Abstract: A substrate cleaning and drying apparatus includes a first substrate transfer unit operable to transfer a substrate in a horizontal direction at an upper part of a base frame, a second substrate transfer unit operable to receive the substrate from the first substrate transfer unit and transfer the substrate in a vertical direction, a third substrate transfer unit operable to receive the substrate from the second substrate transfer unit and transfer the substrate in a horizontal direction at a lower part of the base frame, and a substrate processing unit operable to receive the substrate from the third substrate transfer unit and perform a cleaning and drying process on the substrate to clean and dry the substrate. The second substrate transfer unit includes a plurality of first hand forks operable to support the substrate.

Abstract: A substrate cleaning and drying apparatus includes a first substrate transfer unit operable to transfer a substrate in a horizontal direction at an upper part of a base frame, a second substrate transfer unit operable to receive the substrate from the first substrate transfer unit and transfer the substrate in a vertical direction, a third substrate transfer unit operable to receive the substrate from the second substrate transfer unit and transfer the substrate in a horizontal direction at a lower part of the base frame, and a substrate processing unit operable to receive the substrate from the third substrate transfer unit and perform a cleaning and drying process on the substrate to clean and dry the substrate. The second substrate transfer unit includes a plurality of first hand forks operable to support the substrate.