Patents by Inventor Ki Bae Kim

Ki Bae Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240404570
    Abstract: A method of training a memory device is provided. In first to third DCA training steps, a score for each of first to third DCA code combinations is calculated based on an eye window size of a data signal, and in response to a tie occurring among scores, a DCA code combination is selected based on the sum of an even-eye window minimum value and an odd-eye window minimum value of the data signal.
    Type: Application
    Filed: February 19, 2024
    Publication date: December 5, 2024
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Ki-Seok PARK, Do-Han KIM, Minsu BAE, Chang-Hyun BAE, Young-Hoon SON, Hye-Seung YU, Yoenhwa LEE, Daihyun LIM, Insu CHOI, Kideok HAN
  • Publication number: 20240372079
    Abstract: A rechargeable lithium battery includes a negative electrode comprising a current collector, a negative active material layer on the current collector, and lithium dendrites on a surface of the negative active material layer and having an average size (e.g., an average length) of about 5 ?m or less and a rod-like shape; a positive electrode; and a non-aqueous electrolyte.
    Type: Application
    Filed: October 25, 2023
    Publication date: November 7, 2024
    Inventors: Sora CHAE, Beom Kwon KIM, Nanyoung BAE, Ki Chun KIL, Suji KIM
  • Patent number: 12131702
    Abstract: A display device includes a pixel including a first sub-pixel to third sub-pixels, each arranged in a first direction and emitting light of a color, a first to third vertical power lines, each extending in a second direction different from the first direction, overlapping the first to third sub-pixels, respectively, and transmitting first to third powers, respectively, a first to third horizontal power lines, each extending in the first direction and electrically connected to the first to third vertical power lines through a contact hole, respectively. Voltages of the first power, the second power, and the third power are different from each other.
    Type: Grant
    Filed: February 9, 2023
    Date of Patent: October 29, 2024
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Ji Hye Lee, Kyung Bae Kim, Ki Hyun Pyo, Sung Chul Hong
  • Publication number: 20240332313
    Abstract: A light emitting display device, includes: a substrate; a driving element layer on the substrate and including a transistor and a planarization layer covering the transistor; a cathode and an anode connection electrode on the planarization layer; a separator on the planarization layer and including a first layer and a second layer, wherein the second layer protrudes from the first layer of the separator; a pixel defining layer including a first pixel defining layer on the separator and a second pixel defining layer superimposed with a portion of the cathode and a portion of the anode connection electrode; a light emitting layer on top of the cathode; and an anode connecting electrode, the second pixel defining layer, and an anode above the light emitting layer.
    Type: Application
    Filed: January 12, 2024
    Publication date: October 3, 2024
    Inventors: Kyung-Bae KIM, Do Yeong PARK, Ki Hyun PYO, Sung Chul HONG
  • Publication number: 20240255747
    Abstract: Provided is a photographing apparatus including an image capturing unit including a first light source, an object lens, and a first light detector, a surface detecting unit including a second light source, the object lens, and a second light detector, a processor configured to obtain a strong reflection signal area where a reflection signal is strong in an oblique plane image obtained from the second light detector, and obtain a relative position relationship between a region of interest and a focal plane of the object lens, and an actuator configured to adjust the region of interest to be in focus.
    Type: Application
    Filed: December 7, 2023
    Publication date: August 1, 2024
    Applicants: POSTECH RESEARCH AND BUSINESS DEVELOPMENT FOUNDATION, SEOUL NATIONAL UNIVERSITY HOSPITAL
    Inventors: Ki Hean KIM, Chang Ho Yoon, Jungbin Lee, Soohyun Park, Seonghan Kim, Kyungbin Bae
  • Publication number: 20120024431
    Abstract: The present invention relates to an amorphous alloy and a method for manufacturing thereof. The amorphous alloy according to the present invention includes has a chemical formula of Ni100-a-b-c-d-e-fNbaZrbTicTadMeIf, wherein the M is at least one selected from a group of Sn and Si, wherein the I is at least one selected from a group of C and O, and wherein the a, b, c, d, e, and f are satisfied with the compositions of 10.0 wt %?a?25.0 wt %, 5.0 wt %?b?25.0 wt %, 5.0 wt %?c?10.0 wt %, 0.0 wt %?d?25.0 wt %, 0.0 wt %?e?6.5 wt %, 0.0 wt %?f?0.5 wt %, respectively.
    Type: Application
    Filed: October 6, 2011
    Publication date: February 2, 2012
    Applicant: Korea Institute of Science and Technology
    Inventors: Eric FLEURY, Jayaraj Jayamani, Ki-bae Kim, Mee-soon Lee, Hyun-kwang Seok, Yu-chan Kim, Kwang-youn Kim, Do-hyang Kim
  • Patent number: 8070891
    Abstract: The present invention relates to an amorphous alloy and a method for manufacturing thereof. The amorphous alloy according to the present invention includes has a chemical formula of Feioo-a-b-c-d-e-f-gCraMobCcBaYeMflg. Here, the M is at least one selected from a group consisting of Al, Co, N1 and Ni, and the I is at least one selected from a group consisting of Mn, P, S, and O as impurities. The a, b, c, d, e, f, and g are satisfied with the compositions of 16.0 wt %?a<22.0 wt %, 15.0 wt %<b?27.0 wt %, 2.0 wt %?c<3.5 wt %, 1.0 wt %<d?1.5 wt %, 1.0 wt %<e?3.5 wt %, 0.25 wt %<f?3.0 wt %, and 0.01 wt %?g<0.5 wt %, respectively.
