Patents by Inventor Kirill Urievich SOBOLEV

Kirill Urievich SOBOLEV has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METHOD FOR REGION OF INTEREST PROCESSING FOR RETICLE PARTICLE DETECTION
    Publication number: 20230055116
    Abstract: An inspection system includes a radiation source that generates a beam of radiation and irradiates a first surface of an object, defining a region of the first surface of the object. The radiation source also irradiates a second surface of the object, defining a region of the second surface, wherein the second surface is at a different depth level within the object than the first surface. The inspection system may also include a detector that defines a field of view (FOV) of the first surface including the region of the first surface, and receives radiation scattered from the region of the first surface and the region of the second surface. The inspection system may also include a processor that discards image data not received from the region of the first surface, and constructs a composite image comprising the image data from across the region of the first surface.
    Type: Application
    Filed: January 21, 2021
    Publication date: February 23, 2023
    Applicant: ASML Holding N.V.
    Inventors: Peter Conrad KOCHERSPERGER, Christopher Michael DOHAN, Justin Lloyd KREUZER, Michal Emanuel PAWLOWSKI, Aage BENDIKSEN, Kirill Urievich SOBOLEV, James Hamilton WALSH, Roberto B. WIENER, Arun Mahadevan VENKATARAMAN
  • Sensor apparatus and method for lithographic measurements
    Patent number: 11526091
    Abstract: Apparatus for, and method of, measuring a parameter of an alignment mark on a substrate in which an optical system is arranged to receive at least one diffraction order from the alignment mark and the diffraction order is modulated at a pupil or a wafer conjugate plane of the optical system, a solid state optical device is arranged to receive the modulated diffraction order, and a spectrometer is arranged to receive the modulated diffraction order from the solid state optical device and to determine an intensity of one or more spectral components in the modulated diffraction order.
    Type: Grant
    Filed: March 25, 2020
    Date of Patent: December 13, 2022
    Assignee: ASML Holding N.V.
    Inventors: Tamer Mohamed Tawfik Ahmed Mohamed Elazhary, Justin Lloyd Kreuzer, Yuxiang Lin, Kirill Urievich Sobolev
  • SENSOR APPARATUS AND METHOD FOR LITHOGRAPHIC MEASUREMENTS
    Publication number: 20220179331
    Abstract: Apparatus for, and method of, measuring a parameter of an alignment mark on a substrate in which an optical system is arranged to receive at least one diffraction order from the alignment mark and the diffraction order is modulated at a pupil or a wafer conjugate plane of the optical system, a solid state optical device is arranged to receive the modulated diffraction order, and a spectrometer is arranged to receive the modulated diffraction order from the solid state optical device and to determine an intensity of one or more spectral components in the modulated diffraction order.
    Type: Application
    Filed: March 25, 2020
    Publication date: June 9, 2022
    Applicant: ASML HOLDING N.V.
    Inventors: Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY, Justin Lloyd KREUZER, Yuxiang LIN, Kirill Urievich SOBOLEV
  • APPARATUS FOR AND METHOD OF SIMULTANEOUSLY ACQUIRING PARALLEL ALIGNMENT MARKS
    Publication number: 20220100109
    Abstract: An apparatus for and method of determining the alignment of a substrate in which a multiple alignment marks are simultaneously illuminated with spatially coherent radiation and the light from the illuminated marks is collected in parallel to obtain information on the positions of the marks and distortions within the marks.
    Type: Application
    Filed: December 12, 2019
    Publication date: March 31, 2022
    Applicants: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY, Franciscus BIJNEN, Alessandro POLO, Kirill Urievich SOBOLEV, Simon Reinald HUISMAN, Justin Lloyd KREUZER
  • Objective lens system
    Patent number: 10247940
    Abstract: An alignment system uses a self-referencing interferometer that incorporates an objective lens system having a plurality of lens element groups. In an embodiment, the objective is configured and arranged to provide a large numerical aperture, long working distance, and low wavefront error.
    Type: Grant
    Filed: November 21, 2016
    Date of Patent: April 2, 2019
    Assignee: ASML Holding N.V.
    Inventor: Kirill Urievich Sobolev
  • OBJECTIVE LENS SYSTEM
    Publication number: 20180341105
    Abstract: An alignment system uses a self-referencing interferometer that incorporates an objective lens system having a plurality of lens element groups. In an embodiment, the objective is configured and arranged to provide a large numerical aperture, long working distance, and low wavefront error.
    Type: Application
    Filed: November 21, 2016
    Publication date: November 29, 2018
    Applicant: ASML HOLDING N.V.
    Inventor: Kirill Urievich SOBOLEV