Patents by Inventor Kihwan Yoon

Kihwan Yoon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Sputtering reactor and method of using an unbalanced magnetron
    Patent number: 6440282
    Abstract: In a sputtering device which has a small rotatable magnetron (30) arranged opposite a target 16, the magnetron (30) has a first magnet band (44) and a second magnet opposite a target 16, the magnetron (30) has a first magnet band (44) and a second magnet a greater total magnetic flux. Some of the lines of magnetic flux from the second magnet band (42) pass through the first magnet band (44) and terminate at the second magnet band (42). The remaining lines of magnetic flux from the second magnet band (42) form a magnetic flux loop that encloses the first magnet band (44) and that terminates at the second magnet band (42). The outer band is preferably in an oval shape having a minor axis no smaller than 0.8 of the major axis, and more preferably in a circular shape.
    Type: Grant
    Filed: June 30, 2000
    Date of Patent: August 27, 2002
    Assignee: Applied Materials, Inc.
    Inventors: Yuichi Wada, Hisashi Aida, Kihwan Yoon