Patents by Inventor Kijung Jung

Kijung Jung has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240010664
    Abstract: An organometallic compound represented by Formula 1: M1(L1)n1(L2)n2??Formula 1 wherein, M1 is a transition metal, L1 is a ligand represented by Formula 1A, L2 is a ligand represented by Formula 1B, and n1 and n2 are each independently 1 or 2, wherein X1 is C or N, and X2 is C or N, b1 is an integer from 1 to 6, b2 is an integer from 1 to 8, * and *? each indicate a binding site to M1 in Formula 1, and the remaining substituent groups are as described herein.
    Type: Application
    Filed: June 29, 2023
    Publication date: January 11, 2024
    Inventors: Ohyun Kwon, Bumwoo Park, Myungsun Sim, Kijung Jung, Yongsuk Cho, Byoungki Choi, Jongwon Choi
  • Publication number: 20230371357
    Abstract: An organometallic compound represented by Formula 1: wherein M1 is a transition metal, L1 is a ligand represented by Formula 1A, L2 is a ligand represented by Formula 1B, and n1 and n2 are each independently 1 or 2, wherein Formulae 1A and 1B are as described herein.
    Type: Application
    Filed: April 4, 2023
    Publication date: November 16, 2023
    Inventors: Ohyun Kwon, Bumwoo Park, Myungsun Sim, Kijung Jung, Yongsuk Cho, Byoungki Choi, Jongwon Choi
  • Publication number: 20230309377
    Abstract: An organometallic compound represented by Formula 1: wherein, Y1 to Y4 are each independently C or N, one of Y1 to Y4 is N bonded to Ir in Formula 1, and one of the remaining Y1 to Y4 is C bonded to ring CY2 in Formula 1, Y9 is O, S, N(R19), C(R19a)(R19b), or Si(R19a)(R19b), X2 is C, ring CY1 and ring CY2 are each independently a C5-C30 carbocyclic group or a C1-C30 heterocyclic group, Z1 is a group represented by —Si(Q3)(Q4)(Q5) or a group represented by —Ge(Q3)(Q4)(Q5), a1 is an integer from 0 to 2, a2 is an integer from 0 to 20, b1 and b2 are each independently an integer from 1 to 10, and R1, R19, R19a, R19b, R2, R30a, R30b, R37, and Z2 are as described herein.
    Type: Application
    Filed: March 22, 2023
    Publication date: September 28, 2023
    Inventors: Jongwon Choi, Yongsuk Cho, Ohyun Kwon, Bumwoo Park, Myungsun Sim, Sunghun Lee, Kijung Jung, Byoungki Choi, Dmitry KRAVCHUK
  • Publication number: 20230205087
    Abstract: A photoresist underlayer composition comprising a first polymer comprising a first structural unit derived from an N-(alkoxymethyl) (meth)acrylic amide monomer; a second structural unit comprising an aromatic group, a heterocyclic group, an ester group, an amide group, or a combination thereof, wherein the second structural unit further comprises a crosslinkable group; wherein the first polymer comprises the second structural unit, the photoresist underlayer composition further comprises a second polymer comprising the second structural unit, or a combination thereof, a thermal acid generator; and a solvent.
    Type: Application
    Filed: December 20, 2022
    Publication date: June 29, 2023
    Inventors: Min Kyung Jang, HyeonWoo Shin, Kijung Jung