Patents by Inventor Ki Baik

Ki Baik has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20070133972
    Abstract: The present invention relates to a lens driving device includes a lens receiving part with a lens disposed therein, having first and second extension parts formed at opposed sides in a predetermined interval from each other. The lens driving device also includes an actuator having a body between the first and second extension parts. The actuator body has first and second output members contacting the first and second extension parts of the lens receiving part at opposed ends thereof, and thereby expands, contracts and bends when power is applied. The lens driving device also includes a preload member compressing the first and second extension parts against the actuator body to maintain a status of pressed contact. The lens driving device further includes a guide part for guiding the movement of the lens receiving part in an optical axis direction.
    Type: Application
    Filed: September 15, 2006
    Publication date: June 14, 2007
    Applicant: SAMSUNG ELECTRO-MECHANICS CO., LTD.
    Inventors: Dong Lee, Burhanettin Koc, Ki Baik, Jung Ryu, Jung Lee, Byung Kang
  • Publication number: 20050069816
    Abstract: The present invention provides a process for using an amine contamination-protecting top-coating composition. Preferably, the amine contamination-protecting top-coating composition of the present invention comprises an amine contamination-protecting compound. Useful amine contamination-protecting compounds include amine derivatives; amino acid derivatives; amide derivatives; urethane derivatives; urea derivatives; salts thereof; and mixtures thereof. The amine contamination-protecting top-coating composition of the present invention reduces or eliminates problems such as T-topping due to a post exposure delay effect and/or difficulties in forming a fine pattern below 100 nm due to acid diffusion associated with conventional lithography processes involving a photoresist polymer containing an alicyclic main chain using a light source, such as KrF (248 nm), ArF (193 nm), F2 (157 nm), E-beam, ion beam and extremely ultraviolet (EUV).
    Type: Application
    Filed: November 19, 2004
    Publication date: March 31, 2005
    Applicant: Hynix Semiconductor Inc.
    Inventors: Jae Chang Jung, Keun Kong, Hyeong Kim, Jin Kim, Cha Koh, Sung Hong, Geun Lee, Min Jung, Ki Baik