Patents by Inventor Kimio Nagasaka

Kimio Nagasaka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6645793
    Abstract: Provided is a manufacturing method and manufacturing device of a microstructure capable of forming resin patterns on a substrate without any “offset portion”. A substrate 50 and a stamper 30 to which a concave/convex pattern is formed are aligned so as to be flush; resin 60 is infiltrated from one end side of the stamper 30 to the aligned face of the substrate 50 and stamper 30, and the resin 60 is drawn into the concave/convex pattern of the stamper 30 by setting the barometric pressure of the other end side of the stamper 30 to be relatively lower than the one end side of the stamper 30; resin 60 that spread in the concave/convex pattern of the stamper 30 is cured; and a resin 60 pattern transferred from the stamper 30 is obtained on the substrate 50 by separating the substrate 50 and stamper 30.
    Type: Grant
    Filed: September 19, 2001
    Date of Patent: November 11, 2003
    Assignee: Seiko Epson Corporation
    Inventors: Eiichi Fujii, Kimio Nagasaka
  • Publication number: 20030205564
    Abstract: In a laser processing apparatus including an ultra-short pulse laser a focusing optical system and processing a work by projecting a beam delivered through the focusing optical system on to the work, the focusing optical system has at least a pair of diffractive surface and a refractive surface, and chromatic aberration is corrected or chromatic aberration and pulse extension are corrected by making use of the diffractive dispersions due to and the diffractive surface the refractive dispersion due to of the refractive surface. With this arrangement, chromatic aberration is corrected or both chromatic aberration and pulse expansion are corrected in the processing with the ultra-short pulse laser and thereby improve the practical use and value of the processing by improving its accuray, qualiy and speed.
    Type: Application
    Filed: June 4, 2003
    Publication date: November 6, 2003
    Applicant: Seiko Epson Corporation
    Inventors: Jun Amako, Kazuhiro Nishida, Kimio Nagasaka
  • Patent number: 6643067
    Abstract: An electro-optical device which includes a plurality of point light sources, a micro-lens array in which a plurality of micro-lenses are disposed, and a light modulation device including a plurality of light-transmissive windows. The electro-optical device is constructed so that, by the micro-lens array, light from the plurality of point light sources is focused at the light-transmissive windows.
    Type: Grant
    Filed: November 15, 2001
    Date of Patent: November 4, 2003
    Assignee: Seiko Epson Corporation
    Inventors: Akira Miyamae, Kimio Nagasaka, Osamu Okumura
  • Patent number: 6642480
    Abstract: In a laser processing apparatus including an ultra-short pulse laser a focusing optical system and processing a work by projecting a beam delivered through the focusing optical system on to the work, the focusing optical system has at least a pair of diffractive surface and a refractive surface, and chromatic aberration is corrected or chromatic aberration and pulse extension are corrected by making use of the diffractive dispersions due to and the diffractive surface the refractive dispersion due to of the refractive surface. With this arrangement, chromatic aberration is corrected or both chromatic aberration and pulse expansion are corrected in the processing with the ultra-short pulse laser and thereby improve the practical use and value of the processing by improving its accuray, qualiy and speed.
    Type: Grant
    Filed: September 6, 2002
    Date of Patent: November 4, 2003
    Assignee: Seiko Epson Corporation
    Inventors: Jun Amako, Kazuhiro Nishida, Kimio Nagasaka
  • Publication number: 20030096176
    Abstract: Provided is a photomask enabling accurate tone representation. This photomask has a transparent substrate (42), and a phase grating structured from a plurality of grooves of a fixed pitch (P) formed on said substrate, wherein at least either the depth or width of the respective grooves of the phase grating is made to bear the exposure pattern. And, when the wavelength of the exposed light of the aligner employing the photomask is set to &lgr;, and the incident side numerical aperture of the imaging system lens is set to NAi, P<&lgr;/NAi. Thereby, the grating will no longer be imaged, and the exposure pattern represented with the depth or width of the respective grooves of the phase grating will be transcribed on to a light sensitive material.
    Type: Application
    Filed: September 30, 2002
    Publication date: May 22, 2003
    Inventors: Akira Miyamae, Kimio Nagasaka
  • Publication number: 20030052102
    Abstract: In a laser processing apparatus including an ultra-short pulse laser a focusing optical system and processing a work by projecting a beam delivered through the focusing optical system on to the work, the focusing optical system has at least a pair of diffractive surface and a refractive surface, and chromatic aberration is corrected or chromatic aberration and pulse extension are corrected by making use of the diffractive dispersions due to and the diffractive surface the refractive dispersion due to of the refractive surface. With this arrangement, chromatic aberration is corrected or both chromatic aberration and pulse expansion are corrected in the processing with the ultra-short pulse laser and thereby improve the practical use and value of the processing by improving its accuray, qualiy and speed.
    Type: Application
    Filed: September 6, 2002
    Publication date: March 20, 2003
    Applicant: Seiko Epson Corporation
    Inventors: Jun Amako, Kazuhiro Nishida, Kimio Nagasaka
  • Publication number: 20030020800
    Abstract: The present invention provides a pattern drawing device that enables drawing with reduced operational processing loading of the associated CPU. Thus, in a pattern drawing device for forming a plurality of tracks disposed concentrically on a substrate to produce a two-dimensional pattern, a basic pixel sequence is prepared and used repeatedly in forward (positive) and/or reverse (negative) order to produce symmetric portions of the two-dimensional pattern.
