Patents by Inventor Kimihiro Kamasaka

Kimihiro Kamasaka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Acryloyl materials for molded plastics
    Patent number: 8569538
    Abstract: In one aspect, the invention relates to methods of synthesizing acryloyl compounds, comprising the step of hydrosilylating a compound having the structure: with a compound having the structure A-H, wherein A comprises a siloxanyl group, to yield a compound having the structure: Compounds and compositions produced thereby can effectively attain a satisfactory balance between high oxygen permeability and hydrophilicity while achieving an acceptably low concentration of undesirable impurities. This abstract is intended as a scanning tool for purposes of searching in the particular art and is not intended to be limiting of the present invention.
    Type: Grant
    Filed: December 12, 2006
    Date of Patent: October 29, 2013
    Assignees: Johnson & Johnson Vision Care, Inc., Toray Industries, Inc.
    Inventors: Masataka Nakamura, Mitsuru Yokota, Takehiro Kohara, Kimihiro Kamasaka, Hiroya Koyama, Shinya Kiguchi, Satoshi Umeda
  • Process for producing a concentrated solution for a photoresist-stripping liquid having low water content
    Patent number: 8299303
    Abstract: There is provided a process for producing a concentrated solution of quaternary ammonium hydroxide which is characterized in that quaternary ammonium hydroxide in a form of water-containing crystals or of an aqueous solution is mixed with a water-soluble organic solvent selected from the group consisting of glycol ether, glycol and triol and the resulting mixed solution is subjected to a thin-film distillation in vacuo so as to evaporate the low boiling material. In accordance with this process, a concentrated solution of quaternary ammonium hydroxide having low water content is able to be easily produced.
    Type: Grant
    Filed: August 27, 2009
    Date of Patent: October 30, 2012
    Assignee: KNC Laboratories Co., Ltd.
    Inventors: Katsutoshi Hirose, Hiroya Koyama, Kimihiro Kamasaka, Taro Sasabe, Naoshi Kai
  • PROCESS FOR PRODUCING A CONCENTRATED SOLUTION FOR A PHOTORESIST-STRIPPING LIQUID HAVING LOW WATER CONTENT
    Publication number: 20100298605
    Abstract: There is provided a process for producing a concentrated solution of quaternary ammonium hydroxide which is characterized in that quaternary ammonium hydroxide in a form of water-containing crystals or of an aqueous solution is mixed with a water-soluble organic solvent selected from the group consisting of glycol ether, glycol and triol and the resulting mixed solution is subjected to a thin-film distillation in vacuo so as to evaporate the low boiling material. In accordance with this process, a concentrated solution of quaternary ammonium hydroxide having low water content is able to be easily produced.
    Type: Application
    Filed: August 27, 2009
    Publication date: November 25, 2010
    Inventors: Katsutoshi Hirose, Hiroya Koyama, Kimihiro Kamasaka, Taro Sasabe, Naoshi Kai
  • ACRYLOYL MATERIALS FOR MOLDED PLASTICS
    Publication number: 20080004383
    Abstract: In one aspect, the invention relates to methods of synthesizing acryloyl compounds, comprising the step of hydrosilylating a compound having the structure: with a compound having the structure A-H, wherein A comprises a siloxanyl group, to yield a compound having the structure: Compounds and compositions produced thereby can effectively attain a satisfactory balance between high oxygen permeability and hydrophilicity while achieving an acceptably low concentration of undesirable impurities. This abstract is intended as a scanning tool for purposes of searching in the particular art and is not intended to be limiting of the present invention.
    Type: Application
    Filed: December 12, 2006
    Publication date: January 3, 2008
    Inventors: Masataka Nakamura, Mitsuru Yokota, Takehiro Kohara, Kimihiro Kamasaka, Hiroya Koyama, Shinya Kiguchi, Satoshi Umeda