Patents by Inventor Kimiyuki KANNO

Kimiyuki KANNO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220043346
    Abstract: An object of the present invention is to provide a photosensitive resin composition that can form an insulating film having low dielectric constant and low dielectric loss tangent and undergoing small changes in elongation properties in response to changes in environmental temperature. The photosensitive resin composition of the present invention contains: a polymer (A) having a structural unit (a1) represented by Formula (a1); a crosslinking agent (B); a photocation generator (C); and a compound (D) represented by Formula (D).
    Type: Application
    Filed: October 21, 2021
    Publication date: February 10, 2022
    Applicant: JSR CORPORATION
    Inventors: Kimiyuki KANNO, Ryouta TSUYUKI, Ryoji TATARA
  • Publication number: 20220043345
    Abstract: An object of the present invention is to provide a photosensitive resin composition that can form an insulating film having low dielectric constant and low dielectric loss tangent and undergoing small changes in elongation properties in response to changes in environmental temperature. The photosensitive resin composition of the present invention contains: a polymer (A) having a structural unit (a1) represented by Formula (a1); a crosslinking agent (B); and a photocation generator (C). [R1 is an unsubstituted or substituted nitrogen-containing heteroaromatic ring or an unsubstituted or substituted aromatic hydrocarbon ring; R2 and R3 are each independently an unsubstituted or substituted aromatic hydrocarbon ring; R4 is an unsubstituted or substituted alkyl group having 2 to 20 carbon atoms; R5 is an unsubstituted or substituted alkyl group having 1 to 20 carbon atoms; and X's are each independently an oxygen atom, a sulfur atom, an ester bond, an amide bond, or —SO2—.
    Type: Application
    Filed: October 21, 2021
    Publication date: February 10, 2022
    Applicant: JSR CORPORATION
    Inventors: Ryouta TSUYUKI, Kimiyuki KANNO, Toshiaki KADOTA, Ryoji TATARA
  • Publication number: 20210286262
    Abstract: A photosensitive resin composition contains: a polymer (A) having a terminal group represented by Formula (a1) and a repeating structural unit represented by Formula (a2); a crosslinking agent (B); and a photocation generator (C). Y represents a reactive group that reacts with the crosslinking agent (B) by action of a cation generated from the photocation generator (C) upon light irradiation; each X independently represents an oxygen atom, a sulfur atom, an ester bond, an amide bond, or —SO2—; R1 represents a divalent hydrocarbon group or a divalent group in which a functional group other than the reactive group and heterocycles is introduced into the divalent hydrocarbon group; and R2 represents a divalent hydrocarbon group, a divalent group in which a functional group other than the reactive group and heterocycles is introduced into the divalent hydrocarbon group, or a heterocycle-containing group that does not have the reactive group.
    Type: Application
    Filed: May 17, 2019
    Publication date: September 16, 2021
    Applicant: JSR CORPORATION
    Inventors: Torahiko YAMAGUCHI, Kimiyuki KANNO, Ryoji TATARA, Toshiaki KADOTA, Ryoyu HIFUMI, Shoma ANABUKI