Abstract: Disclosed is a method for producing regularly arranged nanowires from a nanowire-forming material on a substrate. Said method is characterized by the following steps: a) the material is introduced into a carrier liquid at a load remaining at least three orders of magnitude below the loading capacity of the carrier liquid; b) a guiding member is placed on the substrate; c) the substrate is heated to a temperature at which a thin film of the carrier liquid undergoes spinodal decrosslinking on the substrate; d) a film of the carrier liquid that is loaded with material is applied to the heated substrate in the surroundings of the guiding member, where a gradient of the average film thickness is obtained perpendicular to the contour of the guiding member; and e) the carrier liquid is evaporated such that the material is left along lines extending perpendicular to the gradient of the film thickness.