Patents by Inventor Kim Seong SIM

Kim Seong SIM has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240407199
    Abstract: Embodiments of the present disclosure provide methods for forming sub circuits (e.g., sub-pixel circuits). One example sub circuit generally includes a backplane layer disposed over a substrate, a pixel defining layer (PDL) disposed over the backplane layer, the PDL exposing anodes disposed over the backplane layer and the substrate, and a plurality of walls disposed over the PDL, wherein the plurality of walls define a plurality of gaps, wherein the plurality of walls and the plurality of gaps define one or more unit pixels, and wherein the one or more unit pixels each comprise a sub-pixel. Each sub-pixel may include an anode defined by the PDL, an organic light-emitting diode (OLED) material disposed over the anode, and a cathode disposed over the OLED material and the plurality of walls.
    Type: Application
    Filed: May 10, 2024
    Publication date: December 5, 2024
    Inventors: Jong Yun KIM, Ji Young CHOUNG, Kim Seong SIM, Yu-Hsin LIN
  • Patent number: 12014902
    Abstract: Embodiments described herein relate to process systems for cleaning semiconductor process chamber components. The process systems include a process chamber having process chamber components. The process chamber components include a substrate support disposed within a chamber volume of the process chamber. A gas distribution assembly faces the substrate support. A gas baffle is fluidly coupled to the gas distribution assembly. A sensor system is coupled to the process chamber and is configured to monitor at least one characteristic of the volume of the process chamber. A dynamic gas assist is fluidly coupled to the gas baffle and is communicatively coupled to the sensor.
    Type: Grant
    Filed: August 15, 2022
    Date of Patent: June 18, 2024
    Assignee: Applied Materials, Inc.
    Inventors: Jong Yun Kim, Kim Seong Sim, Roman M. Mostovoy, Won Ho Sung, Pei-Chia Chen
  • Publication number: 20240055230
    Abstract: Embodiments described herein relate to process systems for cleaning semiconductor process chamber components. The process systems include a process chamber having process chamber components. The process chamber components include a substrate support disposed within a chamber volume of the process chamber. A gas distribution assembly faces the substrate support. A gas baffle is fluidly coupled to the gas distribution assembly. A sensor system is coupled to the process chamber and is configured to monitor at least one characteristic of the volume of the process chamber. A dynamic gas assist is fluidly coupled to the gas baffle and is communicatively coupled to the sensor.
    Type: Application
    Filed: August 15, 2022
    Publication date: February 15, 2024
    Inventors: Jong Yun KIM, Kim Seong SIM, Roman M. MOSTOVOY, Won Ho SUNG, Pei-Chia CHEN