Patents by Inventor Kichihei Sato

Kichihei Sato has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Sintered silicon carbide porous body impregnated with metallic silicon
    Patent number: 4710428
    Abstract: A susceptor for use in an in-line or continuous deposition of a film on a silicon wafer by a CVD process, which comprises Si-SiC ceramic containing 7% to 25% by weight of metallic silicon having a high purity. The susceptor has enhanced mechanical strength and dimensional stability and can normally be used repeatedly a large number of times. Further, by using such a susceptor a uniform film can be deposited on the silicon wafer by the CVD process, and a silicon wafer can be coated with a film having desired electrical properties by the CVD process without contaminating the silicon wafer.
    Type: Grant
    Filed: March 10, 1986
    Date of Patent: December 1, 1987
    Assignee: Toshiba Ceramics Co., Ltd.
    Inventors: Teruyasu Tamamizu, Kichihei Sato, Takashi Tanaka, Shunkichi Sato