Patents by Inventor Kiichi Hama

Kiichi Hama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8527314
    Abstract: A user terminal is connected through the Internet to a server. On the basis of the identification information of the client inputted from the client terminal, the server extracts an service selected by the client from a database for user management, further, extracts calculated maintenance contents for each service from a database for service management and sends them to the user terminal. Thus, the user can collect maintenance contents, such as the staff capable of providing service, the time until the user receives a service, and the charge, so that the user can utilize the information as indications to select an optimal service such as maintenance.
    Type: Grant
    Filed: July 14, 2004
    Date of Patent: September 3, 2013
    Assignee: Tokyo Electron Limited
    Inventors: Hiroshi Nishikawa, Youichi Araki, Kiichi Hama
  • Patent number: 8032629
    Abstract: A computer terminal connected to a manufacturing apparatus as an object of the maintenance management is connected to a server machine providing a maintenance management service by a network, enabling bi-directional communication. The computer terminal monitors whether or not the object apparatus is restarted and transmits restart information indicating restart completion due to maintenance performed on the object apparatus by the customer to the server machine upon determining that the object apparatus is restarted. The server machine generates a random number within the specific range when receiving the restart information from the computer terminal, retrieves points corresponding to the random number from the lottery point setting storage unit, and stores the retrieved points in the lottery point storage unit. This can encourage the customer to perform maintenance on the object apparatus in order to indicate said restart completion to obtain more points.
    Type: Grant
    Filed: February 18, 2010
    Date of Patent: October 4, 2011
    Assignee: Tokyo Electron Limited
    Inventors: Hiroshi Nishikawa, Youichi Araki, Kiichi Hama
  • Patent number: 7975049
    Abstract: A computer terminal connected to a manufacturing apparatus as an object of the maintenance management is connected to a server machine providing a maintenance management service by a network, enabling bi-directional communication. The computer terminal transmits maintenance information including a kind of a maintenance method executed at the customer side to the server machine. The server machine acquires the kind of the maintenance method from the maintenance information received from the computer terminal, retrieves points corresponding to the kind of the maintenance method, and stores the retrieved points in a maintenance point storage unit. More points are set for more time consuming maintenance. This can encourage the customer to perform more time consuming maintenance on the manufacturing apparatus in order to obtain more points.
    Type: Grant
    Filed: February 18, 2010
    Date of Patent: July 5, 2011
    Assignee: Tokyo Electron Limited
    Inventors: Hiroshi Nishikawa, Youichi Araki, Kiichi Hama
  • Patent number: 7958235
    Abstract: A computer terminal connected to a manufacturing apparatus as an object of the maintenance management is connected to a server machine providing a maintenance management service by a network, enabling bi-directional communication. The computer terminal monitors whether or not the object apparatus is restarted and transmits restart information indicating restart completion due to maintenance performed on the object apparatus by the customer to the server machine upon determining that the object apparatus is restarted. The server machine generates a random number within the specific range when receiving the restart information from the computer terminal, retrieves points corresponding to the random number from the lottery point setting storage unit, and stores the retrieved points in the lottery point storage unit. This can encourage the customer to perform maintenance on the object apparatus in order to indicate said restart completion to obtain more points.
    Type: Grant
    Filed: February 18, 2010
    Date of Patent: June 7, 2011
    Assignee: Tokyo Electron Limited
    Inventors: Hiroshi Nishikawa, Youichi Araki, Kiichi Hama
  • Publication number: 20100145780
    Abstract: A computer terminal 110 connected to a manufacturing apparatus 120 as an object of the maintenance management is connected to a server machine 210 providing a maintenance management service by a network 500, enabling bi-directional communication. The computer terminal transmits status information on an apparatus as an object of the maintenance management to the server machine in response to a status information transmission request received from a server at every predetermined interval. The server machine includes a status point information management database for storing status points generated according to status information and determines whether status information has been received at every predetermined interval. Each time it is determined that status information is received, a predetermined point is added so as to update the status points of the status point information management database. This can encourage a customer to perform maintenance by him/herself and reduce workload of a serviceman.
