Patents by Inventor Kimiaki Kabuki
Kimiaki Kabuki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 6136766Abstract: A cleaning composition comprising at least one low molecular weight polyorganosiloxane selected from the group consisting of straight chain polydiorganosiloxane represented by a general formula: ##STR1## (wherein R.sup.1 is an organic group of single valence substituted by the same or different group or unsubstituted, and l is an integer from 0 to 5), and cyclic polydiorganosiloxane represented by a general formula: ##STR2## (wherein R.sup.1 is an organic group of single valence substituted by the same or different group or unsubstituted, and m is an integer from 3 to 7). To use it as a water system cleaning agent, polyoxyalkylene group containing polyorganosiloxane, a surfactant, and water are additionally mixed. Accordingly, a cleaning effect free from environmental destruction and contamination, equivalent to flon containing cleaning agents, and satisfactorily stable in terms of dispersion as a water system cleaning agent can be obtained.Type: GrantFiled: June 7, 1995Date of Patent: October 24, 2000Assignee: Toshiba Silicone Co., Ltd.Inventors: Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Takayuki Oguni, Noriaki Yagi, Nobuhiro Saitoh, Akitsugu Kurita, Yoshiaki Takezawa
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Patent number: 5985810Abstract: A cleaning composition comprising at least one low molecular weight polyorganosiloxane selected from the group consisting of straight chain polydiorganosiloxane represented by a general formula: ##STR1## (wherein R.sup.1 is an organic group of single valence substituted by the same or different group or unsubstituted, and l is an integer from 0 to 5), and cyclic polydiorganosiloxane represented by a general formula: ##STR2## (wherein R.sup.1 is an organic group of single valence substituted by the same or different group or unsubstituted, and m is an integer from 3 to 7). To use it as a water system cleaning agent, polyoxyalkylene group containing polyorganosiloxane, a surfactant, and water are additionally mixed. Accordingly, a cleaning effect free from environmental destruction and contamination, equivalent to flon containing cleaning agents, and satisfactorily stable in terms of dispersion as a water system cleaning agent can be obtained.Type: GrantFiled: June 7, 1995Date of Patent: November 16, 1999Assignee: Toshiba Silicone Co., Ltd.Inventors: Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Takayuki Oguni, Noriaki Yagi, Nobuhiro Saitoh, Akitsugu Kurita, Yoshiaki Takezawa
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Patent number: 5977040Abstract: A cleaning composition comprising at least one low molecular weight polyorganosiloxane selected from the group consisting of straight chain polydiorganosiloxane represented by a general formula: ##STR1## (wherein R.sup.1 is an organic group of single valence substituted by the same or different group or unsubstituted, and 1 is an integer from 0 to 5), and cyclic polydiorganosiloxane represented by a general formula: ##STR2## (wherein R.sup.1 is an organic group of single valence substituted by the same or different group or unsubstituted, and m is an integer from 3 to 7). To use it as a water system cleaning agent, polyoxyalkylene group containing polyorganosiloxane, a surfactant, and water are additionally mixed. Accordingly, a cleaning effect free from environmental destruction and contamination, equivalent to flon containing cleaning agents, and satisfactorily stable in terms of dispersion as a water system cleaning agent can be obtained.Type: GrantFiled: June 7, 1995Date of Patent: November 2, 1999Assignee: Toshiba Silicone Co., Ltd.Inventors: Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Takayuki Oguni, Noriaki Yagi, Nobuhiro Saitoh, Akitsugu Kurita, Yoshiaki Takezawa
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Patent number: 5888312Abstract: An object to be cleaned is cleaned with an cleaning agent which mixes a base cleaning agent such as silicon-containing cleaning agent or an isoparaffin containing cleaning agent with a surfactant or a hydrophilic solvent to promote the cleaning power. The object is rinsed with the base cleaning agent alone after it goes through the first cleaning step as described above. Then, this is followed by the finishing treatment by the use of hot air or steam drying. The base cleaning agents can be recovered and recycled, improving economy in the case with the use of two or more cleaning agents in combination. The excellent properties of degreasing and dewatering, comparable to those of flon system, can be obtained using a mixture of silicon-containing or isoparaffin-containing cleaning agents with surfactants and hydrophilic solvents and maintaining safety in environment.Type: GrantFiled: June 7, 1995Date of Patent: March 30, 1999Assignee: Toshiba Silicone Co., Ltd.Inventors: Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Noriaki Yagi, Nobuhiro Saitoh