    Type: Grant
    Filed: December 30, 2005
    Date of Patent: December 6, 2011
    Assignee: Korea Institute of Science and Technology
    Inventors: Eric Fleury, Jayaraj Jayamani, Ki-bae Kim, Mee-soon Lee, legal representative, Hyun-kwang Seok, Yu-chan Kim, Kwang-youn Kim, Dohyang Kim
  • Patent number: 8034200
    Abstract: A nanometer-sized porous metallic glass and a method for manufacturing the same are provided. The porous metallic glass includes Ti (titanium) at 50.0 at % to 70.0 at %, Y (yttrium) at 0.5 at % to 10.0 at %, Al (aluminum) at 10.0 at % to 30.0 at %, Co (cobalt) at 10.0 at % to 30.0 at %, and impurities. Ti +Y+Al+Co+the impurities=100.0 at %.
    Type: Grant
    Filed: June 17, 2009
    Date of Patent: October 11, 2011
    Assignee: Korea Institute of Science and Technology
    Inventors: Eric Fleury, Yu-Chan Kim, Ki-Bae Kim, Jayamani Jayaraj, Do-Hyang Kim, Byung-Joo Park
  • Publication number: 20100147422
    Abstract: The present invention relates to an amorphous alloy and a method for manufacturing thereof. The amorphous alloy according to the present invention includes has a chemical formula of Feioo-a-b-c-d-e-f-gCraMobCcBaYeMflg. Here, the M is at least one selected from a group consisting of Al, Co, N1 and Ni, and the I is at least one selected from a group consisting of Mn, P, S, and O as impurities. The a, b, c, d, e, f, and g are satisfied with the compositions of 16.0 wt %?a<22.0 wt %, 15.0 wt %<b?27.0 wt %, 2.0 wt %?c<3.5 wt %, 1.0 wt %<d?1.5 wt %, 1.0 wt %<e?3.5 wt %, 0.25 wt %<f?3.0 wt %, and 0.01 wt %?g<0.5 wt %, respectively.
    Type: Application
    Filed: December 30, 2005
    Publication date: June 17, 2010
    Applicant: Korea Institute of Science and Technology
    Inventors: Eric Fleury, Jayaraj Jayamani, Ki-bae Kim, Hyun-kwang Seok, Yu-chan Kim, Kwang-youn Kim, Do-hyang Kim
  • Publication number: 20090250143
    Abstract: A nanometer-sized porous metallic glass and a method for manufacturing the same are provided. The porous metallic glass includes Ti (titanium) at 50.0 at % to 70.0 at %, Y (yttrium) at 0.5 at % to 10.0 at %, Al (aluminum) at 10.0 at % to 30.0 at %, Co (cobalt) at 10.0 at % to 30.0 at %, and impurities. Ti+Y+Al+Co+the impurities=100.0 at %.
    Type: Application
    Filed: June 17, 2009
    Publication date: October 8, 2009
    Applicant: Korea Institute of Science and Technology
    Inventors: Eric Fleury, Yu-Chan Kim, Ki-Bae Kim, Jayamani Jayaraj, Do-Hyang Kim, Byung-Joo Park
  • Patent number: 7563332
    Abstract: A nanometer-sized porous metallic glass and a method for manufacturing the same are provided. The porous metallic glass includes Ti (titanium) at 50.0 at % to 70.0 at %, Y (yttrium) at 0.5 at % to 10.0 at %, Al (aluminum) at 10.0 at % to 30.0 at %, Co (cobalt) at 10.0 at % to 30.0 at %, and impurities. Ti+Y+Al+Co+the impurities=100.0 at %.
    Type: Grant
    Filed: November 22, 2006
    Date of Patent: July 21, 2009
    Assignee: Korea Institute of Science and Technology
    Inventors: Eric Fleury, Yu-Chan Kim, Ki-Bae Kim, Jayamani Jayaraj, Do-Hyang Kim, Byung-Joo Park
  • Publication number: 20070267111
    Abstract: A nanometer-sized porous metallic glass and a method for manufacturing the same are provided. The porous metallic glass includes Ti (titanium) at 50.0 at % to 70.0 at %, Y (yttrium) at 0.5 at % to 10.0 at %, Al (aluminum) at 10.0 at % to 30.0 at %, Co (cobalt) at 10. at % to 30.0 at %, and impurities. Ti+Y+Al+Co+the impurities=100.0 at %.