    Type: Application
    Filed: February 18, 2010
    Publication date: June 10, 2010
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Hiroshi NISHIKAWA, Youichi Araki, Kiichi Hama
  • Publication number: 20100145781
    Abstract: A computer terminal 110 connected to a manufacturing apparatus 120 as an object of the maintenance management is connected to a server machine 210 providing a maintenance management service by a network 500, enabling bi-directional communication. The computer terminal transmits status information on an apparatus as an object of the maintenance management to the server machine in response to a status information transmission request received from a server at every predetermined interval. The server machine includes a status point information management database for storing status points generated according to status information and determines whether status information has been received at every predetermined interval. Each time it is determined that status information is received, a predetermined point is added so as to update the status points of the status point information management database. This can encourage a customer to perform maintenance by him/herself and reduce workload of a serviceman.
    Type: Application
    Filed: February 18, 2010
    Publication date: June 10, 2010
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Hiroshi NISHIKAWA, Youichi Araki, Kiichi Hama
  • Patent number: 7698149
    Abstract: A computer terminal 110 connected to a manufacturing apparatus 120 as an object of the maintenance management is connected to a server machine 210 providing a maintenance management service by a network 500, enabling bi-directional communication. The computer terminal transmits status information on an apparatus as an object of the maintenance management to the server machine in response to a status information transmission request received from a server at every predetermined interval. The server machine includes a status point information management database for storing status points generated according to status information and determines whether status information has been received at every predetermined interval. Each time it is determined that status information is received, a predetermined point is added so as to update the status points of the status point information management database. This can encourage a customer to perform maintenance by him/herself and reduce workload of a serviceman.
    Type: Grant
    Filed: August 31, 2004
    Date of Patent: April 13, 2010
    Assignee: Tokyo Electron Limited
    Inventors: Hiroshi Nishikawa, Youichi Araki, Kiichi Hama
  • Patent number: 7183219
    Abstract: An SiO2 film layer formed at a wafer placed inside a process chamber of an etching device is etched by generating plasma from a process gas containing fluorocarbon which has been introduced into the process chamber. The contents of an etchant and the byproducts are measured through infrared laser absorption analysis. The individual contents thus measured are compared with the contents of the etchant and the byproducts in the plasma corresponding to the increase in the aspect ratio of a contact hole set in advance. The quantity of O2 added into the process gas is adjusted to match the measured contents with the predetermined contents. The quantity of O2 added into the process gas is continuously increased as the aspect ratio becomes higher. As a result, a contact hole is formed at the SiO2 film layer without damaging the photoresist film layer or inducing an etch stop.
    Type: Grant
    Filed: December 21, 1999
    Date of Patent: February 27, 2007
    Assignee: Tokyo Electron AT Limited and Japan Science and Technology Corporation
    Inventors: Kiichi Hama, Hiroyuki Ishihara, Akinori Kitamura
  • Publication number: 20050044204
    Abstract: A computer terminal 110 connected to a manufacturing apparatus 120 as an object of the maintenance management is connected to a server machine 210 providing a maintenance management service by a network 500, enabling bi-directional communication. The computer terminal transmits status information on an apparatus as an object of the maintenance management to the server machine in response to a status information transmission request received from a server at every predetermined interval. The server machine includes a status point information management database for storing status points generated according to status information and determines whether status information has been received at every predetermined interval. Each time it is determined that status information is received, a predetermined point is added so as to update the status points of the status point information management database. This can encourage a customer to perform maintenance by him/herself and reduce workload of a serviceman.
    Type: Application
    Filed: August 31, 2004
    Publication date: February 24, 2005
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Hiroshi Nishikawa, Youichi Araki, Kiichi Hama
  • Publication number: 20040260597
    Abstract: A user terminal is connected through the Internet to a server. On the basis of the identification information of the client inputted from the client terminal, the server extracts an service selected by the client from a database for user management, further, extracts calculated maintenance contents for each service from a database for service management and sends them to the user terminal. Thus, the user can collect maintenance contents, such as the staff capable of providing service, the time until the user receives a service, and the charge, so that the user can utilize the information as indications to select an optimal service such as maintenance.