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Patent number: 5833761Abstract: An object to be cleaned is cleaned with an cleaning agent which mixes a base cleaning agent such as silicon-containing cleaning agent or an isoparaffin containing cleaning agent with a surfactant or a hydrophilic solvent to promote the cleaning power. The object is rinsed with the base cleaning agent alone after it goes through the first cleaning step as described above. Then, this is followed by the finishing treatment by the use of hot air or steam drying. The base cleaning agents can be recovered and recycled, improving economy in the case with the use of two or more cleaning agents in combination. The excellent properties of degreasing and dewatering, comparable to those of flon system, can be obtained using a mixture of silicon-containing or isoparaffin-containing cleaning agents with surfactants and hydrophilic solvents and maintaining safety in environment.Type: GrantFiled: June 7, 1995Date of Patent: November 10, 1998Assignee: Toshiba Silicone Co., Ltd.Inventors: Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Noriaki Yagi, Nobuhiro Saitoh
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Patent number: 5782983Abstract: A part still wet with water or an aqueous type detergent adhering to the surface thereof is drain washed in a washing tank using a hydrophobic dewatering cleaning agent. In this operation of dewatering cleaning, the hydrophobic dewatering cleaning agent stored in the washing tank is circulated between the washing tank and a reserve tank to deprive the hydrophobic dewatering cleaning agent of water entrained thereby by means of a concentration type filter inserted in a path laid for the circulation. A hydrophobic filter is mainly used as the concentration type filter. The dewatering cleaning is continued and meanwhile the consequently isolated hydrophobic dewatering cleaning agent is exclusively returned to the washing tank. As a result, the water concentration in the hydrophobic dewatering cleaning agent stored in the washing tank can be constantly kept below a prescribed level.Type: GrantFiled: April 19, 1994Date of Patent: July 21, 1998Assignees: Kabushiki Kaisha Toshiba, Toshiba Silicone Co., Ltd.Inventors: Minoru Inada, Yasutaka Imajo, Kimiaki Kabuki, Nobuhiro Saitoh
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Patent number: 5772781Abstract: An object to be cleaned is cleaned with an cleaning agent which mixes a base cleaning agent such as silicon-containing cleaning agent or an isoparaffin containing cleaning agent with a surfactant or a hydrophilic solvent to promote the cleaning power. The object is rinsed with the base cleaning agent alone after it goes through the first cleaning step as described above. Then, this is followed by the finishing treatment by the use of hot air or steam drying. The base cleaning agents can be recovered and recycled, improving economy in the case with the use of two or more cleaning agents in combination. The excellent properties of degreasing and dewatering, comparable to those of flon system, can be obtained using a mixture of silicon-containing or isoparaffin-containing cleaning agents with surfactants and hydrophilic solvents and maintaining safety in environment.Type: GrantFiled: June 7, 1995Date of Patent: June 30, 1998Assignee: Kabushiki Kaisha ToshibaInventors: Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Noriaki Yagi, Nobuhiro Saitoh
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Patent number: 5769962Abstract: An object to be cleaned is cleaned with an cleaning agent which mixes a base cleaning agent such as silicon-containing cleaning agent or an isoparaffin containing cleaning agent with a surfactant or a hydrophilic solvent to promote the cleaning power. The object is rinsed with the base cleaning agent alone after it goes through the first cleaning step as described above. Then, this is followed by the finishing treatment by the use of hot air or steam drying. The base cleaning agents can be recovered and recycled, improving economy in the case with the use of two or more cleaning agents in combination. The excellent properties of degreasing and dewatering, comparable to those of flon system, can be obtained using a mixture of silicon-containing or isoparaffin-containing cleaning agents with surfactants and hydrophilic solvents and maintaining safety in environment.Type: GrantFiled: June 7, 1995Date of Patent: June 23, 1998Assignee: Kabushiki Kaisha ToshibaInventors: Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Noriaki Yagi, Nobuhiro Saitoh
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Patent number: 5741367Abstract: A method for drying parts that includes contacting the part with a liquid removing composition that contains a straight chain or cyclic polyorganosiloxane.Type: GrantFiled: June 7, 1995Date of Patent: April 21, 1998Assignee: Kabushiki Kaisha ToshibaInventors: Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Takayuki Oguni, Noriaki Yagi, Nobuhiro Saitoh, Akitsugu Kurita, Yoshiaki Takezawa
