Patents by Inventor Kiwhan Sung

Kiwhan Sung has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Volatile nickel aminoalkoxide complex and deposition of nickel thin film using same
    Patent number: 7462732
    Abstract: A volatile nickel aminoalkoxide complex of formula (I) can form a nickel thin film having an improved quality by metal organic chemical vapor deposition (MOCVD).
    Type: Grant
    Filed: April 7, 2005
    Date of Patent: December 9, 2008
    Assignee: Korea Research Institute of Chemical Technology
    Inventors: Yunsoo Kim, Chang-Gyoun Kim, Young-Kuk Lee, Taek-Mo Chung, Ki-Seok An, Sun-Sook Lee, Seung-Ho Yoo, Kiwhan Sung
  • Volatile Nickel Aminoalkoxide Complex And Deposition Of Nickel Thin Film Using Same
    Publication number: 20080171890
    Abstract: A volatile nickel aminoalkoxide complex of formula (I) can form a nickel thin film having an improved quality by metal organic chemical vapor deposition (MOCVD).
    Type: Application
    Filed: April 7, 2005
    Publication date: July 17, 2008
    Applicant: KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY
    Inventors: Yunsoo Kim, Chang-Gyoun Kim, Young-Kuk Lee, Taek-Mo Chung, Ki-Seok An, Sun-Sook Lee, Seung-Ho Yoo, Kiwhan Sung
  • Method for preparation of aluminum oxide thin film
    Publication number: 20050271817
    Abstract: An aluminum oxide film is formed on a substrate by a process comprising A) bringing the vapor of a dialkylaluminum alkoxide into contact with the substrate mounted in a deposition reactor so that an aluminum-containing adsorption layer is formed on the substrate; B) removing the unreacted aluminum compound and by-products from the reactor; C) introducing an oxygen source into the reactor so that the oxygen source reacts with the aluminum-containing adsorption layer to form an aluminum oxide layer, and D) removing the unreacted oxygen source and by-products from the reactor.
    Type: Application
    Filed: July 29, 2003
    Publication date: December 8, 2005
    Inventors: Yunsoo Kim, Ki-Seok An, Sun-Sook Lee, Taek-Mo Chung, Wontae Cho, Kiwhan Sung