Patents by Inventor Kimio Kogure

Kimio Kogure has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Substrate processing apparatus, and substrate processing method
    Patent number: 9099513
    Abstract: A substrate processing apparatus includes a tray, a mask and a rotary stage. The tray includes a substrate support configured to support an outer edge portion of a substrate, a mask support provided on an outer periphery side of the substrate support and projected above the substrate support, and a recess provided between the substrate support and the mask support. The mask covers the recess and the substrate support of the tray. The rotary stage includes an electrostatic adsorption surface and a tray mounting portion provided on an outer periphery side of the electrostatic adsorption surface and below the electrostatic adsorption surface. The outer edge portion of the substrate is projected toward the tray mounting portion side from the electrostatic adsorption surface. The substrate support is spaced below the outer edge portion of the substrate. The mask is spaced above the outer edge portion of the substrate.
    Type: Grant
    Filed: September 1, 2009
    Date of Patent: August 4, 2015
    Assignee: SHIBAURA MECHATRONICS CORPORATION
    Inventor: Kimio Kogure
  • SUBSTRATE HOLDING MEMBER, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCESSING METHOD
    Publication number: 20110159200
    Abstract: A substrate processing apparatus includes a tray, a mask and a rotary stage. The tray includes a substrate support configured to support an outer edge portion of a substrate, a mask support provided on an outer periphery side of the substrate support and projected above the substrate support, and a recess provided between the substrate support and the mask support. The mask covers the recess and the substrate support of the tray. The rotary stage includes an electrostatic adsorption surface and a tray mounting portion provided on an outer periphery side of the electrostatic adsorption surface and below the electrostatic adsorption surface. The outer edge portion of the substrate is projected toward the tray mounting portion side from the electrostatic adsorption surface. The substrate support is spaced below the outer edge portion of the substrate. The mask is spaced above the outer edge portion of the substrate.
    Type: Application
    Filed: September 1, 2009
    Publication date: June 30, 2011
    Applicant: SHIBAURA MECHATRONICS COPORATION
    Inventor: Kimio Kogure
  • Robot apparatus and treating apparatus
    Patent number: 6045315
    Abstract: A robot apparatus has a rotatable arm member. A stationary pulley is arranged in the center of the arm member, while a pair of rotatable pulleys are arranged at the respective ends of the arm member. A pair of fingers, used for conveying a work, are attached to the respective rotatable pulleys. A driving force transmission member is engaged with the stationary pulley and the rotatable pulleys. When the arm member is rotated, the driving force transmitting means rotates the rotatable pulleys in accordance with the outer diameter ratio of the stationary pulley to the rotatable pulleys.
    Type: Grant
    Filed: August 20, 1998
    Date of Patent: April 4, 2000
    Assignees: Shibaura Engineering Works Co., Ltd., Kabushiki Kaisha Toshiba
    Inventors: Hidehito Azumano, Atsushi Kinase, Kimio Kogure, Hisataka Komatsu