali soluble polymer composition comprising, in copolymerized form, one or more bis-arylcyclobutene monomers and one or more olefin or dienophile group containing second monomers, wherein the polymer is substantially free of (unreacted) arylcyclobutene groups. The compositions cure by a separate from the B-staging reaction which consumes substantially all of the arylcyclobutene groups in the composition; and they cure at temperatures below the cure temperature of less than 210° C., preferably, less than 180° C. The polymer compositions find use in making films or coatings and are aqueous or organic solvent developable when used in photolithography. Methods for making the polymer compositions are also provided.
    Type: Application
    Filed: October 12, 2017
    Publication date: April 18, 2019
    Inventors: Wesley Sattler, Michael K. Gallagher, Kevin Y. Wang, Peter Trefonas, III, Michael Mulzer, Christopher Gilmore, Gregory D. Prokopowicz
  • Patent number: 10030165
    Abstract: Arylclobutene-containing multi-functional monomers are useful in the preparation of arylcyclobutene-based polymer coatings. Compositions comprising one or more arylclobutene-containing multi-functional monomers and one or more oligomers comprising as polymerized units one or more arylcyclobutene monomer provide arylcyclobutene-based polymer coatings having reduced stress. Such compositions are useful in the manufacture of electronic devices.
    Type: Grant
    Filed: August 8, 2016
    Date of Patent: July 24, 2018
    Assignees: Dow Global Technologies LLC, Rohm and Haas Electronic Materials LLC, Rohm and Haas Company
    Inventors: Duane R. Romer, Matthew M. Yonkey, Michael K. Gallagher, Kevin Y. Wang, Xiang Qian Liu, Raymond J. Thibault, Kim S. Ho, Gregory D. Prokopowicz, Corey O'Connor, Elissei Iagodkine, Robert K. Barr
  • Patent number: 9745479
    Abstract: Compositions useful for improving the adhesion of coating compositions, such as dielectric film-forming compositions, include a hydrolyzed poly(alkoxysilane). These compositions are useful in methods of improving the adhesion of coating compositions to a substrate.
    Type: Grant
    Filed: October 26, 2015
    Date of Patent: August 29, 2017
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Zidong Wang, Michael K. Gallagher, Kevin Y. Wang, Gregory P. Prokopowicz
  • Publication number: 20170081550
    Abstract: Arylclobutene-containing multi-functional monomers are useful in the preparation of arylcyclobutene-based polymer coatings. Compositions comprising one or more arylclobutene-containing multi-functional monomers and one or more oligomers comprising as polymerized units one or more arylcyclobutene monomer provide arylcyclobutene-based polymer coatings having reduced stress. Such compositions are useful in the manufacture of electronic devices.
    Type: Application
    Filed: August 8, 2016
    Publication date: March 23, 2017
    Inventors: Duane R. Romer, Matthew M. Yonkey, Michael K. Gallagher, Kevin Y. Wang, Xiang Qian Liu, Raymond J. Thibault, Kim S. Ho, Gregory D. Prokopowicz, Corey O'Connor, Elissei Iagodkine, Robert K. Barr
  • Patent number: 9441055
    Abstract: Arylclobutene-containing multi-functional monomers are useful in the preparation of arylcyclobutene-based polymer coatings. Compositions comprising one or more arylclobutene-containing multi-functional monomers and one or more oligomers comprising as polymerized units one or more arylcyclobutene monomer provide arylcyclobutene-based polymer coatings having reduced stress. Such compositions are useful in the manufacture of electronic devices.
    Type: Grant
    Filed: September 18, 2015
    Date of Patent: September 13, 2016
    Assignees: Dow Global Technologies LLC, Rohm and Haas Electronic Materials LLC, Rohm and Haas Company
    Inventors: Duane R. Romer, Matthew M. Yonkey, Michael K. Gallagher, Kevin Y. Wang, Xiang Qian Liu, Raymond J. Thibault, Kim S. Ho, Gregory D. Prokopowicz, Corey O'Connor, Elissei Iagodkine, Robert K. Barr
  • Patent number: 9273215
    Abstract: Compositions useful for improving the adhesion of coating compositions, such as dielectric film-forming compositions, include a hydrolyzed poly(alkoxysilane). These compositions are useful in methods of improving the adhesion of coating compositions to a substrate.
    Type: Grant
    Filed: October 24, 2013
    Date of Patent: March 1, 2016
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Zidong Wang, Michael K. Gallagher, Kevin Y. Wang, Gregory P. Prokopowicz
  • Publication number: 20160040021
    Abstract: Compositions useful for improving the adhesion of coating compositions, such as dielectric film-forming compositions, include a hydrolyzed poly(alkoxysilane). These compositions are useful in methods of improving the adhesion of coating compositions to a substrate.
    Type: Application
    Filed: October 26, 2015
    Publication date: February 11, 2016
    Inventors: Zidong WANG, Michael K. GALLAGHER, Kevin Y. WANG, Gregory P. PROKOPOWICZ
  • Publication number: 20140120244
    Abstract: Compositions useful for improving the adhesion of coating compositions, such as dielectric film-forming compositions, include a hydrolyzed poly(alkoxysilane). These compositions are useful in methods of improving the adhesion of coating compositions to a substrate.
    Type: Application
    Filed: October 24, 2013
    Publication date: May 1, 2014
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Zidong WANG, Michael K. GALLAGHER, Kevin Y. WANG, Gregory P. PROKOPOWICZ
  • Publication number: 20140120242
    Abstract: Compositions useful for improving the adhesion of coating compositions, such as dielectric film-forming compositions, to a substrate are provided. Also provided are methods of improving the adhesion of coating compositions to a substrate.
    Type: Application
    Filed: October 30, 2012
    Publication date: May 1, 2014
    Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Zidong WANG, Michael K. GALLAGHER, Kevin Y. WANG, Gregory P. PROKOPOWICZ