    Type: Application
    Filed: November 22, 2006
    Publication date: November 22, 2007
    Applicant: Korea Institute of Science and Technology
    Inventors: Eric Fleury, Yu-Chan Kim, Ki-Bae Kim, Jayamani Jayaraj, Do-Hyang Kim, Byung-Joo Park
  • Patent number: 7147727
    Abstract: The present invention relates to a Cu-based amorphous alloy composition having a chemical composition represented by the following general formula, by atomic %: Cu100-a-b-c-dZraAlb(M1)c(M2)d, where a, b, c and d satisfy the formulas of 36?a?49, 1?b?10, 0?c?10, and 0?d?5, respectively, and c and d are not zero at the same time, and M1, the 4th element added to a ternary alloy of Cu—Zr—Al, is one metal element selected from the group consisting of Nb, Ti, Be and Ag, and M2, the 5th element added to the ternary alloy of the Cu—Zr—Al, is one amphoteric element or non-metal element selected from the group consisting of Sn and Si.
    Type: Grant
    Filed: June 25, 2004
    Date of Patent: December 12, 2006
    Assignee: Korea Institute of Science and Technology
    Inventors: Yu Chan Kim, Eric Fleury, Ki Bae Kim, Hyun Kwang Seok
  • Patent number: 6984356
    Abstract: A method for continuously producing foamed metals is disclosed. The method comprises the steps of (i) adding a previously dissolved molten metal to a viscosity-enhancing furnace and agitating the molten metal so as to uniformly maintain the viscosity of the molten metal; (ii) conveying the molten metal to an electronic agitating type foaming furnace; (iii) injecting gas into the conveyed molten metal while agitating to obtain a foamed molten metal; and (iv) drawing the obtained foamed molten metal using a roller and cooling the drawn foamed metal.
    Type: Grant
    Filed: September 23, 2004
    Date of Patent: January 10, 2006
    Inventors: Bo Young Hur, Soon Hyung Cho, Ki Bae Kim, Seok Choun Bae
  • Publication number: 20050211340
    Abstract: The present invention relates to a Cu-based amorphous alloy composition having a chemical composition represented by the following general formula, by atomic %: Cu100-a-b-c-dZraAlb(M1)c(M2)d, where a, b, c and d satisfy the formulas of 36?a?49, 1?b?10, 0?c?10, and 0?d?5, respectively, and c and d are not zero at the same time, and M1, the 4th element added to a ternary alloy of Cu—Zr—Al, is one metal element selected from the group consisting of Nb, Ti, Be and Ag, and M2, the 5th element added to the ternary alloy of the Cu—Zr—Al, is one amphoteric element or non-metal element selected from the group consisting of Sn and Si.
    Type: Application
    Filed: June 25, 2004
    Publication date: September 29, 2005
    Applicant: Korea Institute of Science and Technology
    Inventors: Yu Chan Kim, Eric Fleury, Ki Bae Kim, Hyun Kwang Seok
  • Patent number: 6863709
    Abstract: A method for continuously producing foamed metals is disclosed. The method comprises the steps of (i) adding a previously dissolved molten metal to a viscosity-enhancing furnace and agitating the molten metal so as to uniformly maintain the viscosity of the molten metal; (ii) conveying the molten metal to an electronic agitating type foaming furnace; (iii) injecting gas into the conveyed molten metal while agitating to obtain a foamed molten metal; and (iv) drawing the obtained foamed molten metal using a roller and cooling the drawn foamed metal.
    Type: Grant
    Filed: January 6, 2003
    Date of Patent: March 8, 2005
    Inventors: Bo Young Hur, Soon Hyung Cho, Ki Bae Kim, Seok Choun Bae
  • Publication number: 20030126949
    Abstract: A method for continuously producing foamed metals is disclosed. The method comprises the steps of (i) adding a previously dissolved molten metal to a viscosity-enhancing furnace and agitating the molten metal so as to uniformly maintain the viscosity of the molten metal; (ii) conveying the molten metal to an electronic agitating type foaming furnace; (iii) injecting gas into the conveyed molten metal while agitating to obtain a foamed molten metal; and (iv) drawing the obtained foamed molten metal using a roller and cooling the drawn foamed metal.
    Type: Application
    Filed: January 6, 2003
    Publication date: July 10, 2003
    Applicant: Bo Young HUR
    Inventors: Bo Young Hur, Soon Hyung Cho, Ki Bae Kim, Seok Choun Bae
  • Patent number: 5595236
    Abstract: An apparatus for vertical squeeze casting, which alters conventional apparatuses for vertical squeeze casting using squeeze casting methods to manufacture highly-detailed cast products of high quality by locally pressing the molten metal injection filled into the metal mold cavity, by improving the molten metal supplying mechanism and cast product extraction method, so that local pressing of the cast product from all vertical and lateral directions is enabled, thereby enabling the production of cast products with many variations in thickness and complex structures.
    Type: Grant
    Filed: May 8, 1995
    Date of Patent: January 21, 1997
    Assignee: Korea Institute of Science and Technology
    Inventors: Ho-In Lee, Ki-Bae Kim, Yo-Sub Han, Yong-Joon Kim