Patents by Inventor Kimiaki Fujino

Kimiaki Fujino has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of making a substrate having buried structure and method for fabricating a display device including the substrate
    Patent number: 6992008
    Abstract: A method of making a substrate having a buried structure includes the steps of preparing a glass substrate having a principal surface, forming a groove on the principal surface of the glass substrate by a wet etching process, and depositing a first material over the principal surface of the glass substrate and filling the groove with the first material to form the buried structure having a surface that is substantially flush with the principal surface. The step of forming the groove includes the step of performing the wet etching process by using an etchant that includes hydrofluoric acid, ammonium fluoride, and hydrochloric acid or oxalic acid.
    Type: Grant
    Filed: October 1, 2004
    Date of Patent: January 31, 2006
    Assignees: Sharp Kabushiki Kaisha
    Inventors: Kazuki Kobayashi, Kimiaki Fujino, Ikuo Sakono, Tadahiro Ohmi, Shigetoshi Sugawa, Akihiro Morimoto
  • Method of making a substrate having buried structure and method for fabricating a display device including the substrate
    Publication number: 20050040526
    Abstract: A method of making a substrate having a buried structure includes the steps of preparing a glass substrate having a principal surface, forming a groove on the principal surface of the glass substrate by a wet etching process, and depositing a first material over the principal surface of the glass substrate and filling the groove with the first material to form the buried structure having a surface that is substantially flush with the principal surface. The step of forming the groove includes the step of performing the wet etching process by using an etchant that includes hydrofluoric acid, ammonium fluoride, and hydrochloric acid or oxalic acid.
    Type: Application
    Filed: October 1, 2004
    Publication date: February 24, 2005
    Inventors: Kazuki Kobayashi, Kimiaki Fujino, Ikuo Sakono, Tadahiro Ohmi, Shigetoshi Sugawa, Akihiro Morimoto
  • Substrate having buried structure, display device including the substrate, method of making the substrate and method for fabricating the display device
    Patent number: 6815720
    Abstract: A method of making a substrate having a buried structure includes the steps of preparing a glass substrate having a principal surface, forming a groove on the principal surface of the glass substrate by a wet etching process, and depositing a first material over the principal surface of the glass substrate and filling the groove with the first material to form the buried structure having a surface that is substantially flush with the principal surface. The step of forming the groove includes the step of performing the wet etching process by using an etchant that includes hydrofluoric acid, ammonium fluoride, and hydrochloric acid or oxalic acid.
    Type: Grant
    Filed: August 23, 2002
    Date of Patent: November 9, 2004
    Assignees: Sharp Kabushiki Kaisha
    Inventors: Kazuki Kobayashi, Kimiaki Fujino, Ikuo Sakono, Tadahiro Ohmi, Shigetoshi Sugawa, Akihiro Morimoto
  • Substrate having buried structure, display device including the substrate, method of making the substrate and method for fabricating the display device
    Publication number: 20030038903
    Abstract: A method of making a substrate having a buried structure includes the steps of preparing a glass substrate having a principal surface, forming a groove on the principal surface of the glass substrate by a wet etching process, and depositing a first material over the principal surface of the glass substrate and filling the groove with the first material to form the buried structure having a surface that is substantially flush with the principal surface. The step of forming the groove includes the step of performing the wet etching process by using an etchant that includes hydrofluoric acid, ammonium fluoride, and hydrochloric acid or oxalic acid.
    Type: Application
    Filed: August 23, 2002
    Publication date: February 27, 2003
    Inventors: Kazuki Kobayashi, Kimiaki Fujino, Ikuo Sakono, Tadahiro Ohmi, Shigetoshi Sugawa, Akihiro Morimoto