Patents by Inventor Kin-Chung Ray Chiu

Kin-Chung Ray Chiu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230116261
    Abstract: A vacuum pump generally comprises a low pressure portion and a high pressure portion separated by a gas impermeable partition. Gas molecules exit the low pressure portion through an opening in the partition and passively impinge on a featureless rotatable surface in the high pressure portion. A drive rotates the rotatable surface with tangential velocity in the supersonic range at multiple times the most probable velocity of the impinging gas molecules. Impinging gas molecules are ejected outwardly from the periphery of the rotatable surface generating a substantial net outward flow of gas and reducing the pressure in the low pressure portion. The vacuum pump is effective to reduce the pressure in the low pressure portion to a target minimum pressure without using seals to prevent gas molecules from leaking back to the low pressure portion and without using blades or vanes to actively impact the gas molecules.
    Type: Application
    Filed: November 17, 2022
    Publication date: April 13, 2023
    Inventor: Kin-Chung Ray Chiu
  • Patent number: 11519419
    Abstract: A vacuum pump generally comprises a low pressure portion and a high pressure portion separated by a gas impermeable partition. Gas molecules exit the low pressure portion through an opening in the partition and passively impinge on a featureless rotatable surface in the high pressure portion. A drive rotates the rotatable surface with tangential velocity in the supersonic range at multiple times the most probable velocity of the impinging gas molecules. Impinging gas molecules are ejected outwardly from the periphery of the rotatable surface generating a substantial net outward flow of gas and reducing the pressure in the low pressure portion. The vacuum pump is effective to reduce the pressure in the low pressure portion to a target minimum pressure without using seals to prevent gas molecules from leaking back to the low pressure portion and without using blades or vanes to actively impact the gas molecules.
    Type: Grant
    Filed: April 15, 2020
    Date of Patent: December 6, 2022
    Inventor: Kin-Chung Ray Chiu
  • Publication number: 20210324863
    Abstract: A vacuum pump generally comprises a low pressure portion and a high pressure portion separated by a gas impermeable partition. Gas molecules exit the low pressure portion through an opening in the partition and passively impinge on a featureless rotatable surface in the high pressure portion. A drive rotates the rotatable surface with tangential velocity in the supersonic range at multiple times the most probable velocity of the impinging gas molecules. Impinging gas molecules are ejected outwardly from the periphery of the rotatable surface generating a substantial net outward flow of gas and reducing the pressure in the low pressure portion. The vacuum pump is effective to reduce the pressure in the low pressure portion to a target minimum pressure without using seals to prevent gas molecules from leaking back to the low pressure portion and without using blades or vanes to actively impact the gas molecules.
    Type: Application
    Filed: April 15, 2020
    Publication date: October 21, 2021
    Inventor: Kin-Chung Ray Chiu
  • Patent number: 7241428
    Abstract: A compact capacitively coupled electrode structure for use in a gas plasma reactor/generator is disclosed. The electrode structure comprises a parallel plate type anode and cathode spaced to define a gas flow path or volume therebetween. A plurality of electrically conductive fin elements are interposed in the space between the anode and cathode. The fin elements substantially increase the ratio of electrode surface area to volume, and subdivide the gas flow path or volume, thereby substantially increasing the efficiency of plasma gas processing that is possible over a broad range of operating parameters, without substantially increasing the spacing between the anode and cathode. Static or closed operation is also disclosed. Also disclosed is a multi-anode/multi-cathode electrode assembly embodying the basic electrode structure and a highly efficient and compact gas plasma reactor/generator employing the assembly.
    Type: Grant
    Filed: September 21, 2005
    Date of Patent: July 10, 2007
    Assignee: DryScrub, ETC
    Inventor: Kin-Chung Ray Chiu
  • Patent number: 6998027
    Abstract: A compact capacitively coupled electrode structure for use in a gas plasma reactor/generator is disclosed. The electrode structure comprises a parallel plate type anode and cathode spaced to define a gas flow path or volume therebetween. A plurality of electrically conductive fin elements are interposed in the space between the anode and cathode. The fin elements substantially increase the ratio of electrode surface area to volume, and subdivide the gas flow path or volume, thereby substantially increasing the efficiency of plasma gas processing that is possible over a broad range of operating parameters, without substantially increasing the spacing between the anode and cathode. Static or closed operation is also disclosed. Also disclosed is a multi-anode/multi-cathode electrode assembly embodying the basic electrode structure and a highly efficient and compact gas plasma reactor/generator employing the assembly.
    Type: Grant
    Filed: April 16, 2003
    Date of Patent: February 14, 2006
    Assignee: DryScrub, ETC
    Inventor: Kin-Chung Ray Chiu
  • Patent number: 6967007
    Abstract: A compact capacitively coupled electrode structure for use in a gas plasma reactor/generator is disclosed. The electrode structure comprises a parallel plate type anode and cathode spaced to define a gas flow path or volume therebetween. A plurality of electrically conductive fin elements are interposed in the space between the anode and cathode. The fin elements substantially increase the ratio of electrode surface area to volume, and subdivide the gas flow path or volume, thereby substantially increasing the efficiency of plasma gas processing that is possible over a broad range of operating parameters, without substantially increasing the spacing between the anode and cathode. Static or closed operation is also disclosed. Also disclosed is a multi-anode/multi-cathode electrode assembly embodying the basic electrode structure and a highly efficient and compact gas plasma reactor/generator employing the assembly.
    Type: Grant
    Filed: April 16, 2003
    Date of Patent: November 22, 2005
    Assignee: Dryscrub, ETC.
    Inventor: Kin-Chung Ray Chiu
  • Publication number: 20030206838
    Abstract: A compact capacitively coupled electrode structure for use in a gas plasma reactor/generator is disclosed. The electrode structure comprises a parallel plate type anode and cathode spaced to define a gas flow path or volume therebetween. A plurality of electrically conductive fin elements are interposed in the space between the anode and cathode. The fin elements substantially increase the ratio of electrode surface area to volume, and subdivide the gas flow path or volume, thereby substantially increasing the efficiency of plasma gas processing that is possible over a broad range of operating parameters, without substantially increasing the spacing between the anode and cathode. Static or closed operation is also disclosed. Also disclosed is a multi-anode/multi-cathode electrode assembly embodying the basic electrode structure and a highly efficient and compact gas plasma reactor/generator employing the assembly.
    Type: Application
    Filed: April 16, 2003
    Publication date: November 6, 2003
    Applicant: DryScrub, ETC
    Inventor: Kin-Chung Ray Chiu
  • Patent number: 6576202
    Abstract: A compact capacitively coupled electrode structure for use in a gas plasma reactor/generator is disclosed. The electrode structure comprises a parallel plate type anode and cathode spaced to define a gas flow path or volume therebetween. A plurality of electrically conductive fin elements are interposed in the space between the anode and cathode. The fin elements substantially increase the ratio of electrode surface area to volume, and subdivide the gas flow path or volume, thereby substantially increasing the efficiency of plasma gas processing that is possible over a broad range of operating parameters, without substantially increasing the spacing between the anode and cathode. Static or closed operation is also disclosed. Also disclosed is a multi-anode/multi-cathode electrode assembly embodying the basic electrode structure and a highly efficient and compact gas plasma reactor/generator employing the assembly.
    Type: Grant
    Filed: April 21, 2000
    Date of Patent: June 10, 2003
    Inventor: Kin-Chung Ray Chiu