Patents by Inventor Kirsten Jennifer Lyhn WANG

Kirsten Jennifer Lyhn WANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METROLOGY METHOD AND ASSOCIATED METROLOGY DEVICE
    Publication number: 20250147437
    Abstract: Disclosed is a method of determining a value for a parameter of interest from a target on a substrate. The method comprises obtaining metrology data comprising single-wavelength parameter of interest values which were obtained using a respective different measurement wavelength; and determining said value for the parameter of interest from a stack sensitivity derived weighted combination of said single-wavelength parameter of interest values. Also disclosed is a method of selecting wavelengths for a measurement based on at least the derivative of the stack sensitivity with respect to wavelength.
    Type: Application
    Filed: January 16, 2023
    Publication date: May 8, 2025
    Applicant: ASML Netherlands B.V.
    Inventors: Armand Eugene Albert KOOLEN, Su-Ting CHENG, Hugo Augustinus Joseph CRAMER, Kirsten Jennifer Lyhn WANG