    Type: Application
    Filed: July 14, 2004
    Publication date: December 23, 2004
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Hiroshi Nishikawa, Youichi Araki, Kiichi Hama
  • Patent number: 6149760
    Abstract: An inductively coupled type dry etching apparatus has a spiral RF antenna disposed on the ceiling wall of a process chamber. A susceptor is arranged in the process chamber, for mounting a semiconductor wafer thereon. The ceiling wall has upper and lower layers with a dielectric matrix, and a conductive Faraday shield layer sandwiched therebetween. The Faraday shield layer has a plurality of slits radially arranged. The matrix of the upper and lower layers and the Faraday shield layer are set to have coefficients of thermal expansion close to each other, and/or the Faraday shield layer is set to have a very small thickness.
    Type: Grant
    Filed: October 15, 1998
    Date of Patent: November 21, 2000
    Assignees: Tokyo Electron Yamanashi Limited, Japan Science and Technology Corporation
    Inventor: Kiichi Hama
  • Patent number: 6089182
    Abstract: A plasma etching apparatus of the induction coupling type for processing an LCD substrate has a process container forming an airtight process room. A work table is arranged in the process room for supporting the LCD substrate. A vacuum pump is arranged for exhausting and setting the process room into a vacuum state. An antenna block having a plurality of dielectric layers is arranged to face the work table. An RF antenna is embedded in one of the dielectric layers of the antenna block for forming an electric field. A power supply is connected to the RF antenna for applying an RF power. The lowermost layer of the antenna block is formed as a shower head for supplying a process gas into the process room from a position between the RF antenna and the work table. At least part of the process gas is turned into plasma by the electric field.
    Type: Grant
    Filed: September 30, 1997
    Date of Patent: July 18, 2000
    Assignee: Tokyo Electron Limited
    Inventor: Kiichi Hama
  • Patent number: 6079357
    Abstract: An inductively coupled type dry etching apparatus has an RF antenna disposed on the ceiling wall of a process chamber. A susceptor is arranged in the process chamber, for mounting a semiconductor wafer thereon. The ceiling wall has a matrix of alumina ceramic, and heat generating elements of a salt of a transition metal oxide, which are dispersed in the matrix and capable of self-generating heat by an RF electric field.
    Type: Grant
    Filed: October 15, 1998
    Date of Patent: June 27, 2000
    Assignees: Tokyo Electron Yamanashi Limited, Japan Science and Technology Corporation
    Inventor: Kiichi Hama
  • Patent number: 5792261
    Abstract: A plasma CVD apparatus for forming a silicon film on an LCD substrate includes a container which is divided into process and upper chambers by a quartz partition plate. A work table on which the substrate is mounted is arranged in the process chamber and a lower electrode to which a high frequency potential is applied is arranged in the work table. First lower and second upper supply heads are arranged between the partition plate and the work table in the process chamber. SiH.sub.4 and H.sub.2 gas and He gases are supplied through the first and second supply heads. He gas is transformed into plasma while SiH.sub.4 and H.sub.2 gas is excited and decomposed by the plasma thus formed. Two coils are arranged in the upper chamber and high frequency voltages are applied to the coils to generate electromagnetic field to induce the transforming of He gas into plasma.
    Type: Grant
    Filed: March 29, 1996
    Date of Patent: August 11, 1998
    Assignee: Tokyo Electron Limited
    Inventors: Kiichi Hama, Jiro Hata, Toshiaki Hongoh
  • Patent number: 5716451
    Abstract: A plasma etching apparatus of the induction coupling type for processing an LCD substrate has a process container forming an airtight process room. A work table is arranged in the process room for supporting the LCD substrate. A vacuum pump is arranged for exhausting and setting the process room at a vacuum. An antenna block having a plurality of dielectric layers is arranged to face the work table. An RF antenna is embedded in one of the dielectric layers of the antenna block for forming an electric field. A power supply is connected to the RF antenna for applying an RF power. The lowermost layer of the antenna block is formed as a shower head for supplying a process gas into the process room from a position between the RF antenna and the work table. At least part of said process gas is turned into plasma by the electric field.
    Type: Grant
    Filed: August 14, 1996
    Date of Patent: February 10, 1998
    Assignee: Tokyo Electron Limited
    Inventors: Kiichi Hama, Toshiaki Hongoh, Yasuyuki Kuriki
  • Patent number: 5529630
    Abstract: An amorphous silicon film is formed on a glass substrate by a CVD method, and then the island regions of the amorphous silicon film is changed to a plurality of polycrystalline silicon regions which are arranged in a line and apart with each other in a predetermined distanced by intermittently irradiating laser pulses each having the same dimensions as those of the island region onto the amorphous silicon film, using a laser beam irradiating section. Switching elements including the island regions as semiconductor regions are formed by etching and film-forming process to constitute a driving circuit section. The section is divided to gate driving circuit sections and source driving circuit sections for driving thin film transistors formed in a pixel region.
