Patents by Inventor Ki-Hwan RA

Ki-Hwan RA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190144992
    Abstract: A sputtering apparatus includes a sputtering chamber having a shield plate disposed on an inner surface thereof. A process controller controls a sputtering process performed in the sputtering chamber such that a deposition mode and a pasting mode for forming a cover layer on a sedimentary layer are conducted alternately with each other and a pasting time of the pasting mode increases in proportion to cumulative sputtering amounts.
    Type: Application
    Filed: August 23, 2018
    Publication date: May 16, 2019
    Inventors: Dong-Il Kim, Ki-Hwan RA, Seung-Hyuk KIM