Patents by Inventor Kirsten Ruck

Kirsten Ruck has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7445446
    Abstract: A method of heat-treating resist coated manufacturing wafers in a processing system by establishing a temperature profile for each of a plurality of hotplates in the processing system, heat-treating the resist coated manufacturing wafers on the hotplates, obtaining CD metrology data from test areas on the heat-treated resist coated manufacturing wafers, determining CD variations for each hotplate from the CD metrology data, adjusting the temperature profile of one or more hotplates after determining the CD variations, and heat-treating additional resist coated manufacturing wafers on the hotplates after the adjusting.
    Type: Grant
    Filed: September 29, 2006
    Date of Patent: November 4, 2008
    Assignee: Tokyo Electron Limited
    Inventors: Heiko Weichert, Kirsten Ruck
  • Publication number: 20080102412
    Abstract: A method of heat-treating resist coated manufacturing wafers in a processing system by establishing a temperature profile for each of a plurality of hotplates in the processing system, heat-treating the resist coated manufacturing wafers on the hotplates, obtaining CD metrology data from test areas on the heat-treated resist coated manufacturing wafers, determining CD variations for each hotplate from the CD metrology data, adjusting the temperature profile of one or more hotplates after determining the CD variations, and heat-treating additional resist coated manufacturing wafers on the hotplates after the adjusting.
    Type: Application
    Filed: September 29, 2006
    Publication date: May 1, 2008
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Heiko Weichert, Kirsten Ruck