Patents by Inventor Ki Won Lee

Ki Won Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6391221
    Abstract: A method for effectively removing the thermal-hardened frit seal (solder glass) which is used for assembling the electronic parts is disclosed. By utilizing the solution which contains sulfonic acid ion, the frit seal can be effectively removed without generating the noxious gas. Additionally there are merits of reducing the discharge volume of wastes and conveniences of wastes treatment.
    Type: Grant
    Filed: June 28, 2000
    Date of Patent: May 21, 2002
    Inventor: Ki Won Lee
  • Patent number: 6361613
    Abstract: A method for removing scales formed on iron-based metal alloy containing Ni and/or Cr comprising contacting the metal alloy with a pickling solution containing nitrates and fluorides as essential components. The nitrates and fluorides used for the method are superior to the mixture of nitric acid and hydrofluoric acid in pickling efficiency, fundamental elimination of noxious gas; and optional abbreviation of pre-treatment before pickling. The pickling solution may also contain auxiliary component. A pickling composition containing nitrates and fluorides and a regenerating method of spent pickling solution is also provided.
    Type: Grant
    Filed: December 24, 1997
    Date of Patent: March 26, 2002
    Inventor: Ki Won Lee
  • Patent number: 6284721
    Abstract: A cleaning and etching composition for cleaning and etching substrates comprising quartz, glass, silicon oxide or silicon as a main constituent is disclosed. A cleaning composition for cleaning substrates having a silicon oxide layer comprises: a fluoride which decomposes and releases fluoride ion in aqueous solution during cleaning and etching processes for reacting with silicon; and a persulfate which decomposes and releases hydrogen peroxide in the aqueous solution for increasing the oxidation effect of the fluoride. Display device substrates having silicon oxide layer and LCD glass substrates can be cleaned without imparting damages, as a result, a safe cleaning process can be implemented. A cleaning composition for cleaning substrates having a silicon layer comprises a fluoride, an inorganic acid and/or nitric acid. The above cleaning compositions can also be suitably utilized as an etchant for etching silicon and silicon oxide layers.
    Type: Grant
    Filed: July 21, 1999
    Date of Patent: September 4, 2001
    Inventor: Ki Won Lee
  • Publication number: 20010008141
    Abstract: A method for removing scales formed on iron-based metal alloy containing Ni and/or Cr comprising contacting the metal alloy with a pickling solution containing nitrates and fluorides as essential components. The nitrates and fluorides used for the method are superior to the mixture of nitric acid and hydrofluoric acid in pickling efficiency, fundamental elimination of noxious gas; and optional abbreviation of pre-treatment before pickling. The pickling solution may also contain auxiliary component. A pickling composition containing nitrates and fluorides and a regenerating method of spent pickling solution is also provided.
    Type: Application
    Filed: December 24, 1997
    Publication date: July 19, 2001
    Inventor: KI WON LEE
  • Patent number: 6194365
    Abstract: This invention relates to a composition for cleaning and etching the surface in fabricating electronic displays and the substrates. Specifically this invention relates to a composition to effectively remove the contaminants by cleaning, to remove any contaminants on the surface, and to etch SiO2 and Si substrate in the fabrication process of electronic displays, quartz devices, wafer, and semiconductor wafer. According to this invention, it is possible to clean and etch more efficiently and conveniently. Also The surface roughness is improved. Further the composition of this invention can be made available in powder type for preparing a defined amount of solution. It provides the conveniences in transportation, handling and storage.
    Type: Grant
    Filed: September 15, 1998
    Date of Patent: February 27, 2001
    Inventor: Ki Won Lee
  • Patent number: 5668830
    Abstract: A synchronizer and phase aligning method that provide signal smoothing and filtering functions as well as slip-cycle compensation, and allow for multichannel digital phase alignment, bus deskewing, integration of multiple transceivers within a single semiconductor chip, etc. A delay line produces a plurality of delayed input replicas of an input signal. A clock phase adjuster produces a sampling clock signal from a reference clock signal. The sampling clock signal may be phase adjusted to be offset from the input signal. After certain smoothing and filtering functions, selection logic detects a phase relationship between the sampling clock signal and the input replicas and identifies a closely synchronized signal for output. Using this identified replica signal, slip-cycle compensation and retiming logic outputs a compensated data output signal synchronized with the reference clock signal. Also, an integrated multiple transceiver produced using the phase alignment technique is presented.
    Type: Grant
    Filed: May 3, 1996
    Date of Patent: September 16, 1997
    Assignee: International Business Machines Corporation
    Inventors: Christos John Georgiou, Thor Arne Larsen, Ki Won Lee