Abstract: The present invention relates to a chromatic confocal sensor based on a geometrical phase lens, and provides a chromatic confocal sensor that can confirm a height of a specimen and a location of a height measurement point through a configuration of a simple device.

Abstract: Disclosed are a pulse laser generator and an optical fiber sensor system using the same. The optical fiber sensor system includes a main optical coupler that receives pulse laser light generated from a pulse laser generator from a first input terminal, branches the light to first and second output terminals to output, and outputs, through a third output terminal, light input reversely from the first and second output terminals, a reference optical fiber that is connected to the first output terminal, a multi-point sensing optical fiber unit that is connected to the second output terminal, and in which optical fibers are connected in series or in parallel corresponding to a plurality of sensing points, an optical detection unit that is connected to the third output terminal, and a diagnosis processing unit that detects a change of the physical quantity for the sensing points from signals from the optical detection unit.

Abstract: Disclosed are a pulse laser generator and an optical fiber sensor system using the same. The optical fiber sensor system includes a main optical coupler that receives pulse laser light generated from a pulse laser generator from a first input terminal, branches the light to first and second output terminals to output, and outputs, through a third output terminal, light input reversely from the first and second output terminals, a reference optical fiber that is connected to the first output terminal, a multi-point sensing optical fiber unit that is connected to the second output terminal, and in which optical fibers are connected in series or in parallel corresponding to a plurality of sensing points, an optical detection unit that is connected to the third output terminal, and a diagnosis processing unit that detects a change of the physical quantity for the sensing points from signals from the optical detection unit.

Abstract: The invention relates to a method and an apparatus for measuring the thickness of a transparent film by broad band interferometry, comprising the steps of preparing a correlogram of the film by an interferometer, applying a Fourier transformation to said correlogram to obtain a Fourier phase function, removing a linear component thereof, applying a second integral transformation to the remaining non-linear component to obtain an integral amplitude function of said non-linear component, identifying the peak location of said integral amplitude function and determining the thickness of the film as the double value of the abscissa at said peak location considering a refractive index of a film which is dependent on wavelength. The last two steps may be replaced by identifying the peak locations of said integral amplitude function and determining the thickness of the films as the double values of the abscissas at the peak locations.

Abstract: A method and apparatus for preparing a digital hologram representing an image of an object includes generating a measurement beam and a first reference beam, irradiating the object by the measurement beam, and guiding the measurement beam reflected to an optical sensor. The method also includes guiding the first reference beam to a first mirror, and guiding the reflected beam to the optical sensor so that both beams generate an interference pattern on the sensor. The method includes providing a digital signal representing the interference pattern on the optical sensor, to obtain a digital hologram, and subjecting the digital hologram to a Fourier transform in the spatial frequency domain to obtain a spectrum. The method further includes replacing a section of a first image term overlapped by a DC-term by a corresponding section of a second image term.

Abstract: A method for preparing a digital hologram representing an image of an object, which includes generating a measurement beam and a first reference beam, irradiating the object by the measurement beam and guiding the measurement beam reflected to an optical sensor. The method also includes guiding the first reference beam to a first mirror, extending under an angle different from 90° with the optical axis of the first reference beam, and guiding the reflected beam to the optical sensor so that both beams generate an interference pattern on the sensor. The method further includes reading out the sensor and providing a digital signal representing the interference pattern on the optical sensor, and processing the signal to obtain a digital hologram.

Abstract: The invention relates to a method and an apparatus for measuring the thickness of a transparent film by broad band interferometry, comprising the steps of preparing a correlogram of the film by an interferometer, applying a Fourier transformation to said correlogram to obtain a Fourier phase function, removing a linear component thereof, applying a second integral transformation to the remaining non-linear component to obtain an integral amplitude function of said non-linear component, identifying the peak location of said integral amplitude function and determining the thickness of the film as the double value of the abscissa at said peak location considering a refractive index of a film which is dependent on wavelength. The last two steps may be replaced by identifying the peak locations of said integral amplitude function and determining the thickness of the films as the double values of the abscissas at the peak locations.

Abstract: The invention relates to a method and an apparatus for measuring the thickness of a transparent film by broad band interferometry, comprising the steps of preparing a correlogram of the film by an interferometer, applying a Fourier transformation to said correlogram to obtain a Fourier phase function, removing a linear component thereof, applying a second integral transformation to the remaining non-linear component to obtain an integral amplitude function of said non-linear component, identifying the peak location of said integral amplitude function and determining the thickness of the film as the double value of the abscissa at said peak location considering a refractive index of a film which is dependent on wavelength. The last two steps may be replaced by identifying the peak locations of said integral amplitude function and determining the thickness of the films as the double values of the abscissas at the peak locations.