Abstract: A process for treating a recycled polyolefin with an emulsion comprising aqueous and organic phases, as well as the use of said process and/or emulsion for the at least partial removal of volatile organic compounds.

Abstract: A process for reducing the hydrophobic functional group-containing volatile organic compound content and hydrophilic volatile organic compound content of recycled polyolefin comprising an acid washing step followed by an alkaline/neutral washing step.

Abstract: The present invention relates to a method for removing a foreign material from the surface of an article comprising the following steps: i) providing an article having a surface covered at least partly with a foreign material; ii) contacting the article provided in step i) with a cleaning medium being an acid having a pKa in the range from ?10 to 7 having a minimum concentration of 1 wt.

Abstract: A method for removing ink and/or a foreign material different from ink from the surface of an article, wherein at least a part of the surface of the article comprises a polymer, the method includes: i) providing an ink imprinted article and/or an article having a surface covered at least partly by a foreign material different from ink; ii) contacting the article provided in step i) with an acid having a pKa in the range from ?10 to 7 having a minimum concentration of 1 wt.-% for solving the ink and/or the foreign material different from ink or their degradation products in the acid; iii) separating the acid and the therein dissolved ink- and/or foreign material different from ink or their degradation products from the article to obtain a deinked article and/or an article with a surface free from foreign material.

Abstract: A surface of a silicon substrate is coated with a silicon oxide layer. A manganese silicate layer is then deposited on the silicon oxide layer using a process of performing at least one step of dipping the substrate into a manganese amidinate solution. A copper layer is then deposited on the manganese silicate layer using a process of performing a step of dipping the substrate into a copper amidinate solution. An anneal is performed to stabilize one or both of the manganese silicate layer and copper layer.

Abstract: A surface of a silicon substrate is coated with a silicon oxide layer. A manganese silicate layer is then deposited on the silicon oxide layer using a process of performing at least one step of dipping the substrate into a manganese amidinate solution. A copper layer is then deposited on the manganese silicate layer using a process of performing a step of dipping the substrate into a copper amidinate solution. An anneal is performed to stabilize one or both of the manganese silicate layer and copper layer.