Abstract: The present invention relates to a thin film deposition apparatus, which includes: a deposition chamber supporting a substrate therein; a plurality of crucibles keeping a deposition material to be deposited on the substrate; a distribution conduit having a plurality of coupling holes axially arranged to communicate with the crucibles, and spraying the deposition material evaporated from the crucibles through a plurality of nozzles formed through a top thereof; distribution conduit heaters independently installed and facing an outer side of the distribution conduit to heat the distribution conduit; crucible heaters heating the crucibles to evaporate the deposition material; and a top plate having an exit port corresponding to the nozzles and disposed over the distribution conduit. Accordingly, it is possible to reduce the height of the chamber by decreasing the height of the crucibles and to perform symmetric or asymmetric deposition by independently performing left/right deposition on a substrate.