    Type: Grant
    Filed: February 9, 1995
    Date of Patent: June 25, 1996
    Assignee: Tokyo Electron Limited
    Inventors: Issei Imahashi, Kiichi Hama, Jiro Hata
  • Patent number: 5525159
    Abstract: A plasma CVD apparatus for forming a silicon film on an LCD substrate includes a container which is divided into process and upper chambers by a quartz partition plate. A work table on which the substrate is mounted is arranged in the process chamber and a lower electrode to which a high frequency potential is applied is arranged in the work table. First lower and second upper supply heads are arranged between the partition plate and the work table in the process chamber. SiH.sub.4 and H.sub.2 gas and He gases are supplied through the first and second supply heads. He gas is transformed into plasma while SiH.sub.4 and H.sub.2 gas is excited and decomposed by the plasma thus formed. Two coils are arranged in the upper chamber and high frequency voltages are applied to the coils to generate electromagnetic field to induce the transforming of He gas into plasma.
    Type: Grant
    Filed: December 16, 1994
    Date of Patent: June 11, 1996
    Assignee: Tokyo Electron Limited
    Inventors: Kiichi Hama, Jiro Hata, Toshiaki Hongoh
  • Patent number: 5413958
    Abstract: An amorphous silicon film is formed on a glass substrate by a CVD method, and then the island regions of the amorphous silicon film is changed to a plurality of polycrystalline silicon regions which are arranged in a line and apart with each other in a predetermined distanced by intermittently irradiating laser pulses each having the same dimensions as those of the island region onto the amorphous silicon film, using a laser beam irradiating section. Switching elements including the island regions as semiconductor regions are formed by etching and film-forming process to constitute a driving circuit section. The section is divided to gate driving circuit sections and source driving circuit sections for driving thin film transistors formed in a pixel region.
    Type: Grant
    Filed: November 16, 1993
    Date of Patent: May 9, 1995
    Assignee: Tokyo Electron Limited
    Inventors: Issei Imahashi, Kiichi Hama, Jiro Hata
  • Patent number: RE39020
    Abstract: A plasma CVD apparatus for forming a silicon film on an LCD substrate includes a container which is divided into process and upper chambers by a quartz partition plate. A work table on which the substrate is mounted is arranged in the process chamber and a lower electrode to which a high frequency potential is applied is arranged in the work table. First lower and second upper supply heads are arranged between the partition plate and the work table in the process chamber. SiH4 and H2 gas and He gases are supplied through the first and second supply heads. He gas is transformed into plasma while SiH4 and H2 gas is excited and decomposed by the plasma thus formed. Two coils are arranged in the upper chamber and high frequency voltages are applied to the coils to generate electromagnetic field to induce the transforming of He gas into plasma. High frequency voltages applied to the coils are the same in phase and directions of current flowing through adjacent portions of the coils are the same.
    Type: Grant
    Filed: February 16, 2000
    Date of Patent: March 21, 2006
    Assignee: Tokyo Electron, Ltd.
    Inventors: Kiichi Hama, Jiro Hata, Toshiaki Hongoh
  • Patent number: RE36371
    Abstract: In a method of forming a polycrystalline silicon film in a process of manufacturing an LCD, a hydrogenated amorphous silicon film is formed on a glass substrate by plasam CVD throughout areas serving as the pixel portion and driver unit of the LCD. A laser beam is radiated on a selected region of the film on the area serving as the driver unit. The energy of the laser beam is set such that hydrogen in the film is discharged without crystallizing the film and damaging the film. The energy of the laser beam is gradually increased to gradually discharge hydrogen from the film. The energy of the laser beam is finally set such that the film is transformed into a polycrystalline silicon film. The amorphous silicon film can be poly-crystallized without damaging the film by the discharge of hydrogen.
    Type: Grant
    Filed: December 13, 1996
    Date of Patent: November 2, 1999
    Assignee: Tokyo Electron Limited
    Inventors: Issei Imahashi, Kiichi Hama, Jiro Hata