Patents by Inventor Kimiko Childress

Kimiko Childress has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10823753
    Abstract: An air data probe includes a probe head, a port within the probe head in fluid communication with external airflow, and a pneumatic pressure sensor mounted within the port.
    Type: Grant
    Filed: December 14, 2018
    Date of Patent: November 3, 2020
    Assignee: Rosemount Aerospace Inc.
    Inventors: Greg Allen Seidel, Mark Sherwood Miller, Kimiko Childress, Michael Paul Nesnidal
  • Publication number: 20200191823
    Abstract: An air data probe includes a probe head, a port within the probe head in fluid communication with external airflow, and a pneumatic pressure sensor mounted within the port.
    Type: Application
    Filed: December 14, 2018
    Publication date: June 18, 2020
    Inventors: Greg Allen Seidel, Mark Sherwood Miller, Kimiko Childress, Michael Paul Nesnidal
  • Patent number: 9835511
    Abstract: A method for forming a pressure sensor includes forming a base of a sapphire material, the base including a cavity formed therein; forming a sapphire membrane on top of the base and over the cavity; forming a lower electrode on top of the membrane; forming a piezoelectric material layer on an upper surface of the lower electrode, the piezoelectric material layer being formed of aluminum nitride (AIN); and forming at least one upper electrode on an upper surface of the piezoelectric material layer.
    Type: Grant
    Filed: May 8, 2015
    Date of Patent: December 5, 2017
    Assignee: ROSEMOUNT AEROSPACE INC.
    Inventors: Weibin Zhang, Anita Fink, Kimiko Childress, Odd Harald Steen Eriksen
  • Publication number: 20160327445
    Abstract: A method for forming a pressure sensor includes forming a base of a sapphire material, the base including a cavity formed therein; forming a sapphire membrane on top of the base and over the cavity; forming a lower electrode on top of the membrane; forming a piezoelectric material layer on an upper surface of the lower electrode, the piezoelectric material layer being formed of aluminum nitride (AIN); and forming at least one upper electrode on an upper surface of the piezoelectric material layer.
    Type: Application
    Filed: May 8, 2015
    Publication date: November 10, 2016
    Inventors: Weibin Zhang, Anita Fink, Kimiko Childress, Odd Harald Steen Eriksen
  • Patent number: 7628309
    Abstract: A method for bonding two components together including the steps of providing a first component, providing a second component, and locating a first eutectic bonding material between the first and second component. The first eutectic bonding material includes at least one of germanium, tin, or silicon. The method further includes the step of locating a second eutectic bonding material between the first and second component and adjacent to the first eutectic bonding material. The second eutectic bonding material includes gold. The method further includes the step of heating the first and second eutectic bonding materials to a temperature above a eutectic temperature of an alloy of the first and second eutectic bonding materials to allow a hypoeutectic alloy to form out of the first and second eutectic bonding materials. The method includes the further step of cooling the hypoeutectic alloy to form a solid solution alloy bonding the first and second components together.
    Type: Grant
    Filed: May 3, 2005
    Date of Patent: December 8, 2009
    Assignee: Rosemount Aerospace Inc.
    Inventors: Odd Harald Steen Eriksen, Shuwen Guo, Kimiko Childress
  • Publication number: 20060249847
    Abstract: A metallization layer that includes a tantalum layer located on the component, a tantalum silicide layer located on the tantalum layer, and a platinum silicide layer located on the tantalum silicide layer. In another embodiment the invention is a component having a metallization layer on the component. In another embodiment, the metallization layer has a post-annealing adhesive strength to silicon of at least about 100 MPa as measured by a mechanical shear test after exposure to a temperature of about 600° C. for about 30 minutes, and the metallization layer remains structurally intact after exposure to a temperature of about 600° C. for about 1000 hours. The metallization is useful for bonding with brazing alloys.
    Type: Application
    Filed: May 3, 2005
    Publication date: November 9, 2006
    Inventors: Odd Eriksen, Kimiko Childress