Patents by Inventor Keyur Karandikar

Keyur Karandikar has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • RADICAL TREATMENT FOR METAL GATE STACK
    Publication number: 20240087899
    Abstract: Methods of manufacturing and processing semiconductor devices (i.e., electronic devices) are described. The methods include treating a surface of a metal gate stack with a radical treatment. The radical treatment may be used to treat one or more layers or surfaces of layers in the metal gate stack. The radical treatment may be performed once or multiple times during the methods described herein. The radical treatment comprises flowing one or more of nitrogen radicals (N2*) and hydrogen radicals (H*) over the surface of the metal gate stack.
    Type: Application
    Filed: September 9, 2022
    Publication date: March 14, 2024
    Applicant: Applied Materials, Inc.
    Inventors: Zhihui Liu, Seshadri Ganguli, Tianyi Huang, Yixiong Yang, Srinivas Gandikota, Yuanhua Zheng, Yongjing Lin, Keyur Karandikar, Elizabeth Mao