Abstract: A gas panel for use with a tool for manufacturing a semiconductor includes a one-piece manifold body having an inlet for receiving a process gas. The manifold body has at least one lateral wall extending in the general direction of gas flow. The lateral wall includes at least one active device site having an active device thereon. The active device is in gas communication with a gas carrying path formed within the one-piece manifold. The active device may be a manual valve, a pneumatic valve, a pressure regulator, a pressure transducer, a purifier, a filter or a flow controller. The gas is received from the active device at a continuation of the gas flow path in the manifold body and is conveyed to a manifold outlet for ultimate to the tool.

Abstract: A gas panel for use with a tool for manufacturing a semiconductor includes a one-piece manifold body having an inlet for receiving a process gas. The manifold body has at least one lateral wall extending in the general direction of gas flow. The lateral wall includes at least one active device site having an active device thereon. The active device is in gas communication with a gas carrying path formed within the one-piece manifold. The active device may be a manual valve, a pneumatic valve, a pressure regulator, a pressure transducer, a purifier, a filter or a flow controller. The gas is received from the active device at a continuation of the gas flow path in the manifold body and is conveyed to a manifold outlet for ultimate to the tool.

Abstract: A manifold system for enabling a distribution of fluids includes a plurality of individual manifold blocks that can be joined together to form a gas stick. Each manifold block will have a fluid passage way with an entrance port and exit port accessing a common surface. An active component can be mounted to one manifold block, while extending across a port of an adjacent manifold block. An alignment system can be provided to ensure that the entrance and exit ports are positioned in a plane containing the common surface to facilitate sealing.

Abstract: A gas panel for use with a tool for manufacturing a semiconductor includes a one-piece manifold body having an inlet for receiving a process gas. The manifold body has at least one lateral wall- extending in the general direction of gas flow. The lateral wall includes at least one active device site having an active device thereon. The active device is in gas communication with a gas carrying path formed within the one-piece manifold. The active device may be a manual valve, a pneumatic valve, a pressure regulator, a pressure transducer, a purifier, a filter or a flow controller. The gas is received from the active device at a continuation of the gas flow path in the manifold body and is conveyed to a manifold outlet for ultimate to the tool.

Abstract: A manifold system for incorporation in a gas panel distribution system for semi-conductor manufacturing includes a plurality of individual manifold blocks with each manifold block having a fluid passageway with an entrance and exit port accessing a common surface. Adjacent manifold blocks are removably interconnected to permit the respective fluid passageways to be in position for interconnection. A plurality of active components can be sealingly fastened to the individual manifold blocks to complete the interconnection of the respective fluid passageways. Each active component can bridge over a pair of adjacent individual manifold blocks and form with the individual manifold blocks an operative gas stick for delivering gas to a semiconductor tool. The individual manifold blocks can be identical in configuration and can include a first upper flange on one side and a second lower flange on an opposite side to enable an interlocking of adjacent manifold blocks.

Abstract: A gas panel for use with a tool for manufacturing a semiconductor includes a one-piece manifold body having an inlet for receiving a process gas. The manifold body has at least one lateral wall extending in the general direction of gas flow. The lateral wall includes at least one active device site having an active device thereon. The active device is in gas communication with a gas carrying path formed within the one-piece manifold. The active device may be a manual valve, a pneumatic valve, a pressure regulator, a pressure transducer, a purifier, a filter or a flow controller. The gas is received from the active device at a continuation of the gas flow path in the manifold body and is conveyed to a manifold outlet for ultimate to the tool.

Abstract: A gas panel for use with a tool for manufacturing a semiconductor includes a one-piece manifold body having an inlet for receiving a process gas. The manifold body has at least one lateral wall extending in the general direction of gas flow. The lateral wall includes at least one active device site having an active device thereon. The active device is in gas communication with a gas carrying path formed within the one-piece manifold. The active device may be a manual valve, a pneumatic valve, a pressure regulator, a pressure transducer, a purifier, a filter or a flow controller. The gas is received from the active device at a continuation of the gas flow path in the manifold body and is conveyed to a manifold outlet for ultimate to the tool.

Abstract: A gas panel for use with a tool for manufacturing a semiconductor includes a one-piece manifold body having an inlet for receiving a process gas. The manifold body has at least one lateral wall extending in the general direction of gas flow. The lateral wall includes at least one active device site having an active device thereon. The active device is in gas communication with a gas carrying path formed within the one-piece manifold. The active device may be a manual valve, a pneumatic valve, a pressure regulator, a pressure transducer, a purifier, a filter or a flow controller. The gas is received from the active device at a continuation of the gas flow path in the manifold body and is conveyed to a manifold outlet for ultimate to the tool.

