Patents by Inventor Kien Nai Chuc

Kien Nai Chuc has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Plasma reactor inductive coil antenna with flat surface facing the plasma
    Patent number: 6401652
    Abstract: The present invention is embodied in a plasma reactor with an inductive coil antenna facing the reactor chamber in which the windings of the coil antenna have a flattened cross-sectional shape, the flat portion of the winding facing toward the plasma within the reactor. Preferably, the coil antenna is located outside the reactor and faces a ceiling or wall of the reactor chamber. The coil antenna may be a single helical coil winding or multiple concentric spiral windings.
    Type: Grant
    Filed: May 4, 2000
    Date of Patent: June 11, 2002
    Assignee: Applied Materials, Inc.
    Inventors: Jonathan D. Mohn, Arthur H. Sato, Kien Nai Chuc