Abstract: A method for manufacturing a semiconductor device with a slurry composition for forming a tungsten pattern. The method comprises: forming a trench in an insulating film formed on a substrate; depositing a tungsten film over the insulating film including the trench; first polishing a tungsten film with a first slurry for polishing metal to expose the insulating film, the polishing selectivity ratio of the first slurry onto tungsten/insulating film being range from 30 to 100; and second polishing the insulating film and the tungsten film with a second slurry, the polishing selectivity ratio of the second slurry onto insulating film/tungsten being range from 3 to 500. The method reduces a thickness difference of tungsten patterns, thereby improving a production yield of semiconductor devices.

Abstract: A TFT substrate for inspection for shorts, includes a substrate defined by a display area and a non-display area outside the display area; a plurality of first and second lines formed in the display area on the substrate; pad lines formed to be extended from one side of each of the first lines to the non-display area; a plurality of signal inspection bars formed in the non-display area to cross the pad lines at one side of the pad lines; a shorting inspection bar spaced apart from the outermost signal inspection bar at a predetermined interval and substantially parallel with the signal inspection bar and connected to the pad lines; and a plurality of transparent electrode patterns partially overlapped with the pad lines and connected to one of the signal inspection bars.

Abstract: A flash memory device has a resistivity measurement pattern and method of forming the same. A trench is formed in an isolation film in a Self-Aligned Floating Gate (SAFG) scheme. The trench is buried to form a resistivity measurement floating gate. This allows the resistivity of the floating gate to be measured even in the SAFG scheme. Contacts for resistivity measurement are directly connected to the resistivity measurement floating gate. Therefore, variation in resistivity measurement values, which is incurred by the parasitic interface, can be reduced.

Abstract: A liquid crystal display (LCD) inspection apparatus is provided which is capable of preventing detection of defects from being omitted or degraded due to formation of stains in a certain region of an LCD panel in an inspection of the LCD panel.

Abstract: A thin film transistor array substrate comprises thin film transistors and pixel electrodes formed at respective pixels that are defined by gate lines and data lines that orthogonally intersect each other. The thin film transistor array substrate further comprises a plurality of gate pad units that group a plurality of gate pads extended from the gate lines, and a plurality of data pad units that groups a plurality of data pads extended from the data lines. The thin film transistor array substrate further includes a plurality of gate test terminals connected to the gate pad units and beside at least one side of the respective gate pad units, and a plurality of data test terminals connected to the data pad units and located beside at least one side of the respective data pad units.

Abstract: An LCD test method and apparatus for reducing the number of channels of a probe unit is provided. An apparatus for testing a liquid crystal display including: a stage on which a liquid crystal panel is placed; a plurality of vertically divided blocks, wherein each of the vertically divided blocks include a plurality of adjacent data lines; a data probe unit that provides test pattern signals respectively to groups of at least two of the plurality of vertically divided blocks of the liquid crystal panel; a plurality of horizontally divided blocks, wherein each of the horizontally divided blocks include a plurality of adjacent gate lines; a gate probe unit that provides scanning signals respectively to the plurality of horizontally divided blocks of the liquid crystal panel; and a controller that provides test pattern signals to the data probe unit and provides scanning signals to the gate probe unit.

Abstract: A liquid crystal display (LCD) inspection apparatus for inspecting an LCD panel, includes a worktable to support an LCD panel seated on a front side of the worktable, probe units to be electrically connected to the LCD panel, a backlight unit to emit light toward the LCD panel, a first polarizing plate arranged in front of the LCD panel to polarize the light, and a second polarizing plate arranged between the LCD panel and the backlight unit to polarize the light, and a shutter unit to selectively shut off the light emitted from the backlight unit toward the LCD panel.

Abstract: A liquid crystal display (LCD) inspection apparatus and method are provided. The inspection apparatus and method are capable of automatically and accurately detecting defects of an LCD panel, and providing information of the automatically-detected defects of the LCD panel to the operator, thereby enabling the operator to easily recognize the defects.

Abstract: A backlight unit for a test device of an LCD panel is disclosed. The backlight unit includes: a chamber enclosing a predetermined space, the chamber being provided with a plurality of through holes formed around the chamber perimeter to allow air flow between the interior and exterior of the chamber; a backlight provided in the chamber to emit a light to an LCD panel positioned in the chamber; and a plurality of circulating fans provided in the chamber to circulate air inside the chamber.

Abstract: The liquid crystal display (LCD) inspection apparatus for inspecting an LCD panel includes a worktable which supports the LCD panel to be seated on a front side of the worktable, probe units which are electrically connected to the LCD panel, a backlight unit which supplies light to the LCD panel, an imaging unit which photographs an image of the LCD panel supported by the worktable, a first polarizing plate which is arranged between the imaging unit and the LCD panel to polarize the light, a second polarizing plate which is arranged between the LCD panel and the backlight unit to polarize the light, an illumination unit which emits illumination light to surfaces of the LCD panel, and an image processor which receives the image photographed by the imaging unit, and extracts defect information from the received image.

Abstract: A method of manufacturing a semiconductor device in a MLM process to reduce compression stress of a metal line or a HDP oxide film, and to reduce compression stress in a subsequent metal line thermal treatment process. It is thus possible to reduce generation of a crack caused by compression stress. Further, by obviating a heterogeneous interface becoming a cause of a crack and stabilizing the interface of an unstable TEOS oxide film, generation of a crack in a semiconductor device can be reduced.

Abstract: A polarizing reticle including a transparent substrate, a polarizing filter formed over the transparent substrate, and a mask pattern formed on the polarizing filter. The polarizing reticle can polarize illumination light incident thereto in a desired direction in a photolithography process.

Abstract: A method for manufacturing a semiconductor device is disclosed. In a disclosed method, a high voltage device and a low voltage device are formed at the same time, before a thermal oxidization process for thickly forming a gate oxide film of a high voltage region, and a bonding structure on the surface of the oxide film in a high voltage region is broken by means of an ion implantation process. In growing the oxide film of an actual high voltage region, the oxide film of the high voltage region can be grown more rapidly than the growth rate by means of heat, thus reducing the bird's beak. Therefore, since a depletion region at the PN junction is increased, the CCST properties can be improved.