Abstract: A gas panel for use with a tool for manufacturing a semiconductor includes a one-piece manifold body having an inlet for receiving a process gas. The manifold body has at least one lateral wall extending in the general direction of gas flow. The lateral wall includes at least one active device site having an active device thereon. The active device is in gas communication with a gas carrying path formed within the one-piece manifold. The active device may be a manual valve, a pneumatic valve, a pressure regulator, a pressure transducer, a purifier, a filter or a flow controller. The gas is received from the active device at a continuation of the gas flow path in the manifold body and is conveyed to a manifold outlet for ultimate to the tool.

Abstract: A gas panel for use with a tool for manufacturing a semiconductor includes a one-piece manifold body having an inlet for receiving a process gas. The manifold body has at least one lateral wall extending in the general direction of gas flow. The lateral wall includes at least one active device site having an active device thereon. The active device is in gas communication with a gas carrying path formed within the one-piece manifold. The active device may be a manual valve, a pneumatic valve, a pressure regulator, a pressure transducer, a purifier, a filter or a flow controller. The gas is received from the active device at a continuation of the gas flow path in the manifold body and is conveyed to a manifold outlet for ultimate to the tool.

Abstract: A gas panel for use with a tool for manufacturing a semiconductor includes a one-piece manifold body having an inlet for receiving a process gas. The manifold body has at least one lateral wall extending in the general direction of gas flow. The lateral wall includes at least one active device site having an active device thereon. The active device is in gas communication with a gas carrying path formed within the one-piece manifold. The active device may be a manual valve, a pneumatic valve, a pressure regulator, a pressure transducer, a purifier, a filter or a flow controller. The gas is received from the active device at a continuation of the gas flow path in the manifold body and is conveyed to a manifold outlet for ultimate to the tool.

Abstract: A thermal mass flow controller having a thermal mass flow meter with an orthogonal thermal mass flow sensor includes a base defining a primary fluid flow path therein for carrying a flow of fluid to be metered. A pressure dropping bypass is positioned in the primary fluid flow path. A flow measuring portion of a thermal mass flow sensor is oriented substantially transversely or orthogonally with respect to and is in communication with the primary fluid flow path. The flow measuring portion includes a portion of an electrical bridge for determining a temperature of the sensor and produces a mass flow rate signal in response thereto. A valve is connected to an outlet of the primary flow path to control the flow of fluid in response to the mass flow rate signal.

Abstract: A gas panel for use with a tool for manufacturing a semiconductor includes a one-piece manifold body having an inlet for receiving a process gas. The manifold body has at least one lateral wall extending in the general direction of gas flow. The lateral wall includes at least one active device site having an active device thereon. The active device is in gas communication with a gas carrying path formed within the one-piece manifold. The active device may be a manual valve, a pneumatic valve, a pressure regulator, a pressure transducer, a purifier, a filter or a flow controller. The gas is received from the active device at a continuation of the gas flow path in the manifold body and is conveyed to a manifold outlet for ultimate to the tool.

Abstract: Apparatus for handling process fluid, that is a meter includes a mass flow meter block. A deformable metal seal is positioned between the mass flow meter block and a thermal mass flow sensor in deformable engagement with a pair of edges formed thereon to provide a low contamination, high integrity metal seal.

Abstract: A mass flow controller and purifier has a canister arranged at right angles to a flow path through the mass flow controller. The canister holds a contaminant scavenging material which a gas stream contacts as it flows to remove a contaminant such as water. A purified process gas stream is fed through a bypass of a mass flow meter. A portion of the gas is supplied to a mass flow sensor which generates a signal indicative of a rate of mass flow. The mass flow signal is amplified and the amplified mass flow signal is linearized in a linearizer. The linearized mass flow signal is fed to a comparator which compares the linearized mass flow signal with an error signal and provides an output signal indicative of a mass rate of flow through the mass flow meter. A valve is connected to the mass flow meter and is controlled by the mass flow meter signal to meter the gas.

Abstract: A liquid flow controller for metering a flow of liquid has an inlet to receive the liquid. The inlet feeds the liquid to a high resistance liquid flow path across which a pressure drop arises. A pressure sensor measures the liquid flow induced pressure drop and generates pressure drop signal which is fed to an electronic circuit. A temperature sensor is connected to the high resistance liquid flow path and generates a temperature signal which is also fed to the electronic circuit. The circuit energizes a viscosity-normalized liquid flow signal, which is compared to a set point signal to generate an error signal. A valve connected downstream of the high resistance liquid flow path to control the flow of liquid is driven by the error signal and thereby controls the flow of liquid.