    Type: Application
    Filed: July 17, 2002
    Publication date: January 30, 2003
    Inventors: Kimio Nagasaka, Akira Miyamae, Eiichi Fujii
  • Patent number: 6512535
    Abstract: An object of the present invention is to provide a laser drawing apparatus wherewith it is possible to draw fine patterns at high speed with uniform fineness. In order to achieve that object, in the present invention, drawing is performed at high speed by moving a laser spot in the radial direction while turning a blank disk coated with a photosensitive material mounted on a turntable. A discretionary pattern 203 within a fan-shaped area having the turning center 201 of the blank disk as its center is divided into dots of the same size such as the small areas 209, pattern drawing is performed using such dots as units to be drawn by the laser spot, and the fineness of the pattern shape is enhanced.
    Type: Grant
    Filed: April 6, 2000
    Date of Patent: January 28, 2003
    Assignee: Seiko Epson Corporation
    Inventors: Kimio Nagasaka, Akira Miyamae
  • Patent number: 6490239
    Abstract: An optical disc has the effect of indicating characters and pictures formed thereon by making use of a diffraction phenomenon in areas formed with many pits. The value of the pit interval is selected to provide an improved optical disc capable of clearly indicating the characters and pictures. A relationship between pit interval and the light intensity of a diffracted light is calculated. In accordance with this calculation, the pit interval is set to be within a range from 570 nm to 1000 nm, thereby increasing the light intensity of the diffracted light, thus making it possible to clearly indicate characters and pictures.
    Type: Grant
    Filed: October 18, 2000
    Date of Patent: December 3, 2002
    Assignee: Seiko Epson Corporation
    Inventor: Kimio Nagasaka
  • Publication number: 20020135847
    Abstract: The present invention provides a manufacturing method capable of obtaining minute structures. In order to achieve this, as shown in FIG. 1, a process target material (108) is exposed and the shape thereof is changed by relatively shifting a laser beam or electronic beam (101) against such process target material (108) and simultaneously repeating irradiation in an intermittent manner. Here, a plurality of minute convex or concave shapes are formed on the process target material (108) by employing a branching element (103) for branching a single beam (108) into a plurality of beams (106, 107); a parallel element (104) for converting said plurality of beams into beams which respectively advance in parallel; and a condensing element (105) for condensing the plurality of beams to the process target material (108) and generating a plurality of minute spots thereon.
    Type: Application
    Filed: March 14, 2002
    Publication date: September 26, 2002
    Applicant: Seiko Epson Corporation
    Inventors: Kimio Nagasaka, Akira Miyamae, Hiroyasu Kaseya
  • Publication number: 20020093743
    Abstract: An electro-optical device includes: a dot-like light source array in which a plurality of light-emitting elements for emitting red light, a plurality of light-emitting elements for emitting green light, and a plurality of light-emitting elements for emitting blue light are arranged; a microlens array in which a plurality of microlenses are arranged; and an optical modulation panel having a plurality of pixels for red light, a plurality of pixels for green light, a plurality of pixels for blue light, and a plurality of transmissive windows corresponding to the pixels.
    Type: Application
    Filed: December 11, 2001
    Publication date: July 18, 2002
    Applicant: Seiko Epson Corporation
    Inventors: Akira Miyamae, Kimio Nagasaka
  • Publication number: 20020093742
    Abstract: An electro-optical device which includes a plurality of point light sources, a micro-lens array in which a plurality of micro-lenses are disposed, and a light modulation device including a plurality of light-transmissive windows. The electro-optical device is constructed so that, by the micro-lens array, light from the plurality of point light sources is focused at the light-transmissive windows.
    Type: Application
    Filed: November 15, 2001
    Publication date: July 18, 2002
    Applicant: SEIKO EPSON CORPORATION.
    Inventors: Akira Miyamae, Kimio Nagasaka, Osamu Okumura
  • Publication number: 20020048833
    Abstract: Provided is a manufacturing method and manufacturing device of a microstructure capable of forming resin patterns on a substrate without any “offset portion”. A substrate 50 and a stamper 30 to which a concave/convex pattern is formed are aligned so as to be flush; resin 60 is infiltrated from one end side of the stamper 30 to the aligned face of the substrate 50 and stamper 30, and the resin 60 is drawn into the concave/convex pattern of the stamper 30 by setting the barometric pressure of the other end side of the stamper 30 to be relatively lower than the one end side of the stamper 30; resin 60 that spread in the concave/convex pattern of the stamper 30 is cured; and a resin 60 pattern transferred from the stamper 30 is obtained on the substrate 50 by separating the substrate 50 and stamper 30.
    Type: Application
    Filed: September 19, 2001
    Publication date: April 25, 2002
    Inventors: Eiichi Fujii, Kimio Nagasaka
  • Patent number: 6224959
    Abstract: Prepits in a sector header area are arranged on center lines of groove tracks or land tracks, and header signals are played back in a drive by using sum signals of split sensors, thereby providing resistance to disc tilt or track offset and improving margins.
    Type: Grant
    Filed: September 14, 1999
    Date of Patent: May 1, 2001
    Assignee: Seiko Epson Corporation
    Inventors: Kimio Nagasaka, Akira Miyamae