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Patent number: 5741365Abstract: A continuous method for cleaning and/or removing liquid from industrial parts that includes contacting the part with a cleaning or rinsing composition that contains a straight chain or cyclic polyorganosiloxane.Type: GrantFiled: May 5, 1995Date of Patent: April 21, 1998Assignee: Kabushiki Kaisha ToshibaInventors: Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Takayuki Oguni, Noriaki Yagi, Nobuhiro Saitoh, Akitsugu Kurita, Yoshiaki Takezawa
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Patent number: 5728228Abstract: A method for removing liquid from parts that includes contacting the part with a cleaning or rinsing composition that contains a straight chain or cyclic polyorganosiloxane.Type: GrantFiled: May 5, 1995Date of Patent: March 17, 1998Assignee: Kabushiki Kaisha ToshibaInventors: Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Takayuki Oguni, Noriaki Yagi, Nobuhiro Saitoh, Akitsugu Kurita, Yoshiaki Takezawa
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Patent number: 5716456Abstract: A method for cleaning an industrial object by use of an aqueous agent that includes a polyorganosiloxane. The method uses a plurality of vessels and the agent is recovered and resupplied to the method.Type: GrantFiled: June 7, 1995Date of Patent: February 10, 1998Assignee: Kabushiki Kaisha ToshibaInventors: Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Takayuki Oguni, Noriaki Yagi, Nobuhiro Saitoh, Akitsugu Kurita, Yoshiaki Takezawa
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Patent number: 5538024Abstract: An object to be cleaned is cleaned with an cleaning agent which mixes a base cleaning agent such as silicon-containing cleaning agent or an isoparaffin containing cleaning agent with a surfactant or a hydrophilic solvent to promote the cleaning power. The object is rinsed with the base cleaning agent alone after it goes through the first cleaning step as described above. Then, this is followed by the finishing treatment by the use of hot air or steam drying. The base cleaning agents can be recovered and recycled, improving economy in the case with the use of two or more cleaning agents in combination. The excellent properties of degreasing and dewatering, comparable to those of flon system, can be obtained using a mixture of silicon-containing or isoparaffin-containing cleaning agents with surfactants and hydrophilic solvents and maintaining safety in environment.Type: GrantFiled: June 7, 1995Date of Patent: July 23, 1996Assignees: Kabushiki Kaisha Toshiba, Japan Field Company, Ltd.Inventors: Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Noriaki Yagi, Nobuhiro Saitoh
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Patent number: 5503681Abstract: An object to be cleaned is cleaned with an cleaning agent which mixes a base cleaning agent such as silicon-containing cleaning agent or an isoparaffin containing cleaning agent with a surfactant or a hydrophilic solvent to promote the cleaning power. The object is rinsed with the base cleaning agent alone after it goes through the first cleaning step as described above. Then, this is followed by the finishing treatment by the use of hot air or steam drying. The base cleaning agents can be recovered and recycled, improving economy in the case with the use of two or more cleaning agents in combination. The excellent properties of degreasing and dewatering, comparable to those of flon system, can be obtained using a mixture of silicon-containing or isoparaffin-containing cleaning agents with surfactants and hydrophilic solvents and maintaining safety in environment.Type: GrantFiled: January 4, 1994Date of Patent: April 2, 1996Assignees: Kabushiki Kaisha Toshiba, Japan Field Company, Ltd.Inventors: Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Noriaki Yagi, Nobuhiro Saitoh
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Patent number: 5443747Abstract: A cleaning composition comprising at least one low molecular weight polyorganosiloxane selected from the group consisting of straight chain polydiorganosiloxane represented by a general formula: ##STR1## (wherein R.sup.1 is an organic group of single valence substituted by the same or different group or unsubstituted, and 1 is an integer from 0 to 5), and cyclic polydiorganosiloxane represented by a general formula: ##STR2## (wherein R.sup.1 is an organic group of single valence substituted by the same or different group or unsubstituted, and m is an integer from 3 to 7). To use it as a water system cleaning agent, polyoxyalkylene group containing polyorganosiloxane, a surfactant, and water are additionally mixed. Accordingly, a cleaning effect free from environmental destruction and contamination, equivalent to flon containing cleaning agents, and satisfactorily stable in terms of dispersion as a water system cleaning agent can be obtained.Type: GrantFiled: February 28, 1991Date of Patent: August 22, 1995Assignee: Kabushiki Kaisha ToshibaInventors: Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Takayuki Oguni, Noriaki Yagi, Nobuhiro Saitoh, Akitsugu Kurita, Yoshiaki Takezawa