Patents by Inventor Kirby Hane FLOYD

Kirby Hane FLOYD has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Rotatable substrate support having radio frequency applicator
    Patent number: 10460915
    Abstract: A substrate support assembly includes a shaft assembly, a pedestal coupled to a portion of the shaft assembly, and a first rotary connector coupled to the shaft assembly, wherein the first rotary connector comprises a first coil member surrounding a rotatable shaft member that is electrically coupled to the shaft assembly, the first coil member being rotatable with the rotatable shaft, and a second coil member surrounding the first coil member, the second coil member being stationary relative to the first coil member, wherein the first coil member electrically couples with the second coil member when the rotating radio frequency applicator is energized and provides a radio frequency signal/power to the pedestal through the shaft assembly.
    Type: Grant
    Filed: April 28, 2017
    Date of Patent: October 29, 2019
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Satoru Kobayashi, Kirby Hane Floyd, Hiroji Hanawa, Soonam Park, Dmitry Lubomirsky
  • ROTATABLE SUBSTRATE SUPPORT HAVING RADIO FREQUENCY APPLICATOR
    Publication number: 20170236693
    Abstract: A substrate support assembly includes a shaft assembly, a pedestal coupled to a portion of the shaft assembly, and a first rotary connector coupled to the shaft assembly, wherein the first rotary connector comprises a first coil member surrounding a rotatable shaft member that is electrically coupled to the shaft assembly, the first coil member being rotatable with the rotatable shaft, and a second coil member surrounding the first coil member, the second coil member being stationary relative to the first coil member, wherein the first coil member electrically couples with the second coil member when the rotating radio frequency applicator is energized and provides a radio frequency signal/power to the pedestal through the shaft assembly.
    Type: Application
    Filed: April 28, 2017
    Publication date: August 17, 2017
    Inventors: Satoru KOBAYASHI, Kirby HANE FLOYD, Hiroji HANAWA, Soonam PARK, Dmitry LUBOMIRSKY
  • Wafer rotation in a semiconductor chamber
    Patent number: 9593419
    Abstract: A method and apparatus for processing a substrate are provided. The apparatus includes a pedestal and rotation member, both of which are moveably disposed within a processing chamber. The rotation member is adapted to rotate a substrate disposed in the chamber. The substrate may be supported by an edge ring during processing. The edge ring may selectively engage either the pedestal or the rotation member. In one embodiment, the edge ring engages the pedestal during a deposition process and the edge ring engages the rotation member during rotation of the substrate. The rotation of the substrate during processing may be discrete or continuous.
    Type: Grant
    Filed: February 26, 2015
    Date of Patent: March 14, 2017
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Ganesh Balasubramanian, Juan Carlos Rocha-Alvarez, Ramprakash Sankarakrishnan, Robert Kim, Dale R. Du Bois, Kirby Hane Floyd, Amit Kumar Bansal, Tuan Anh Nguyen
  • WAFER ROTATION IN A SEMICONDUCTOR CHAMBER
    Publication number: 20150262859
    Abstract: A method and apparatus for processing a substrate are provided. The apparatus includes a pedestal and rotation member, both of which are moveably disposed within a processing chamber. The rotation member is adapted to rotate a substrate disposed in the chamber. The substrate may be supported by an edge ring during processing. The edge ring may selectively engage either the pedestal or the rotation member. In one embodiment, the edge ring engages the pedestal during a deposition process and the edge ring engages the rotation member during rotation of the substrate. The rotation of the substrate during processing may be discrete or continuous.
    Type: Application
    Filed: February 26, 2015
    Publication date: September 17, 2015
    Inventors: Ganesh BALASUBRAMANIAN, Juan Carlos ROCHA-ALVAREZ, Ramprakash SANKARAKRISHNAN, Robert KIM, Dale R. DU BOIS, Kirby Hane FLOYD, Amit Kumar BANSAL, Tuan Anh NGUYEN
  • ROTATABLE SUBSTRATE SUPPORT HAVING RADIO FREQUENCY APPLICATOR
    Publication number: 20150083042
    Abstract: A substrate support assembly includes a shaft assembly, a pedestal coupled to a portion of the shaft assembly, and a first rotary connector coupled to the shaft assembly, wherein the first rotary connector comprises a first coil member surrounding a rotatable shaft member that is electrically coupled to the shaft assembly, the first coil member being rotatable with the rotatable shaft, and a second coil member surrounding the first coil member, the second coil member being stationary relative to the first coil member, wherein the first coil member electrically couples with the second coil member when the rotating radio frequency applicator is energized and provides a radio frequency signal/power to the pedestal through the shaft assembly.
    Type: Application
    Filed: November 26, 2013
    Publication date: March 26, 2015
    Inventors: Satoru KOBAYASHI, Kirby Hane FLOYD, Hiroji HANAWA, Soonam PARK, Dmitry LUBOMIRSKY