Patents by Inventor Kibatsu Shinohara

Kibatsu Shinohara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5929570
    Abstract: This invention is concerned with providing a micro-wave plasma generating device of a simple structure and with good cooling effect of the insulating tube. Micro-wave plasma generating device which generates the plasma by introduction of a processing gas into the insulating tube transversing through the micro-wave waveguide in which the metal wire or the metal rod is spirally wound on and around the insulating tube. An air-blowing means is further provided at a portion of the insulating tube through which the waveguide transverses. The metal wire wound around the insulating tube may be affixed to the tube using solder.
    Type: Grant
    Filed: February 19, 1998
    Date of Patent: July 27, 1999
    Assignees: Nihon Koshuha Kabushiki Kaisha, Daihen Corporation
    Inventors: Kibatsu Shinohara, Satoru Ishida, Hiroyuki Ueyama
  • Patent number: 5900699
    Abstract: The plasma generator includes a plasma generation chamber which is pumped and into which plasma generation gas is introduced. An antenna provided outside the plasma generation chamber, a RF source supplying a RF power with the antenna to excite the antenna. A part or whole of the plasma generation chamber is made of dielectric. The antenna radiates the RF through the dielectric and includes an antenna element which longitudinal direction is vertical to the direction for the plasma. The plasma generation chamber has a side wall intersecting the longitudinal direction of the antenna element at both sides. A part or whole of a plasma generation chamber is made of dielectric having relative permittivity .epsilon..sub.S. The antenna radiates a RF through the dielectric and is comprised of multiple antenna elements which longitudinal directions are on a plane vertical to the direction for the plasma.
    Type: Grant
    Filed: June 16, 1997
    Date of Patent: May 4, 1999
    Assignees: Nec Corporation, Anelva Corporation, Nihon Koshuha Co., Ltd.
    Inventors: Seiji Samukawa, Tsutomu Tsukada, Yukito Nakagawa, Kibatsu Shinohara, Hiroyuki Ueyama
  • Patent number: 5874706
    Abstract: An ECR type plasma processing apparatus including an airtight processing chamber and a work table for supporting a semiconductor wafer thereon disposed in the processing chamber. The interior of the processing chamber is exhausted to a vacuum by an exhaust system and an active gas such as CF.sub.4 gas and an inert gas such as Ar gas are supplied into the processing chamber through nozzles. Further, a magnet is disposed around the processing chamber to generate a magnetic field perpendicular to the upper surface of the wafer and a microwave transmitting window is disposed in the ceiling of the processing chamber. Also, a microwave generated by a microwave generator is introduced into the transmitting window through a rectangular waveguide, a mode converter, and a tapered waveguide. The microwave is transmitted through the rectangular waveguide in the TE.sub.10 mode, is converted into a hybrid wave of two mode waves, i.e., a TM.sub.01 -mode wave and a TE.sub.
    Type: Grant
    Filed: September 24, 1997
    Date of Patent: February 23, 1999
    Assignees: Tokyo Electron Limited, Nihon Koshuha Co., Ltd.
    Inventors: Nobuo Ishii, Kibatsu Shinohara
  • Patent number: 5637961
    Abstract: A plasma generating apparatus comprises a chamber for containing an object to be treated, a pair of high frequency coils located concentric in the chamber and opposed to the object, to generate alternating magnetic fields for inducing alternating electric fields in the chamber, the alternating electric fields creating plasma used to treat the object, a high frequency power supply for generating a high frequency power, distribution means for distributing the high frequency power into a plurality of distributed powers at a predetermined distribution ratio, phase shifter means for shifting the phase of each of the distributed powers, and a matching box for supplying the high frequency coils with the distributed powers of phases set by the phase shifter means, respectively.
    Type: Grant
    Filed: August 21, 1995
    Date of Patent: June 10, 1997
    Assignee: Tokyo Electron Limited
    Inventors: Nobuo Ishii, Kibatsu Shinohara
  • Patent number: 5565738
    Abstract: A plasma processing apparatus comprises a plasma chamber having a gas inlet opening and a gas outlet opening. A first high-frequency energy source supplies accelerating energy to a holder that supports a semiconductor specimen within the chamber to produce a high-frequency accelerating electric field. Gas is introduced to the chamber through the inlet opening and accelerated by the electric field toward the specimen. An antenna structure is connected to a second high-frequency energy source which supplies exciting energy at a frequency in the range between 100 MHz and 1 GHz which is higher than the frequency of the accelerating energy. The antenna structure has radially outwardly extending, circumferentially equally spaced apart elements of length equal to the quarter wavelength of the exciting energy so that there is a phase difference of 180 degrees between adjacent ones of the antenna elements. The accelerated gas is uniformly excited and converted to high-density plasma.
    Type: Grant
    Filed: May 12, 1995
    Date of Patent: October 15, 1996
    Assignees: NEC Corporation, Nihon Koshuha Co., Ltd., Anelva Corporation
    Inventors: Seiji Samukawa, Kibatsu Shinohara, Hirobumi Matsumoto, Tsutomu Tsukada, Yukito Nakagawa
  • Patent number: 5542833
    Abstract: An apparatus for continuously vulcanizing a rubber molding extruded from an extruder is disclosed in which a single or plural microwave heating apparatus is arranged within a heating bath. The microwave heating apparatus can generate internal heating of the rubber molding so that a surface temperature of the rubber molding can be held at a temperature substantially equal to the internal temperature of the rubber molding. Thus, uniform vulcanization of the rubber molding occurs. In addition, when both the microwave heating apparatus and an external heating source are arranged within the heating bath, an infrared ray radiator, arranged within the heating bath, radiates infra-red rays according to energy absorbed from the microwave heating apparatus and the external heating source. Thus overall heating efficiency can be increased.
