Patents by Inventor Kimlhiro Higuchi

Kimlhiro Higuchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Plasma processing apparatus and semiconductor device manufacturing method
    Patent number: 9021984
    Abstract: A plasma processing apparatus includes a processing chamber; a lower electrode provided in the processing chamber and having a base made of a conductive metal to which a high frequency power is applied, the lower electrode also serving as a mounting table for mounting thereon a target substrate; an upper electrode provided in the processing chamber to face the lower electrode; and a focus ring disposed above the lower electrode to surround the target substrate. An electrical connection mechanism is provided between the base of the lower electrode and the focus ring to electrically connect the base of the lower electrode to the focus ring through a current control element, and generates a DC current in accordance with a potential difference.
    Type: Grant
    Filed: March 30, 2011
    Date of Patent: May 5, 2015
    Assignee: Tokyo Electron Limited
    Inventors: Takashi Yamamoto, Shunsuke Mizukami, Ryuji Ohtani, Kimlhiro Higuchi