    Type: Grant
    Filed: September 14, 1994
    Date of Patent: August 6, 1996
    Assignee: Kinugawa Rubber Industrial Co., Ltd.
    Inventors: Shozo Watanabe, Kibatsu Shinohara
  • Patent number: 5448173
    Abstract: With a view to enabling errors in the space potential to be automatically corrected by detecting a floating potential in each of a plurality of probes and to remove the errors in measurement based on the corrected space potential to thereby realize the accurate measurement of the space potential, there is provided a triple-probe plasma measuring apparatus, which comprises: a circuit for measuring electron temperature and electron density of a plasma with use of triple probes; a circuit for detecting and holding a floating potential difference; a differential voltage adding circuit; a fixed voltage source; and a change-over switch, the apparatus being capable of determining a difference in the floating potentials at the position of said probes, and superimposing the potential difference determined on the fixed voltage.
    Type: Grant
    Filed: October 27, 1992
    Date of Patent: September 5, 1995
    Assignees: Nihon Kosyuha Kabushiki Kaisha, Nichimen Kabushiki Kaisha
    Inventors: Kibatsu Shinohara, Tsuku Umezawa
  • Patent number: 5385463
    Abstract: A control system for automatically controlling a continuous vulcanization line for manufacturing sponge rubber products, which includes a sensor for monitoring an outside dimension of a sponge rubber product produced by the continuous vulcanization line, a discriminating circuit for determining whether the monitored outside dimension is within a predetermined criterion defined by designated upper and lower limits of an acceptable rubber product, an arithmetic circuit for deriving an offset amount of the outside dimension, offsetting from the criterion, and a control circuit for controlling an output power of microwave generated by a microwave vulcanizer employed in a primary heating system for pre-foaming a sponge rubber material, depending on the offset amount of the outside dimension.
    Type: Grant
    Filed: March 7, 1994
    Date of Patent: January 31, 1995
    Assignee: Kinugawa Rubber Ind. Co., Ltd.
    Inventors: Takanori Kawamura, Kibatsu Shinohara
  • Patent number: 5365147
    Abstract: A plasma stabilizing apparatus having circuits for measuring electron temperature and electron density of a plasma using triple probes, a plasma gas pressure control circuit, and a plasma excitation power control circuit, for automatically stabilizing the plasma.
    Type: Grant
    Filed: July 27, 1992
    Date of Patent: November 15, 1994
    Assignees: Nichimen Kabushiki Kaisha, Nihon Kosyuha Kabushiki Kaisha
    Inventors: Kibatsu Shinohara, Kozo Obara, Tsuku Umezawa
  • Patent number: 5359282
    Abstract: A plasma diagnosing apparatus for performing plasma diagnosis witch probes having a high degree of cleanliness by removing contamination caused by reactive plasma, etc., while quantitatively detecting a degree of the contamination of the probes. The disclosed apparatus avoids the disadvantages of conventional apparatuses, in which the voltage-current characteristics of the probes are deteriorated by growth of the contaminant film formed on the probes, making it difficult to measure the parameters of the plasma conditions.
    Type: Grant
    Filed: July 15, 1992
    Date of Patent: October 25, 1994
    Assignees: Nichimen Kabushiki Kaisha, Nihon Kosyuha Kabushiki Kaisha
    Inventors: Shinriki Teii, Kibatsu Shinohara, Kozo Obara, Tsuku Umezawa
  • Patent number: 5328348
    Abstract: A control system for automatically controlling a continuous vulcanization line for manufacturing sponge rubber products, includes a sensor for monitoring an outside dimension of a sponge rubber product produced by the continuous vulcanization line, a discriminating circuit for determining whether the monitored outside dimension is within a predetermined criterion defined by designated upper and lower limits of an acceptable rubber product, an arithmetic circuit for deriving an offset amount of the outside dimension, offsetting from the criterion, and a control circuit for controlling an output power of microwave generated by a microwave vulcanizer employed in a primary heating system for pre-foaming a sponge rubber material, depending on the offset amount of the outside dimension.
    Type: Grant
    Filed: March 23, 1992
    Date of Patent: July 12, 1994
    Assignee: Kinugawa Rubber Ind. Co., Ltd.
    Inventors: Takanori Kawamura, Kibatsu Shinohara
  • Patent number: 5041803
    Abstract: An automatic load-matching circuit for microwaves, disposed on a transmission line between a signal source and a load. Signal detection means for detecting a travelling wave component and a reflected wave component and for producing outputs corresponding to the absolute value of reflection coefficient .GAMMA., the cosine products .vertline..GAMMA..vertline. cos .theta., and the sine product .vertline..GAMMA..vertline. sin .theta. for controlling an automatic matching means, which includes three matching elements, each having an adjustable short-circuit length, disposed on the transmission line with a separation of odd number multiples of 1/8 of a wavelength along the transmission line. The first and third matching elements are connected such that in response to a change in the short-circulating length of one of the first and third matching elements, the short-circuiting length of the other of the first and third matching elements changes in a corresponding opposite manner.
    Type: Grant
    Filed: March 21, 1990
    Date of Patent: August 20, 1991
    Assignee: Nihon Koshuha Co., Ltd.
    Inventors: Kibatsu Shinohara, Hiroshi Hasunuma